초록 ▼

After a pattern transfer of a first pattern image to a lower photo-sensitive layer of first material, a second pattern image is transferred to an upper photo-sensitive layer of second material higher in photo-sensitivity than the first material, and the first image and the second image are concurren

After a pattern transfer of a first pattern image to a lower photo-sensitive layer of first material, a second pattern image is transferred to an upper photo-sensitive layer of second material higher in photo-sensitivity than the first material, and the first image and the second image are concurrently developed so as to form a composite etching mask through a simple process.

대표청구항 ▼

[ What is claimed is:] [1.] A semiconductor integrated circuit device comprising: at least one circuit component; anda multi-level wiring structure coupled to said at least one circuit component for forming an integrated circuit, and includingat least one lower wiring,a lower inter-level insulating

[ What is claimed is:] [1.] A semiconductor integrated circuit device comprising: at least one circuit component; anda multi-level wiring structure coupled to said at least one circuit component for forming an integrated circuit, and includingat least one lower wiring,a lower inter-level insulating layer formed of first photo-sensitive organic material and over said at least lower wiring and having a hole, said at least one lower wiring being exposed to said hole,an upper inter-level insulating layer formed of second photo-sensitive organic material higher in photo-sensitivity than said first photo-sensitive organic material and having a plurality of grooves, one of said plurality of grooves being connected to said hole,an interconnection formed in said hole and held in contact with said at least one lower wiring, anda plurality of upper wirings formed in said plurality of grooves, an upper wiring formed in said one of said plurality of grooves being held in contact with said interconnection.