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Surface inspection system and method of inspecting surface of workpiece 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • G01N-021/88
출원번호 US-0399962 (1995-03-06)
발명자 / 주소
  • Clementi Lee D.
  • Fossey Michael E.
출원인 / 주소
  • ADE Optical Systems Corporation
대리인 / 주소
    Bell, Seltzer, Park & Gibson, P.A.
인용정보 피인용 횟수 : 92  인용 특허 : 21

초록

A surface inspection system and methods of inspecting a surface of a workpiece are provided for detecting particles, defects, or other surface characteristics in or on a surface of the workpiece. The surface inspection system preferably has a transporter arranged for transporting a workpiece along a

대표청구항

[ That which is claimed:] [1.] A surface inspection system for detecting particles or defects on a surface of a workpiece, the surface inspection system comprising:means for translationally transporting a workpiece along a material path;means associated with said transporting means for rotating a wo

이 특허에 인용된 특허 (21)

  1. Hayano Fuminori (Fujisawa JPX) Imamura Kazunori (Tokyo JPX) Murata Sunao (Kawasaki JPX) Kato Kinya (Tokyo JPX), Apparatus with four light detectors for checking surface of mask with pellicle.
  2. Moran Kevin E. (Belmont NC), Compact laser scanning system.
  3. Batchelder John S. (Somers NY) Taubenblatt Marc A. (Pleasantville NY), Dark field imaging defect inspection system for repetitive pattern integrated circuits.
  4. Steigmeier Edgar F. (Hedingen CHX) Knop Karl (Zurich CHX), Defect detection system.
  5. Gross Abraham (Rehovot) Halevi Eviatar (Maccabim) Carmeli Ran (Petach-Tikva ILX), High resolution two-directional optical scanner.
  6. Hayano Fuminori (Kamakura JPX) Imamura Kazunori (Tokyo JPX) Murata Sunao (Kawasaki JPX), Inspecting apparatus for determining presence and location of foreign particles on reticles or pellicles.
  7. Yoshii Minoru (Tokyo JPX) Nose Noriyuki (Atsugi JPX) Suzuki Masayuki (Hadano JPX) Miyazaki Kyoichi (Mitaka JPX) Tsuji Toshihiko (Ayase JPX) Takeuchi Seiji (Kawasaki JPX), Inspection apparatus for detecting foreign matter on a surface to be inspected, and an exposure apparatus and a device m.
  8. Tomoyasu Masayuki (Nirasaki JPX), Laser beam scanning system.
  9. Whitney, Theodore R., Laser pattern generating system.
  10. Moran Kevin E. (Belmont NC) Smith Michael L. (Matthews NC) Lippard ; III Ernest R. (Charlotte NC), Method and apparatus for inspecting reticles.
  11. Okada Saburo (Kure JPX) Sumimoto Tetsuhiro (Kure JPX) Imade Masaaki (Kure JPX) Miyauchi Hidekazu (Kure JPX), Method and apparatus for inspecting surface conditions.
  12. Moran Kevin E. (Belmont NC), Method and apparatus for low angle, high resolution surface inspection.
  13. Uto Sachio (Yokohama JPX) Ohshima Yoshimasa (Yokohama JPX), Method of and apparatus for inspecting surface defects.
  14. Malin Cosmas (Mauren LIX) Hoyle Philip (Vaduz LIX), Method of calibrating scanners and arrangement for producing defined scattered light amplitudes.
  15. Vaught John L. (Palo Alto CA) Neukermans Armand P. (Palo Alto CA) Keldermann Herman F. (Berkeley CA) Koenig Franklin R. (Palo Alto CA), Particle detection on patterned wafers and the like.
  16. Jann Peter C. (Santa Clara CA) Gross Kenneth P. (San Carlos CA) Neukermans Armand P. (Palo Alto CA), Particle detector for rough surfaces.
  17. Batchelder John S. (Tarrytown NY), Semiconductor wafer surface inspection apparatus and method.
  18. Yamazaki Yuichiro (Yokohama JPX) Miyoshi Motosuke (Fujisawa JPX) Ogawa Shigeru (Yokohama JPX) Okumura Katsuya (Yokohama JPX), Surface inspection method and apparatus therefor.
  19. Ohshima Ken (Tokyo JPX) Sakamoto Masaharu (Tokyo JPX), System for checking defects on a flat surface of an object.
  20. Yoshikawa Shoji (Tokyo JPX) Ohshima Ken (Tokyo JPX) Kodama Hiroshi (Tokyo JPX) Yamamiya Kunio (Tokyo JPX) Sakamoto Masaharu (Tokyo JPX) Kato Kiichi (Tokyo JPX), System for detecting defects on an optical surface.
  21. Heebner Richard W. (Solebury Township ; Bucks County PA) Schmitt Randal L. (Plainsboro Township ; Middlesex County NJ), Technique for inspecting semiconductor wafers for particulate contamination.

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