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Misted deposition method of fabricating layered superlattice materials 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • B05D-003/00
출원번호 US-0480477 (1995-06-07)
발명자 / 주소
  • McMillan Larry D. (Colorado Springs CO) Paz de Araujo Carlos A. (Colorado Springs CO) Scott Michael C. (Colorado Springs CO)
출원인 / 주소
  • Symetrix Corporation (Colorado Springs CO 02)
인용정보 피인용 횟수 : 29  인용 특허 : 19

초록

A precursor liquid comprising several metal 2-ethylhexanoates, such as stroritium tantalum and bismuth 2-ethylhexanoates, in a xylenes/methyl ethyl ketone solvent is prepared, a substrate is placed within a vacuum deposition chamber, the precursor liquid is misted, and the mist is flowed into the de

대표청구항

A method of fabricating a thin film of a layered superlattice material, said method comprising the steps of: (a) providing a liquid precursor including a plurality of metal moieties in effective amounts for forming a layered superlattice material; (b) placing a substrate inside an enclosed depositio

이 특허에 인용된 특허 (19)

  1. Ketterson John B. (Evanston IL) Bogacz Slawomir A. (New Lenox IL) Wong George K. (Glenview IL), Charged particle high frequency laser.
  2. Lampe Donald R. (Ellicott City MD) Sinharoy Samar (Monroeville PA) Wu Shu Y. (Artesia CA) Buhay Harry (Allison Park PA) Francombe Maurice H. (Penn Hills PA) Krishnaswamy S. Visvanathan (Monroeville P, Ferroelectric thin film material, method of deposition, and devices using same.
  3. Kitagawa Nobuhisa (Tokyo JPX) Hirose Masataka (Hiroshima JPX) Isogaya Kazuyoshi (Tokyo JPX) Ashida Yoshinori (Higashi-Hiroshima JPX), Formation process of amorphous silicon film.
  4. Lipeles Russell A. (Los Angeles CA) Coleman Dianne J. (Long Beach CA), Metallo-organic solution deposition (MOSD) of transparent, crystalline ferroelectric films.
  5. Parker Edwin H. (LaGrange KY) Piazza Giacomo J. (Elmira NY), Method for depositing thin, transparent metal oxide films.
  6. Pintchovski Faivel S. (Austin TX), Method for forming a material layer in a semiconductor device using liquid phase deposition.
  7. Hicks David B. (Farmington Hills MI) Micheli Adolph L. (Mt. Clemens MI) Chang Shih-Chia (Troy MI), Method for forming patterned tin oxide thin film element.
  8. Mance Andrew M. (Royal Oak MI) Micheli Adolph L. (Mt. Clemens MI) Maheswari Shyam P. (Rochester Hills MI) Habib Mohammad A. (Troy MI), Method for forming tungsten oxide films.
  9. Yamazaki Shunpei (Tokyo JPX) Suzuki Kunio (Atsugi JPX) Nagayama Susumu (Tokyo JPX) Inujima Takashi (Atsugi JPX) Abe Masayoshi (Tama JPX) Fukada Takeshi (Ebina JPX) Kinka Mikio (Atsugi JPX) Kobayashi , Method for photo annealing non-single crystalline semiconductor films.
  10. Miller William D. (Rio Rancho NM) Chapin Leo N. (Albuqueque NM) Evans ; Jr. Joseph T. (Albuqueque NM), Method for preparing plzt, pzt and plt sol-gels and fabricating ferroelectric thin films.
  11. Eguchi Ken (Yokohama JPX) Matsuda Hiroshi (Yokohama JPX) Haruta Masahiro (Funabashi JPX) Nishimura Yukuo (Sagamihara JPX) Hirai Yutaka (Tokyo JPX) Nakagiri Takashi (Tokyo JPX), Method of forming deposition film.
  12. Matsuda Hiroshi (Yokohama JPX) Haruta Masahiro (Funabashi JPX) Eguchi Ken (Yokohama JPX) Nishimura Yukuo (Sagamihara JPX) Hirai Yutaka (Tokyo JPX) Nakagiri Takashi (Tokyo JPX), Method of forming deposition film.
  13. Okada Masaru (21 Banchi ; Kandaijin-cho Kasugai-city ; Aichi-prefecture JPX) Tomita Katsuhiko (Kyoto JPX), Method of producing ferroelectric thin film.
  14. McMillan Larry D. (Colorado Springs CO) Paz de Araujo Carlos A. (Colorado Springs CO), Methods and apparatus for material deposition.
  15. McMillan Larry D. (Colorado Springs CO) Paz de Araujo Carlos A. (Colorado Springs CO), Methods and apparatus for material deposition.
  16. Santiago-Aviles Jorge J. (Philadelphia PA) Berry Donald H. (Philadelphia PA), Organometallic precursors in conjunction with rapid thermal annealing for synthesis of thin film ceramics.
  17. Tashiro Mamoru (Tokyo JPX) Urata Kazuo (Tokyo JPX) Yamazaki Shunpei (Tokyo JPX), Photo CVD apparatus, with deposition prevention in light source chamber.
  18. Gladfelter Wayne L. (St. Paul MN) Mantell Daniel R. (Minneapolis MN) Evans John F. (Minneapolis MN) Schulze Roland K. (Minneapolis MN), Process for metal nitride deposition.
  19. Olmer Leonard J. (Hopewell Township ; Mercer County NJ) Shanefield Daniel J. (Princeton Township ; Mercer County NJ), Radiation-stimulated deposition of aluminum.

이 특허를 인용한 특허 (29)

  1. Yang, Il-Kwang; Je, Sung-Tae; Song, Byoung-Gyu; Kim, Yong-Ki; Kim, Kyong-Hun; Shin, Yang-Sik, Apparatus for processing substrate for supplying reaction gas having phase difference.
  2. Donald L. Westmoreland ; Gurtej S. Sandhu, Chemical vapor deposition apparatus with liquid feed.
  3. Gatov, Michael S., Contamination distribution apparatus and method.
  4. Choi, Eun-Seok, Fabricating ferroelectric memory device.
  5. Takeshita Kazuhiro,JPX ; Nagashima Shinji,JPX ; Mizutani Yoji,JPX ; Katayama Kyoshige,JPX, Gas treatment apparatus.
  6. Westmoreland,Donald L.; Sandhu,Gurtej S., High efficiency method for performing a chemical vapordeposition utilizing a nonvolatile precursor.
  7. Sun, James J.; Liu, Benjamin Y. H., Method and apparatus for deposition of particles on surfaces.
  8. James J. Sun ; Benjamin Y. H. Liu ; Virgil A. Marple, Method and apparatus for thin film deposition on large area substrates.
  9. Lee Won Jae,KRX ; Lee Seaung Suk,KRX ; Kim Ho G.,KRX ; Kim Jong Choul,KRX, Method for fabricating semiconductor device.
  10. Kouji Tsujita JP; Ichiro Ueno JP; Norio Tanaka JP, Method for making an optical recording medium and an optical recording medium obtained by the method.
  11. Uchida Hiroto,JPX ; Soyama Nobuyuki,JPX ; Kageyama Kensuke,JPX ; Ogi Katsumi,JPX ; Scott Michael C. ; Cuchiaro Joseph D. ; Derbenuick Gary F. ; McMillan Larry D. ; Paz de Araujo Carlos A., Method of fabricating an integrated circuit using self-patterned thin films.
  12. Uchiyama, Kiyoshi; Paz de Araujo, Carlos A., Method of making ferroelectric material utilizing anneal in an electrical field.
  13. Hochido ; deceased Yukoh,JPX ITX by Youko Hochido ; executor ; Kadokura Hidekimi,JPX ; Matsumoto Masamichi,JPX ; Arita Koji ; Azuma Masamichi,JPX ; Otsuki Tatsuo,JPX, Method of manufacturing bi-layered ferroelectric thin film.
  14. Ji,Bing; Motika,Stephen Andrew; Wu,Dingjun; Karwacki, Jr.,Eugene Joseph; Roberts,David Allen, Method to protect internal components of semiconductor processing equipment using layered superlattice materials.
  15. Hayashi Shinichiro ; McMillan Larry D. ; Azuma Masamichi,JPX ; Paz de Araujo Carlos A., Methods and apparatus for material deposition using primer.
  16. Hayashi Shinichiro,JPX ; McMillan Larry D. ; Paz de Araujo Carlos A., Misted precursor deposition apparatus and method with improved mist and mist flow.
  17. Shinichiro Hayashi JP; Larry D. McMillan ; Carlos A. Paz de Araujo, Misted precursor deposition apparatus and method with improved mist and mist flow.
  18. Ditizio, Robert Anthony; Nguyen, Tue; Nguyen, Tai Dung, NanoLayer Deposition process for composite films.
  19. Nguyen, Tue; Nguyen, Tai Dung, Nanolayer deposition process.
  20. Nguyen, Tue; Nguyen, Tai Dung, Nanolayer deposition process.
  21. Nguyen, Tue; Nguyen, Tai Dung, Nanolayer deposition process.
  22. Ditizio, Robert Anthony; Nguyen, Tue; Nguyen, Tai Dung, Nanolayer deposition using bias power treatment.
  23. Gan-Moog Chow SG; Lynn K. Kurihara ; T. Danny Xiao ; Peter R. Strutt ; Christopher W. Strock ; Raymond A. Zatorski, Nanosize particle coatings made by thermally spraying solution precursor feedstocks.
  24. Strutt, Peter R.; Kear, Bernard H.; Boland, Ross F., Nanostructured feeds for thermal spray systems, method of manufacture, and coatings formed therefrom.
  25. Sun, James J.; Liu, Benjamin Y. H., Scanning deposition head for depositing particles on a wafer.
  26. Yang, Il-Kwang; Je, Sung-Tae; Song, Byoung-Gyu; Kim, Yong-Ki; Kim, Kyong-Hun; Shin, Yang-Sik, Substrate processing apparatus including auxiliary gas supply port.
  27. Senzaki,Yoshihide; Park,Seung Gyun, System and method for forming multi-component dielectric films.
  28. Strutt Peter R. ; Kear Bernard H. ; Boland Ross F., Thermal spray method for the formation of nanostructured coatings.
  29. Haba, Belgacem; Smith, John W., Vapor phase connection techniques.
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