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Liquid crystal display apparatus having gap adjusting means under the sealing region 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • G02F-001/1339
출원번호 US-0577662 (1995-12-22)
우선권정보 JP-0187908 (1992-07-15)
발명자 / 주소
  • Watanabe Yoshihiro (Yokohama JPX) Nakamura Hiroki (Chigasaki JPX) Sugawara Takako (Kawasaki JPX)
출원인 / 주소
  • Kabushiki Kaisha Toshiba (Kawasaki JPX 03)
인용정보 피인용 횟수 : 49  인용 특허 : 1

초록

An object is to provide a liquid crystal display apparatus with an equal gap between two substrates so as to improve display image quality and display contrast. To accomplish this object, substrate gap adjusting region 33 or substrate gap adjusting layers 21, 22, 25, 27, 29, and 31 are formed so tha

대표청구항

A liquid crystal display apparatus, comprising: a switching element array substrate having switching elements, scanning lines, signal lines, and pixel electrodes, said scanning lines and said signal lines being coupled to said switching elements, said pixel elements being coupled to said switching e

이 특허에 인용된 특허 (1)

  1. Watanabe Yoshihiro (Yokohama JPX) Nakamura Hiroki (Chigasaki JPX) Sugawara Takako (Kawasaki JPX), Liquid crystal dispaly apparatus with gap adjusting layers located between the display region and driver circuits.

이 특허를 인용한 특허 (49)

  1. Kokubo, Chiho; Yamagata, Hirokazu; Yamazaki, Shunpei, Active matrix display device having a column-like spacer.
  2. Okada, Takashi; Tanaka, Yukio; Kimura, Masanori; Kumagawa, Katsuhiko, Active matrix liquid crystal display element.
  3. Raj Kannan ; Rashkovskiy Oleg ; Miller Anthony C., Aligning electro-optic material having standoffs formed from a fourth or higher metal interconnection layer.
  4. Nakamura,Takafumi; Hanazawa,Yasuyuki, Apparatus and manufacture method for flat display.
  5. Murakami, Satoshi; Hirakata, Yoshiharu; Fujimoto, Etsuko; Yamazaki, Yu; Yamazaki, Shunpei, Capacitor, semiconductor device and manufacturing method thereof.
  6. Murakami, Satoshi; Hirakata, Yoshiharu; Fujimoto, Etsuko; Yamazaki, Yu; Yamazaki, Shunpei, Capacitor, semiconductor device and manufacturing method thereof.
  7. Murakami,Satoshi; Hirakata,Yoshiharu; Fujimoto,Etsuko; Yamazaki,Yu; Yamazaki,Shunpei, Capacitor, semiconductor device and manufacturing method thereof.
  8. Hosoya, Kunio, Display device.
  9. Hosoya, Kunio, Display device.
  10. Hosoya, Kunio, Display device.
  11. Yamazaki, Shunpei; Koyama, Jun, Display device.
  12. Yamazaki, Shunpei; Koyama, Jun, Display device.
  13. Hirakata, Yoshiharu; Nishi, Takeshi; Yamazaki, Shunpei, Electro-optical device.
  14. Kurosaki Minako,JPX ; Midorikawa Teruyuki,JPX, LCD and fabrication method thereof having a pedestal and overlying organic film at a periphery of the display.
  15. Liu, Hsiang Lung; Wu, Hsu Ho; Wu, Tai Kang, Liquid crystal display and method for manufacturing the same.
  16. Zhang, Hongyong, Liquid crystal display device.
  17. Hirakata, Yoshiharu; Nishi, Takeshi; Yamazaki, Shunpei, Liquid crystal display device having a gap retaining member made of resin formed directly over the driver circuit.
  18. Zhang,Hongyong, Liquid crystal display device having a particular conductive layer.
  19. Zhang, Hongyong, Liquid crystal display device having particular conductive layer.
  20. Zhang, Hongyong, Liquid crystal display device having particular conductive layer.
  21. Zhang, Hongyong, Liquid crystal display device having particular conductive layers.
  22. Zhang,Hongyong, Liquid crystal display device having plurality of conductive layers between a substrate and sealing member and insulated by insulating film.
  23. Song In Duk,KRX, Liquid crystal display having only one common line extending along substrate edge.
  24. Song In Duk,KRX, Liquid crystal display having only one common line extending along the edge of substrate without connection pads.
  25. Matsumoto, Kimikazu, Liquid crystal display unit with spacer less damaged in washing solution and process for fabrication thereof.
  26. Moon Dae-Gyu,KRX, Liquid crystal display with increased aperture ratio.
  27. Moon Dae-Gyu,KRX, Method of fabricating liquid crystal display with increased aperture ratio.
  28. Yamazaki,Shunpei; Ohtani,Hisashi; Ohnuma,Hideto, Method of manufacturing a semiconductor device.
  29. Hirakata, Yoshiharu; Nishi, Takeshi; Yamazaki, Shunpei, Method of manufacturing an electro-optical device.
  30. Yoshiharu Hirakata JP; Takeshi Nishi JP; Shunpei Yamazaki JP, Method of manufacturing an electro-optical device.
  31. Seong Woo Suh, Seal pattern for liquid crystal device.
  32. Murakami,Satoshi; Hirakata,Yoshiharu; Fujimoto,Etsuko; Yamazaki,Yu; Yamazaki,Shunpei, Semiconductor device.
  33. Yamazaki, Shunpei; Arai, Yasuyuki; Koyama, Jun, Semiconductor device and fabrication method thereof.
  34. Yamazaki, Shunpei; Arai, Yasuyuki; Koyama, Jun, Semiconductor device and fabrication method thereof.
  35. Yamazaki, Shunpei; Arai, Yasuyuki; Koyama, Jun, Semiconductor device and fabrication method thereof.
  36. Hirakata, Yoshiharu; Goto, Yuugo; Kobayashi, Yuko; Yamazaki, Shunpei, Semiconductor device and method of fabricating the same.
  37. Hirakata, Yoshiharu; Goto, Yuugo; Kobayashi, Yuko; Yamazaki, Shunpei, Semiconductor device and method of fabricating the same.
  38. Hirakata, Yoshiharu; Goto, Yuugo; Kobayashi, Yuko; Yamazaki, Shunpei, Semiconductor device and method of fabricating the same.
  39. Hirakata, Yoshiharu; Goto, Yuugo; Kobayashi, Yuko; Yamazaki, Shunpei, Semiconductor device and method of fabricating the same.
  40. Hirakata, Yoshiharu; Goto, Yuugo; Kobayashi, Yuko; Yamazaki, Shunpei, Semiconductor device and method of fabricating the same.
  41. Hirakata, Yoshiharu; Goto, Yuugo; Kobayashi, Yuko; Yamazaki, Shunpei, Semiconductor device and method of fabricating the same.
  42. Hirakata, Yoshiharu; Goto, Yuugo; Kobayashi, Yuko; Yamazaki, Shunpei, Semiconductor device and method of fabricating the same.
  43. Hirakata,Yoshiharu; Goto,Yuugo; Kobayashi,Yuko; Yamazaki,Shunpei, Semiconductor device and method of fabricating the same.
  44. Kokubo, Chiho; Yamagata, Hirokazu; Yamazaki, Shunpei, Semiconductor device and method of fabricating the same.
  45. Kokubo, Chiho; Yamagata, Hirokazu; Yamazaki, Shunpei, Semiconductor device and method of fabricating the same.
  46. Kokubo, Chiho; Yamagata, Hirokazu; Yamazaki, Shunpei, Semiconductor device applying to the crystalline semiconductor film.
  47. Yamazaki, Shunpei; Arai, Yasuyuki; Koyama, Jun, Semiconductor device comprising a pixel unit including an auxiliary capacitor.
  48. Moon, Chang-Wook; Bourim, El Mostafa; Lee, Sung-Jin; Lee, Seung-Woon, Surface electron emission device array and thin film transistor inspection system using the same.
  49. Kane Robert H. ; Melnik George A., Uniform cell-gap spacing in LCD.
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