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Method for fabricating a semiconductor device using a catalyst introduction region 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • H01L-021/84
출원번호 US-0357648 (1994-12-16)
우선권정보 JP-0319904 (1993-12-20); JP-0063230 (1994-03-31); JP-0090356 (1994-04-27); JP-0139151 (1994-06-21)
발명자 / 주소
  • Makita Naoki (Nara JPX) Funai Takashi (Tenri JPX) Yamamoto Yoshitaka (Yamatokoriyama JPX) Mitani Yasuhiro (Habikino JPX) Nomura Katsumi (Tenri JPX) Miyamoto Tadayoshi (Tenri JPX) Kosai Takamasa (Tenr
출원인 / 주소
  • Sharp Kabushiki Kaisha (Osaka JPX 03)
인용정보 피인용 횟수 : 150  인용 특허 : 0

초록 ▼

Into an amorphous silicon film, catalyst elements for accelerating the crystallization are introduced. After patterning the amorphous silicon films in which the catalyst elements have been introduced into an island pattern, a heat treatment for the crystallization is conducted. Thus, the introduced

대표청구항 ▼

A method for fabricating a semiconductor device, comprising the steps of: (a) forming an amorphous silicon film on a substrate having an insulating surface in such a manner that the amorphous silicon film is patterned so as to form at least one island region and a catalyst element is selectively int

이 특허를 인용한 특허 (150)

  1. Kokubo, Chiho; Yamagata, Hirokazu; Yamazaki, Shunpei, Active matrix display device having a column-like spacer.
    상세보기
  2. Yamazaki Shunpei,JPX ; Kusumoto Naoto,JPX ; Tanaka Koichiro,JPX, Active matrix display device with TFTs of different refractive index.
    상세보기
  3. Yudasaka,Ichio; Tanaka,Hideki, Alignment method, method for manufacturing a semiconductor device, substrate for a semiconductor device, electronic equipment.
    상세보기
  4. Murakami, Satoshi; Hirakata, Yoshiharu; Fujimoto, Etsuko; Yamazaki, Yu; Yamazaki, Shunpei, Capacitor, semiconductor device and manufacturing method thereof.
    상세보기
  5. Murakami, Satoshi; Hirakata, Yoshiharu; Fujimoto, Etsuko; Yamazaki, Yu; Yamazaki, Shunpei, Capacitor, semiconductor device and manufacturing method thereof.
    상세보기
  6. Murakami,Satoshi; Hirakata,Yoshiharu; Fujimoto,Etsuko; Yamazaki,Yu; Yamazaki,Shunpei, Capacitor, semiconductor device and manufacturing method thereof.
    상세보기
  7. Shiba, Takeo; Hatano, Mutsuko; Yamaguchi, Shinya; Park, Seong-kee, Display device and a method for manufacturing the same.
    상세보기
  8. Shiba,Takeo; Hatano,Mutsuko; Yamaguchi,Shinya; Park,Seong kee, Display device and a method for manufacturing the same.
    상세보기
  9. Yamazaki Shunpei,JPX ; Teramoto Satoshi,JPX ; Koyama Jun,JPX ; Ogata Yasushi,JPX ; Hayakawa Masahiko,JPX ; Osame Mitsuaki,JPX, Display switch with double layered gate insulation and resinous interlayer dielectric.
    상세보기
  10. McCulloch David J.,GBX, Electronic device manufacture with a laser beam.
    상세보기
  11. Yamazaki,Shunpei; Teramoto,Satoshi; Koyama,Jun; Ogata,Yasushi; Hayakawa,Masahiko; Osame,Mitsuaki, Fabrication method of semiconductor device.
    상세보기
  12. Yamazaki,Shunpei; Teramoto,Satoshi; Koyama,Jun; Ogata,Yasushi; Hayakawa,Masahiko; Osame,Mitsuaki, Fabrication method of semiconductor device.
    상세보기
  13. Yamazaki, Shunpei; Koyama, Jun; Hirakata, Yoshiharu, Information processing device.
    상세보기
  14. Yamazaki, Shunpei; Ohtani, Hisashi; Hiroki, Masaaki; Tanaka, Koichiro; Shiga, Aiko; Akiba, Mai, Laser apparatus, laser irradiation method, manufacturing method for semiconductor device, semiconductor device, production system for semiconductor device using the laser apparatus, and electronic equipment.
    상세보기
  15. Yamazaki, Shunpei; Ohtani, Hisashi; Hiroki, Masaaki; Tanaka, Koichiro; Shiga, Aiko; Murakami, Satoshi; Akiba, Mai, Laser irradiation apparatus.
    상세보기
  16. Yamazaki, Shunpei; Shibata, Hiroshi; Tanaka, Koichiro; Hiroki, Masaaki; Akiba, Mai, Laser irradiation method and method of manufacturing a semiconductor device.
    상세보기
  17. Ishihara Hiroaki,JPX ; Nakashita Kazuhisa,JPX ; Ohnuma Hideto,JPX ; Tanaka Nobuhiro,JPX ; Adachi Hiroki,JPX, Laser processing apparatus and laser processing process.
    상세보기
  18. Ishihara, Hiroaki; Nakashita, Kazuhisa; Ohnuma, Hideto; Tanaka, Nobuhiro; Adachi, Hiroki, Laser processing apparatus and laser processing process.
    상세보기
  19. Ohnuma, Hideto; Tanaka, Nobuhiro; Adachi, Hiroki, Laser processing apparatus and laser processing process.
    상세보기
  20. Ohnuma,Hideto; Tanaka,Nobuhiro; Adachi,Hiroki, Laser processing apparatus and laser processing process.
    상세보기
  21. Jung, Yun-Ho, Liquid crystal display device having drive circuit.
    상세보기
  22. Jung,Yun Ho, Liquid crystal display device having drive circuit and fabricating method thereof.
    상세보기
  23. Faur, Maria; Faur, Horia M.; Faur, Mircea, Low metallic impurity SiO based thin film dielectrics on semiconductor substrates using a room temperature wet chemical growth process, method and applications thereof.
    상세보기
  24. Yamazaki, Shunpei; Shimomura, Akihisa; Ohtani, Hisashi; Hiroki, Masaaki; Tanaka, Koichiro; Shiga, Aiko; Akiba, Mai; Kasahara, Kenji, Manufacturing method for a semiconductor device using a marker on an amorphous semiconductor film to selectively crystallize a region with a laser light.
    상세보기
  25. Yamazaki,Shunpei; Shimomura,Akihisa; Ohtani,Hisashi; Hiroki,Masaaki; Tanaka,Koichiro; Shiga,Aiko; Akiba,Mai; Kasahara,Kenji, Manufacturing method for a thin film transistor that uses a pulse oscillation laser crystallize an amorphous semiconductor film.
    상세보기
  26. Yamazaki,Shunpei; Teramoto,Satoshi; Koyama,Jun; Ogata,Yasushi; Hayakawa,Masahiko; Osame,Mitsuaki, Method for fabricating a semiconductor device.
    상세보기
  27. Yamazaki,Shunpei; Teramoto,Satoshi; Koyama,Jun; Ogata,Yasushi; Hayakawa,Masahiko; Osame,Mitsuaki, Method for fabricating a semiconductor device.
    상세보기
  28. Shunpei Yamazaki JP; Satoshi Teramoto JP; Jun Koyama JP; Yasushi Ogata JP; Masahiko Hayakawa JP; Mitsuaki Osame JP, Method for fabricating a semiconductor device using a metal catalyst and high temperature crystallization.
    상세보기
  29. Maekawa,Shinji; Akimoto,Kengo, Method for fabricating thin film transistor.
    상세보기
  30. Muramatsu, Shinichi; Minakawa, Yasushi; Oka, Fumihito; Sasaki, Tadashi, Method for forming crystalline silicon layer and crystalline silicon semiconductor device.
    상세보기
  31. Tanabe,Hiroshi, Method for forming semiconductor films at desired positions on a substrate.
    상세보기
  32. Yamazaki, Shunpei; Ohtani, Hisashi; Miyanaga, Akiharu; Teramoto, Satoshi, Method for manufacturing a semiconductor thin film.
    상세보기
  33. Azami, Munehiro; Kokubo, Chiho; Shiga, Aiko; Isobe, Atsuo; Shibata, Hiroshi; Yamazaki, Shunpei, Method for manufacturing semiconductor device.
    상세보기
  34. Azami, Munehiro; Kokubo, Chiho; Shiga, Aiko; Isobe, Atsuo; Shibata, Hiroshi; Yamazaki, Shunpei, Method for manufacturing semiconductor device.
    상세보기
  35. Azami,Munehiro; Kokubo,Chiho; Shiga,Aiko; Isobe,Atsuo; Shibata,Hiroshi; Yamazaki,Shunpei, Method for manufacturing semiconductor device.
    상세보기
  36. Ohtani, Hisashi; Miyanaga, Akiharu; Teramoto, Satoshi; Yamazaki, Shunpei, Method for manufacturing semiconductor device.
    상세보기
  37. Ohtani, Hisashi; Miyanaga, Akiharu; Zhang, Hongyong; Yamaguchi, Naoaki, Method for manufacturing semiconductor device.
    상세보기
  38. Kusumoto Naoto,JPX ; Yamazaki Shunpei,JPX, Method for producing insulated gate thin film semiconductor device.
    상세보기
  39. Kusumoto Naoto,JPX ; Yamazaki Shunpei,JPX, Method for producing insulated gate thin film semiconductor device.
    상세보기
  40. Kusumoto, Naoto; Yamazaki, Shunpei, Method for producing insulated gate thin film semiconductor device.
    상세보기
  41. Kusumoto, Naoto; Yamazaki, Shunpei, Method for producing insulated gate thin film semiconductor device.
    상세보기
  42. Kusumoto, Naoto; Yamazaki, Shunpei, Method for producing insulated gate thin film semiconductor device.
    상세보기
  43. Kusumoto,Naoto; Yamazaki,Shunpei, Method for producing insulated gate thin film semiconductor device.
    상세보기
  44. Nakajima,Setsuo; Yamazaki,Shunpei; Kusumoto,Naoto; Teramoto,Satoshi, Method for producing semiconductor device.
    상세보기
  45. Shunpei Yamazaki JP, Method of crystallizing a semiconductor layer in a MIS transistor.
    상세보기
  46. Yamazaki, Shunpei, Method of fabricating a MIS transistor.
    상세보기
  47. Yamazaki,Shunpei, Method of fabricating a MIS transistor.
    상세보기
  48. Fukunaga,Takeshi; Ohtani,Hisashi; Miyanaga,Akiharu, Method of fabricating a semiconductor device utilizing a catalyst material solution.
    상세보기
  49. Kokubo,Chiho; Shiga,Aiko; Tanada,Yoshifumi; Yamazaki,Shunpei, Method of fabricating a semiconductor device utilizing crystallization of semiconductor region with laser beam.
    상세보기
  50. Jung, Yun-Ho, Method of fabricating liquid crystal display device having drive circuit.
    상세보기
  51. Kim,Young Joo, Method of fabricating polycrystalline silicon.
    상세보기
  52. Kim,Young Joo, Method of fabricating polycrystalline silicon and switching device using polycrystalline silicon.
    상세보기
  53. Naoto Kusumoto JP; Yasuhiko Takemura JP; Hisashi Ohtani JP, Method of fabrication of a crystalline silicon thin film semiconductor with a thin channel region.
    상세보기
  54. Yamazaki,Shunpei; Ohnuma,Hideto; Takano,Tamae; Ohtani,Hisashi, Method of making semiconductor device.
    상세보기
  55. Hisashi Ohtani JP; Akiharu Miyanaga JP; Junichi Takeyama JP, Method of manufacturing a semiconductor device.
    상세보기
  56. Yamazaki, Shunpei; Nakamura, Osama; Kajiwara, Masayuki; Koezuka, Junichi; Dairiki, Koji; Mitsuki, Toru; Takayama, Toru; Ohnuma, Hideto; Asami, Taketomi; Ichijo, Mitsuhiro, Method of manufacturing a semiconductor device.
    상세보기
  57. Yamazaki,Shunpei; Ohnuma,Hideto; Dairiki,Koji; Mitsuki,Toru; Takayama,Toru; Akimoto,Kengo, Method of manufacturing a semiconductor device.
    상세보기
  58. Yamazaki,Shunpei; Ohtani,Hisashi; Hamatani,Toshiji, Method of manufacturing a semiconductor device.
    상세보기
  59. Yamazaki,Shunpei; Ohtani,Hisashi; Ohnuma,Hideto, Method of manufacturing a semiconductor device.
    상세보기
  60. Hamada,Takashi; Murakami,Satoshi; Yamazaki,Shunpei; Nakamura,Osamu; Kajiwara,Masayuki; Koezuka,Junichi; Takayama,Toru, Method of manufacturing a semiconductor device comprising doping steps using gate electrodes and resists as masks.
    상세보기
  61. Ohtani,Hisashi; Koyama,Jun; Ogata,Yasushi; Yamazaki,Shunpei, Method of manufacturing a semiconductor device having TFTs with uniform characteristics.
    상세보기
  62. Yamazaki,Shunpei; Shibata,Hiroshi; Tanaka,Koichiro; Hiroki,Masaaki; Akiba,Mai, Method of manufacturing a semiconductor device that includes patterning sub-islands.
    상세보기
  63. Nakamura, Osamu; Yamazaki, Shunpei; Dairiki, Koji; Kajiwara, Masayuki; Koezuka, Junichi; Murakami, Satoshi, Method of manufacturing semiconductor device.
    상세보기
  64. Nakamura,Osamu; Yamazaki,Shunpei; Dairiki,Koji; Kajiwara,Masayuki; Koezuka,Junichi; Murakami,Satoshi, Method of manufacturing semiconductor device.
    상세보기
  65. Yamazaki,Shunpei; Mitsuki,Toru, Method of manufacturing semiconductor device.
    상세보기
  66. Yamazaki, Shunpei; Nakamura, Osamu; Kajiwara, Masayuki; Koezuka, Junichi, Method of manufacturing semiconductor device and semiconductor device.
    상세보기
  67. Yamazaki,Shunpei; Nakamura,Osamu; Kajiwara,Masayuki; Koezuka,Junichi, Method of manufacturing semiconductor device that includes selectively adding a noble gas element.
    상세보기
  68. Yamazaki Shunpei,JPX ; Kusumoto Naoto,JPX ; Tanaka Koichiro,JPX, Method of producing a semiconductor device with overlapped scanned linear lasers.
    상세보기
  69. Shimmura,Tadashi, Methods of manufacturing semiconductor thin film, electronic device and liquid crystal display device.
    상세보기
  70. Yamazaki,Shunpei; Ohtani,Hisashi; Mitsuki,Toru; Ohnuma,Hideto; Takano,Tamae; Kasahara,Kenji; Dairiki,Koji, Process for manufacturing a semiconductor device.
    상세보기
  71. Yamazaki,Shunpei; Ohtani,Hisashi; Mitsuki,Toru; Ohnuma,Hideto; Takano,Tamae; Kasahara,Kenji; Dairiki,Koji, Process for manufacturing a semiconductor device.
    상세보기
  72. Yamazaki,Shunpei; Arai,Yasuyuki, Process for producing a photoelectric conversion device that includes using a gettering process.
    상세보기
  73. Miyanaga, Akiharu; Mukao, Kyouichi, Program for controlling laser apparatus and recording medium for recording program for controlling laser apparatus and capable of being read out by computer.
    상세보기
  74. Miyanaga, Akiharu; Mukao, Kyouichi, Program for controlling laser apparatus and recording medium for recording program for controlling laser apparatus and capable of being read out by computer.
    상세보기
  75. Miyanaga,Akiharu; Mukao,Kyouichi, Program for controlling laser apparatus and recording medium for recording program for controlling laser apparatus and capable of being read out by computer.
    상세보기
  76. Yamazaki,Shunpei; Ohtani,Hisashi; Hayakawa,Masahiko, Projection television set.
    상세보기
  77. Yamazaki, Shunpei; Teramoto, Satoshi; Koyama, Jun; Ogata, Yasushi; Hayakawa, Masahiko; Osame, Mitsuaki; Ohtani, Hisashi; Hamatani, Toshiji, Semiconductor active region of TFTs having radial crystal grains through the whole area of the region.
    상세보기
  78. Kokubo, Chiho; Yamagata, Hirokazu; Yamazaki, Shunpei, Semiconductor comprising a TFT provided on a substrate having an insulating surface and method of fabricating the same.
    상세보기
  79. Murakami,Satoshi; Hirakata,Yoshiharu; Fujimoto,Etsuko; Yamazaki,Yu; Yamazaki,Shunpei, Semiconductor device.
    상세보기
  80. Yamazaki Shunpei,JPX ; Teramoto Satoshi,JPX ; Koyama Jun,JPX ; Ogata Yasushi,JPX ; Hayakawa Masahiko,JPX ; Osame Mitsuaki,JPX, Semiconductor device and fabrication method thereof.
    상세보기
  81. Yamazaki, Shunpei; Teramoto, Satoshi; Koyama, Jun; Ogata, Yasushi; Hayakawa, Masahiko; Osame, Mitsuaki, Semiconductor device and fabrication method thereof.
    상세보기
  82. Nakajima, Setsuo; Kawasaki, Ritsuko, Semiconductor device and its manufacturing method.
    상세보기
  83. Nakajima,Setsuo; Kawasaki,Ritsuko, Semiconductor device and its manufacturing method.
    상세보기
  84. Shunpei Yamazaki JP; Satoshi Teramoto JP; Jun Koyama JP; Yasushi Ogata JP; Masahiko Hayakawa JP; Mitsuaki Osame JP; Hisashi Ohtani JP; Toshiji Hamatani JP, Semiconductor device and its manufacturing method.
    상세보기
  85. Yamazaki, Shunpei; Teramoto, Satoshi; Koyama, Jun; Ogata, Yasushi; Hayakawa, Masahiko; Osame, Mitsuaki; Ohtani, Hisashi; Hamatani, Toshiji, Semiconductor device and its manufacturing method.
    상세보기
  86. Yamazaki, Shunpei; Teramoto, Satoshi; Koyama, Jun; Ogata, Yasushi; Hayakawa, Masahiko; Osame, Mitsuaki; Ohtani, Hisashi; Hamatani, Toshiji, Semiconductor device and its manufacturing method.
    상세보기
  87. Yamazaki,Shunpei; Teramoto,Satoshi; Koyama,Jun; Ogata,Yasushi; Hayakawa,Masahiko; Osame,Mitsuaki; Ohtani,Hisashi; Hamatani,Toshiji, Semiconductor device and its manufacturing method.
    상세보기
  88. Nakamura, Osamu; Kajiwara, Masayuki; Yamazaki, Shunpei; Ohnuma, Hideto, Semiconductor device and manufacturing method of the same.
    상세보기
  89. Nakamura,Osamu; Kajiwara,Masayuki; Yamazaki,Shunpei; Ohnuma,Hideto, Semiconductor device and manufacturing method of the same.
    상세보기
  90. Kokubo, Chiho; Shiga, Aiko; Tanada, Yoshifumi; Yamazaki, Shunpei, Semiconductor device and manufacturing method therefor.
    상세보기
  91. Yamazaki, Shunpei; Teramoto, Satoshi; Koyama, Jun; Ogata, Yasushi; Hayakawa, Masahiko; Osame, Mitsuaki; Ohtani, Hisashi; Hamatani, Toshiji, Semiconductor device and method for fabricating the same.
    상세보기
  92. Yamazaki, Shunpei; Teramoto, Satoshi; Koyama, Jun; Ogata, Yasushi; Hayakawa, Masahiko; Osame, Mitsuaki; Ohtani, Hisashi; Hamatani, Toshiji, Semiconductor device and method for fabricating the same.
    상세보기
  93. Yamazaki,Shunpei; Teramoto,Satoshi; Koyama,Jun; Ogata,Yasushi; Hayakawa,Masahiko; Osame,Mitsuaki; Ohtani,Hisashi; Hamatani,Toshiji, Semiconductor device and method for fabricating the same.
    상세보기
  94. Teramoto, Satoshi, Semiconductor device and method for forming the same.
    상세보기
  95. Miyanaga, Akiharu; Ohtani, Hisashi; Takemura, Yasuhiko, Semiconductor device and method for manufacturing the same.
    상세보기
  96. Miyanaga, Akiharu; Ohtani, Hisashi; Takemura, Yasuhiko, Semiconductor device and method for manufacturing the same.
    상세보기
  97. Miyanaga,Akiharu; Ohtani,Hisashi; Takemura,Yasuhiko, Semiconductor device and method for manufacturing the same.
    상세보기
  98. Nakamura,Osamu; Kajiwara,Masayuki; Koezuka,Junichi; Yamazaki,Shunpei; Kuwabara,Hideaki, Semiconductor device and method for manufacturing the same.
    상세보기
  99. Yamazaki Shunpei,JPX ; Ohtani Hisashi,JPX ; Miyanaga Akiharu,JPX ; Teramoto Satoshi,JPX, Semiconductor device and method for producing the same.
    상세보기
  100. Yamazaki, Shunpei; Kusumoto, Naoto; Tanaka, Koichiro, Semiconductor device and method for producing the same.
    상세보기
  101. Yamazaki, Shunpei; Teramoto, Satoshi; Koyama, Jun; Ogata, Yasushi; Hayakawa, Masahiko; Osame, Mitsuaki; Ohtani, Hisashi; Hamatani, Toshiji, Semiconductor device and method of fabricating same.
    상세보기
  102. Yamazaki,Shunpei; Teramoto,Satoshi; Koyama,Jun; Ogata,Yasushi; Hayakawa,Masahiko; Osame,Mitsuaki; Ohtani,Hisashi; Hamatani,Toshiji, Semiconductor device and method of fabricating same.
    상세보기
  103. Hirakata, Yoshiharu; Goto, Yuugo; Kobayashi, Yuko; Yamazaki, Shunpei, Semiconductor device and method of fabricating the same.
    상세보기
  104. Hirakata, Yoshiharu; Goto, Yuugo; Kobayashi, Yuko; Yamazaki, Shunpei, Semiconductor device and method of fabricating the same.
    상세보기
  105. Hirakata, Yoshiharu; Goto, Yuugo; Kobayashi, Yuko; Yamazaki, Shunpei, Semiconductor device and method of fabricating the same.
    상세보기
  106. Hirakata, Yoshiharu; Goto, Yuugo; Kobayashi, Yuko; Yamazaki, Shunpei, Semiconductor device and method of fabricating the same.
    상세보기
  107. Hirakata, Yoshiharu; Goto, Yuugo; Kobayashi, Yuko; Yamazaki, Shunpei, Semiconductor device and method of fabricating the same.
    상세보기
  108. Hirakata, Yoshiharu; Goto, Yuugo; Kobayashi, Yuko; Yamazaki, Shunpei, Semiconductor device and method of fabricating the same.
    상세보기
  109. Hirakata,Yoshiharu; Goto,Yuugo; Kobayashi,Yuko; Yamazaki,Shunpei, Semiconductor device and method of fabricating the same.
    상세보기
  110. Kokubo, Chiho; Yamagata, Hirokazu; Yamazaki, Shunpei, Semiconductor device and method of fabricating the same.
    상세보기
  111. Kokubo, Chiho; Yamagata, Hirokazu; Yamazaki, Shunpei, Semiconductor device and method of fabricating the same.
    상세보기
  112. Hamada, Takashi; Murakami, Satoshi; Yamazaki, Shunpei; Nakamura, Osamu; Kajiwara, Masayuki; Koezuka, Junichi; Takayama, Toru, Semiconductor device and method of manufacturing the same.
    상세보기
  113. Hamada,Takashi; Murakami,Satoshi; Yamazaki,Shunpei; Nakamura,Osamu; Kajiwara,Masayuki; Koezuka,Junichi; Takayama,Toru, Semiconductor device and method of manufacturing the same.
    상세보기
  114. Isobe, Atsuo; Yamazaki, Shunpei; Kokubo, Chiho; Tanaka, Koichiro; Shimomura, Akihisa; Arao, Tatsuya; Miyairi, Hidekazu, Semiconductor device and method of manufacturing the same.
    상세보기
  115. Isobe, Atsuo; Yamazaki, Shunpei; Kokubo, Chiho; Tanaka, Koichiro; Shimomura, Akihisa; Arao, Tatsuya; Miyairi, Hidekazu; Akiba, Mai, Semiconductor device and method of manufacturing the same.
    상세보기
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    상세보기
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    상세보기
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    상세보기
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    상세보기
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    상세보기
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    상세보기
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    상세보기
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    상세보기
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    상세보기
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    상세보기
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    상세보기
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    상세보기
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    상세보기
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    상세보기
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    상세보기
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    상세보기
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    상세보기
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    상세보기
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    상세보기
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    상세보기
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    상세보기
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    상세보기
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    상세보기
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    상세보기
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    상세보기
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    상세보기
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    상세보기
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    상세보기
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    상세보기
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    상세보기
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    상세보기
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    상세보기
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    상세보기
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    상세보기

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