$\require{mediawiki-texvc}$

연합인증

연합인증 가입 기관의 연구자들은 소속기관의 인증정보(ID와 암호)를 이용해 다른 대학, 연구기관, 서비스 공급자의 다양한 온라인 자원과 연구 데이터를 이용할 수 있습니다.

이는 여행자가 자국에서 발행 받은 여권으로 세계 각국을 자유롭게 여행할 수 있는 것과 같습니다.

연합인증으로 이용이 가능한 서비스는 NTIS, DataON, Edison, Kafe, Webinar 등이 있습니다.

한번의 인증절차만으로 연합인증 가입 서비스에 추가 로그인 없이 이용이 가능합니다.

다만, 연합인증을 위해서는 최초 1회만 인증 절차가 필요합니다. (회원이 아닐 경우 회원 가입이 필요합니다.)

연합인증 절차는 다음과 같습니다.

최초이용시에는
ScienceON에 로그인 → 연합인증 서비스 접속 → 로그인 (본인 확인 또는 회원가입) → 서비스 이용

그 이후에는
ScienceON 로그인 → 연합인증 서비스 접속 → 서비스 이용

연합인증을 활용하시면 KISTI가 제공하는 다양한 서비스를 편리하게 이용하실 수 있습니다.

Clean transfer method and apparatus therefor 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • B65G-049/07
출원번호 US-0391609 (1995-02-21)
우선권정보 JP-0047734 (1994-02-22)
발명자 / 주소
  • Masujima Sho,JPX
  • Miyauchi Eisaku,JPX
  • Miyajima Toshihiko,JPX
  • Watanabe Hideaki,JPX
출원인 / 주소
  • TDK Corporation, JPX
대리인 / 주소
    Lerner, David, Littenberg, Krumholz & Mentlik
인용정보 피인용 횟수 : 25  인용 특허 : 13

초록

A clean transfer method and an apparatus therefor capable of facilitating storage and transfer of transferred objects by a vacuum clean box and realizing transfer of the objects to various processing units other than a vacuum unit. A vacuum clean box and a clean unit are airtightly connected to each

대표청구항

[ What is claimed is:] [1.] A clean transfer apparatus comprising:a vacuum clean box including a box body provided with a first opening and a first shutter acting also as a lid which airtightly closes said first opening;said vacuum clean box being constructed so as to provide airtightness sufficient

이 특허에 인용된 특허 (13)

  1. Davis Cecil J. (Greenville TX) Wooldridge Timothy J. (Richardson TX) Carter Duane E. (Plano TX), Advanced vacuum processor.
  2. Boyle Edward F. (Gig Harbor WA) Wilkins G. Scott (Gig Harbor WA), Apparatus for handling sensitive material such as semiconductor wafers.
  3. Vierny Oskar U. (Palo Alto CA) Salzman Philip M. (San Jose CA), Controlled environment enclosure and mechanical interface.
  4. Kawano Hitoshi (Ise JPX) Yamashita Teppei (Ise JPX) Murata Masanao (Ise JPX) Tanaka Tsuyoshi (Ise JPX) Morita Teruya (Ise JPX) Okuno Atsushi (Ise JPX) Hayashi Mitsuhiro (Ise JPX) Nakamura Akio (Ise J, Gas purge unit for a portable container.
  5. Davis Cecil J. (Greenville TX) Matthews Robert (Plano TX) Bowling Robert A. (Garland TX), Integrated circuit processing system.
  6. Tullis Barclay J. (Palo Alto CA) ..AP: Hewlett-Packard Company (Palo Alto CA 02), Interlocking door latch for dockable interface for integrated circuit processing.
  7. Bonora Anthony C. (Menlo Park CA) Guerre Gilles (Les Loges en Josas CA FRX) Parikh Mihir (San Jose CA) Rosenquist Frederick T. (Redwood City CA) Jain Sudhir (Santa Clara CA), Method and apparatus for transferring articles between two controlled environments.
  8. Krueger Gordon P. (San Jose CA), Micro-enviroment load lock.
  9. Maney George A. (Palo Alto CA) O\Sullivan Andrew W. (Gilroy CA) Faraco W. George (Saratoga CA), Sealed standard interface apparatus.
  10. Grohrock Peter (Hoehenkirchen DEX), Transport container with an interchangeable inside container.
  11. Davis Cecil J. (Greenville TX) Matthews Robert (Plano TX) Hildenbrand Randall C. (Richardson TX), Vacuum processing system.
  12. Davis Cecil J. (Greenville TX) Matthews Robert (Plano TX), Vacuum slice carrier.
  13. Foster Leonard W. (Richardson TX) Millis Edwin G. (Dallas TX), Vented vacuum semiconductor wafer cassette.

이 특허를 인용한 특허 (25)

  1. Conboy Michael R. ; Shedd Danny C. ; Coss ; Jr. Elfido, Automated material handling system for a manufacturing facility divided into separate fabrication areas.
  2. Conboy,Michael R.; Shedd,Danny C.; Coss, Jr.,Elfido, Automated material handling system for a manufacturing facility divided into separate fabrication areas.
  3. Davis,Jeffrey A.; Curtis,Gary L., Automated semiconductor processing systems.
  4. Conboy Michael R. ; Goff Gerald L.,DEX ; Coss ; Jr. Elfido, Automated wafer transfer system.
  5. Boyd Trace L. ; Beer Richard D. ; Terbeek Eric A. ; Wong Vernon W. H., Chamber interfacing O-rings and method for implementing same.
  6. Miyajima Toshihiko,JPX, Clean box, clean transfer method and apparatus therefor.
  7. Miyajima, Toshihiko, Clean box, clean transfer method and apparatus therefor.
  8. Toshihiko Miyajima JP, Clean box, clean transfer method and apparatus therefor.
  9. Van De Ven,Bastiaan Lambertus Wilhelmus Marinus; Ham,Erik Leonardus, Lithographic apparatus and device manufacturing method.
  10. Klomp,Albert Jan Hendrik; Hoogkamp,Jan Frederik; Vugts,Josephus Cornelius Johannes Antonius; Livesey,Robert Gordon; Franssen,Johannes Hendrikus Gertrudis, Lithographic projection assembly, load lock and method for transferring objects.
  11. Van Groos,Pieter Johannes Marius; Hennus,Pieter Renaat Maria; Hoogkamp,Jan Frederik; Klomp,Albert Jan Hendrik; Onvlee,Johannes; Visser,Raimond, Lithographic projection assembly, substrate handling apparatus and substrate handling method.
  12. Klomp, Albert Jan Hendrik; Hoogkamp, Jan Frederik; Vugts, Josephus Cornelius Johannes Antonius; Livesey, Robert Gordon; Franssen, Johannes Hendrikus Gertrudis, Load lock and method for transferring objects.
  13. Nakano, Hitoshi, Load-lock chamber and exposure apparatus using the same.
  14. Morita Teruya,JPX ; Murata Masanao,JPX ; Kawano Hitoshi,JPX ; Tanaka Tsuyoshi,JPX ; Oyobe Hiroyuki,JPX ; Takaoka Toshiyuki,JPX, Mechanical interface apparatus.
  15. Van Groos, Pieter Johannes Marius; Hoogkamp, Jan Frederik; Vugts, Josephus Cornelius Johannes Antonius; Livesey, Robert Gordon; Franssen, Johannes Hendrikus Gertrudis; Klomp, Albert Jan Hendrik; Vermeulen, Johannes Petrus Martinus Bernardus; Loopstra, Erik Roelof, Method and apparatus for maintaining a machine part.
  16. Fosnight, William; Waite, Stephanie, Method and apparatus for storing and transporting semiconductor wafers in a vacuum pod.
  17. Saeki,Hiroaki; Sasaki,Yoshiaki; Matsushima,Keiichi; Taniyama,Yasushi; Hagiwara,Shuuji, Mounting/demounting device for wafer carrier lid.
  18. Kazunari Sakata JP; Tamotsu Tanifuji JP; Masahiro Ogawa JP, Opening and closing apparatus of an opening and closing lid of a box accommodating an object to be processed and a processing system of an object to be processed.
  19. Henrich Jurgen,DEX ; Ickes Gerd,DEX, Process for the loading and unloading of an evacuatable treatment chamber and handling device for carrying out the process.
  20. Thompson, Raymon F.; Berner, Robert W.; Curtis, Gary L.; Culliton, Stephen P.; Wright, Blaine G.; Byle, Darryl S., Semiconductor processing system with wafer container docking and loading station.
  21. Thompson, Raymond F.; Berner, Robert W.; Curtis, Gary L.; Culliton, Stephen P.; Wright, Blaine G., Semiconductor processing system with wafer container docking and loading station.
  22. Iwasaki Junji,JPX ; Katsube Junichi,JPX ; Itami Yasushi,JPX, Semiconductor wafer cassette transportation apparatus and stocker used therein.
  23. Meulen, Peter van der, Substrate container sealing via movable magnets.
  24. Klomp,Albert Jan Hendrik; Hoogkamp,Jan Frederik; Visser,Raimond; Vugts,Josephus Cornelius Johannes Antonius; Vullings,Henricus Johannes Louis Marie; Kuipers,Leo Wilhelmus Maria; Franssen,Johannes Hendrikus Gertrudis, Temperature conditioned load lock, lithographic apparatus comprising such a load lock and method of manufacturing a substrate with such a load lock.
  25. Miyajima Toshihiko,JPX, Vacuum clean box, clean transfer method and apparatus therefor.
섹션별 컨텐츠 바로가기

AI-Helper ※ AI-Helper는 오픈소스 모델을 사용합니다.

AI-Helper 아이콘
AI-Helper
안녕하세요, AI-Helper입니다. 좌측 "선택된 텍스트"에서 텍스트를 선택하여 요약, 번역, 용어설명을 실행하세요.
※ AI-Helper는 부적절한 답변을 할 수 있습니다.

선택된 텍스트

맨위로