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Air cleaning apparatus used for an exposure apparatus 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • B01D-053/04
출원번호 US-0513152 (1995-08-09)
우선권정보 JP-0188341 (1994-08-10); JP-0103887 (1995-04-27)
발명자 / 주소
  • Hagiwara Shigeru (Kawasaki JPX) Tokuda Noriaki (Kawasaki JPX)
출원인 / 주소
  • Nikon Corporation (Tokyo JPX 03)
인용정보 피인용 횟수 : 38  인용 특허 : 21

초록 ▼

A chemical filter for removing a chemical impurity is arranged at an air inlet, and a gas sensor for adsorbing the chemical impurity is arranged upstream of the chemical filter. The service life of the chemical filter is determined on the basis of the resonance frequency of the gas sensor. Alternati

대표청구항 ▼

A gas cleaning apparatus comprising: a filter unit for removing a chemical substance from a gas; an adsorbing member arranged upstream and apart from said filter unit, in relation to a flowing direction of the gas, to adsorb a sample of the chemical substance from the gas before the gas enters the f

이 특허에 인용된 특허 (21)

  1. Neumann ; Gerhard Max ; Sinhuber ; Detlef, Absorption filter.
    상세보기
  2. Hama Masaharu (Itami JPX) Fukumoto Takaaki (Itami JPX), Air conditioning apparatus for a clean room.
    상세보기
  3. Aston William T. (5003 Gardenia Cir. Marietta GA 30068), Antimicrobial air filter and method of making same.
    상세보기
  4. Goodwin Brian (Neston GB2), Apparatus for analysis of absorbed gases.
    상세보기
  5. Satoh Kazuo (Okitama JPX) Ogawa Yohji (Okitama JPX) Okano Hirofumi (Okitama JPX) Suzuki Kiyomi (Higashi-Okitama JPX), Apparatus for preventing clouding of a semiconductor wafer.
    상세보기
  6. Snaddon Robert W. L. (Burnt Hills NY) Dietz Peter W. (Delanson NY), Apparatus for removing respirable aerosols from air.
    상세보기
  7. Fukuda Takashi (Otsu JPX) Shimada Masayoshi (Otsu JPX) Ishizaki Nobuo (Otsu JPX) Iwahori Shoichi (Otsu JPX), Carbon adsorptive filter material with layers of reinforcing non woven fabrics needle punched.
    상세보기
  8. Hultquist Steven J. (Raleigh NC) Tom Glenn M. (New Milford CT), Dopant delivery system for semiconductor manufacture.
    상세보기
  9. Nelson Lorne W. (Bloomington MN), Filter condition responsive device compensated for changes in medium flow.
    상세보기
  10. von Blcher Hasso (Parkstrasse 10 D-4006 Erkrath DEX) de Ruiter Ernest (Hhenstrasse 57a D-5090 Leverkusen 3 DEX), Filter sheet material for passenger cabins in motor vehicles.
    상세보기
  11. Mori Yoichi (Fujisawa JPX) Fukunaga Akira (Fujisawa JPX), Gas adsorber for exhaust gas.
    상세보기
  12. Succi Marco (Milan ITX) Solcia Carolina (Milan ITX), Gas purifier having pressure responsive switch as end of life detector.
    상세보기
  13. Ichihara Yutaka (Yokohama JPX), Illuminating optical apparatus.
    상세보기
  14. Naraki Tsuyoshi (Tokyo JPX) Ozawa Haruo (Tokyo JPX) Mori Takashi (Kawasaki JPX) Nagatsuka Jun (Kawasaki JPX), Illumination light source device.
    상세보기
  15. McCleary Roger W. (Salem NH), Illuminator for microlithographic integrated circuit manufacture.
    상세보기
  16. Harada Hiroyuki (Tokyo JPX) Koinuma Tsutomu (Urawa JPX) Iwata Terufumi (Yokohama JPX) Nitta Michio (Tokyo JPX), Impurity scavenging system.
    상세보기
  17. Lorimer D\Arcy H. (Pismo Beach CA), Method and apparatus for predicting end-of-life of a consumable in a fluid purification system.
    상세보기
  18. Harkins Carl G. (Sunnyvale CA), Method and apparatus for prevention of atmospheric corrosion of electronic equipment.
    상세보기
  19. Delbare Wim J. R. (Gent-St. Amandsberg BEX) Vandam Louis J. (Brasschaat BEX) Vandewege Jan A. O. (Wondelgem BEX), Optical coupling structure and method.
    상세보기
  20. Lavie, Ram, Process for the manufacture of ammonia.
    상세보기
  21. Linnersten Staffan B. (New Port Richey FL) White ; Jr. Donald H. (Homer NY), Void-containing sorbent pad.
    상세보기

이 특허를 인용한 특허 (38)

  1. Mochizuki, Yuji, Absorbent material for low-molecular-weight organic gas and fuel vapor treatment apparatus using same.
    상세보기
  2. Graham Kristine M. ; Peterson Paul ; Monson Donald R. ; Mills Jarren B. ; Grafe Timothy H., Adsorption apparatus.
    상세보기
  3. Graham Kristine M. ; Peterson Paul ; Monson Donald R. ; Mills Jarren B. ; Grafe Timothy H., Adsorption apparatus and methods.
    상세보기
  4. Law, Kwok Yung Anthony; Chao, Yu Hang Christopher; Law, Sui Chun; Lam, Wan Chung, Air cleaner filter system capable of nano-confined catalytic oxidation.
    상세보기
  5. Ahn, Yo-Han; Lee, Byung-Moo; Kim, Hyun-Joon; Choi, Jai-Heung, Air shower head of photolithography equipment for directing air towards a wafer stage.
    상세보기
  6. Nakano, Hitoshi; Arakawa, Kiyoshi, Chemical filter arrangement for a semiconductor manufacturing apparatus.
    상세보기
  7. Nakano,Hitoshi; Arakawa,Kiyoshi, Chemical filter arrangement for a semiconductor manufacturing apparatus.
    상세보기
  8. Ammann Klaus,DEX ; Bather Wolfgang,DEX ; Dietrich Michael,DEX, Device and process for displaying the exhaustion of a gas filter.
    상세보기
  9. Herman, Peter K.; Zoch, Roger L.; Schwartz, Scott W.; Adams, Mark P., Engine air filter replacement indication system.
    상세보기
  10. Kataoka, Masao, Environmental control equipment/method of developing apparatus for developing light-exposed resist film with developer in wafer treating chamber.
    상세보기
  11. Hagiwara Shigeru,JPX, Exposure apparatus.
    상세보기
  12. Shigeru Hagiwara JP, Exposure apparatus.
    상세보기
  13. Murayama, Masayuki, Exposure apparatus and air-conditioning apparatus for use with exposure apparatus.
    상세보기
  14. Udagawa, Kenji; Yoshida, Tomoyuki; Hashimoto, Michinori; Karibe, Fumio, Exposure apparatus and device manufacturing method.
    상세보기
  15. Tanabe, Masayuki; Fukuda, Yasuaki; Tsukamoto, Masami, Exposure apparatus, and device manufacturing method.
    상세보기
  16. Kishkovich, Oleg P.; Kinkead, Devon; Grayfer, Anatoly; Goodwin, William M.; Ruede, David, Filters employing both acidic polymers and physical-adsorption media.
    상세보기
  17. Kishkovich, Oleg P.; Kinkead, Devon; Grayfer, Anatoly; Goodwin, William M.; Ruede, David, Filters employing both acidic polymers and physical-adsorption media.
    상세보기
  18. Kishkovich, Oleg P.; Kinkead, Devon; Grayfer, Anatoly; Goodwin, William M.; Ruede, David, Filters employing both acidic polymers and physical-adsorption media.
    상세보기
  19. Kishkovich, Oleg, Filters employing porous strongly acidic polymers.
    상세보기
  20. Kishkovich,Oleg; Rezuke,Robert W.; Kinkead,Devon, Filters employing porous strongly acidic polymers.
    상세보기
  21. Oleg Kishkovich ; Robert W. Rezuke ; Devon Kinkhead, Filters employing porous strongly acidic polymers.
    상세보기
  22. Nakashima,Tomohisa; Tsukamoto,Naoki; Ito,Motoki; Ito,Yukichika, Gas analyzer apparatus.
    상세보기
  23. Schroder, Willi, Gas sensor arrangement.
    상세보기
  24. McCarthy Walton W., Life cell.
    상세보기
  25. Motomatsu, Toshihiko, Manufacturing method of a liquid crystal display panel, and a liquid crystal dripping device used therefor.
    상세보기
  26. Alvarez, Jr., Daniel; Spiegelman, Jeffrey J., Method for purification of lens gases used in photolithography.
    상세보기
  27. Daniel Alvarez, Jr. ; Jeffrey J. Spiegelman, Method for purification of lens gases used in photolithography.
    상세보기
  28. Alvarez, Jr.,Daniel; Spiegelman,Jeffrey J., Method for purification of lens gases used in photolithography and metrology.
    상세보기
  29. Bharath Rangarajan ; Bhanwar Singh ; Steven Avanzino, Methodology for mitigating formation of t-tops in photoresist.
    상세보기
  30. Kishkovich, Oleg P.; Kinkead, Devon; Grayfer, Anatoly; Goodwin, William M.; Ruede, David, Methods using filters employing both acidic polymers and physical-adsorption media.
    상세보기
  31. Sukhman, Yefim P.; Hillman, Joseph T.; Noto, Stefano J.; Risser, Christian J.; Zirbel, Jr., David John, Multi-stage air filtration systems and associated apparatuses and methods.
    상세보기
  32. Freitag, Ansgar; Bingel, Ulrich; Distl, Josef; Hamm, Uwe W., Optical beam guidance system and method for preventing contamination of optical components contained therein.
    상세보기
  33. Tanabe, Masayuki, Optical instrument, and device manufacturing method.
    상세보기
  34. Dautartas Mindaugas F. ; Sneh Ofer, Portable purge system for transporting materials.
    상세보기
  35. Yaegashi Hidetami,JPX ; Fan Qi,JPX, Processing apparatus and method.
    상세보기
  36. Verdegan, Barry M.; Thomas, Chad M.; Herman, Peter K., System for monitoring and indicating filter life.
    상세보기
  37. Verdegan, Barry M.; Thomas, Chad M.; Herman, Peter K., System for monitoring and indicating filter life.
    상세보기
  38. Parham, Michael; Ding, Yuquing, Systems and methods for determining filter service lives.
    상세보기

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