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Exposure apparatus for transferring a mask pattern onto a substrate 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • G03B-027/60
출원번호 US-0699787 (1996-08-20)
우선권정보 JP-0044051 (1994-03-15)
발명자 / 주소
  • Inoue Takashi,JPX
  • Nagano Hiroyuki,JPX
  • Ishii Yoshimichi,JPX
출원인 / 주소
  • Matsushita Electric Industrial Co., Ltd., JPX
대리인 / 주소
    Wenderoth, Lind & Ponack
인용정보 피인용 횟수 : 47  인용 특허 : 9

초록 ▼

An exposure method for irradiating a mask from above the mask held in proximity to a substrate positioned below the mask to transfer a mask pattern of the mask to a photosensitive layer of the substrate by exposing the photosensitive layer to a light beam, includes the steps of using a gap-measuring

대표청구항 ▼

[ What is claimed is:] [1.] An exposure apparatus for irradiating a mask from above the mask held in proximity to a substrate to transfer a mask pattern of the mask to the substrate by exposing the substrate to a light beam, comprising:a locally-irradiating means, for scanning the mask from above th

이 특허에 인용된 특허 (9)

  1. Kitaoka Atsushi (Ichikawa JPX) Saitoh Kenji (Yokohama JPX), Alignment method.
    상세보기
  2. Isohata Junji (Tokyo JPX) Matsushita Koichi (Chiba JPX) Yamamoto Hironori (Chigasaki JPX) Miyazaki Makoto (Yokohama JPX) Ozawa Kunitaka (Isehara JPX) Yoshinari Hideki (Yokohama JPX), Exposure apparatus.
    상세보기
  3. Isohata Junji (Tokyo JPX) Yamamoto Hironori (Chigasaki JPX) Matsushita Koichi (Chiba JPX), Exposure apparatus.
    상세보기
  4. Ohta Hirohisa (Sagamihara JPX) Ozawa Kunitaka (Isehara JPX) Kawakami Eigo (Ebina JPX) Uzawa Shunichi (Tokyo JPX), Exposure method.
    상세보기
  5. Inoue Takashi (Sakai JPX) Nagano Hiroyuki (Katano JPX) Ishii Yoshimichi (Neyagawa JPX), Exposure method and exposure apparatus.
    상세보기
  6. Taniguchi Motoya (Yokohama JPX) Koizumi Mitsuyoshi (Yokohama JPX) Akiyama Nobuyuki (Yokohama JPX) Kembo Yukio (Yokohama JPX) Ikeda Minoru (Yokohama JPX), Exposure process and system.
    상세보기
  7. Swanson Paul A. (3585 Millet Ct. San Jose CA 95127) Gibson John A. (655 Oneida Dr. Sunnyvale CA 94087) Knirck Jeffrey G. (868 Jasmine Dr. Sunnyvale CA 94086), Method and apparatus for transfer of a reticle pattern onto a substrate by scanning.
    상세보기
  8. Flanders Dale C. (Lexington MA) Lyszczarz Theodore M. (Concord MA), Optical gap measuring.
    상세보기
  9. Chapelle Walter (Southfield MI) Yaniv Zvi (Southfield MI) Baron Yair (Southfield MI), Step and repeat exposure apparatus and method.
    상세보기

이 특허를 인용한 특허 (47)

  1. GanapathiSubramanian,Mahadevan; Sreenivasan,Sldlgata V., Adaptive shape substrate support method.
    상세보기
  2. Nara Kei,JPX ; Miyazaki Seiji,JPX ; Koitabashi Hideki,JPX, Alignment method, exposure method, and exposure apparatus.
    상세보기
  3. Sreenivasan,Sidlgata V; Watts,Michael P. C.; Choi,Byung Jin; Voisin,Ronald D.; Schumaker,Norman E., Alignment systems for imprint lithography.
    상세보기
  4. Welch, Michael D.; Herchen, Harald, Apparatus and method for detecting a presence or position of a substrate.
    상세보기
  5. Cherala, Anshuman; Choi, Byung Jin; Lad, Pankaj B.; Shackleton, Steven C., Chucking system comprising an array of fluid chambers.
    상세보기
  6. Choi,Byung J.; Voisin,Ronald D.; Sreenivasan,Sidlgata V.; Watts,Michael P. C.; Babbs,Daniel; Meissl,Mario J.; Bailey,Hillman; Schumaker,Norman E., Chucking system for modulating shapes of substrates.
    상세보기
  7. Xu,Frank Y.; Miller,Michael N.; Watts,Michael P. C., Composition for an etching mask comprising a silicon-containing material.
    상세보기
  8. Bailey, Todd C.; Choi, Byung-Jin; Colburn, Matthew E.; Sreenivasan, Sidlgata V.; Willson, Carlton G.; Ekerdt, John G., Device for holding a template for use in imprint lithography.
    상세보기
  9. Nimmakayala, Pawan Kumar; Choi, Byung-Jin; Rafferty, Tom H.; Schumaker, Philip D., Enhanced multi channel alignment.
    상세보기
  10. Inao, Yasuhisa; Kuroda, Ryo; Mizutani, Natsuhiko, Exposure apparatus, exposure method, and exposure mask.
    상세보기
  11. Kuroda Ryo,JPX ; Ikeda Tsutomu,JPX ; Shimada Yasuhiro,JPX, Exposure method and exposure apparatus.
    상세보기
  12. Sreenivasan, S. V.; Choi, Byung J.; Colburn, Matthew; Bailey, Todd, High resolution overlay alignment systems for imprint lithography.
    상세보기
  13. Voisin, Ronald D., Imprint alignment method, system and template.
    상세보기
  14. Voisin, Ronald D., Imprint alignment method, system, and template.
    상세보기
  15. GanapathiSubramanian, Mahadevan; Choi, Byung-Jin; Meissl, Mario Johannes, Imprint lithography system and method.
    상세보기
  16. Sreenivasan,Sidlgata V.; Choi,Byung Jin; Colburn,Matthew E.; Bailey,Todd C., Imprint lithography system to produce light to impinge upon and polymerize a liquid in superimposition with template overlay marks.
    상세보기
  17. Sreenivasan,Sidlgata V.; Schumaker,Philip D., Imprint lithography template having opaque alignment marks.
    상세보기
  18. Nimmakayala,Pawan Kumar; Rafferty,Tom H.; Aghili,Alireza; Choi,Byung Jin; Schumaker,Philip D.; Babbs,Daniel A., Interferometric analysis for the manufacture of nano-scale devices.
    상세보기
  19. Nimmakayala, Pawan Kumar; Rafferty, Tom H.; Aghili, Alireza; Choi, Byung Jin; Schumaker, Philip D.; Babbs, Daniel A.; Truskett, Van N., Interferometric analysis method for the manufacture of nano-scale devices.
    상세보기
  20. Nimmakayala, Pawan Kumar; Rafferty, Tom H.; Aghili, Alireza; Choi, Byung-Jin; Schumaker, Philip D.; Babbs, Daniel A.; Truskett, Van Nguyen, Interferometric analysis method for the manufacture of nano-scale devices.
    상세보기
  21. Yoon,Ki Hyuk; Choi,Young Seok; Song,Byung Duck; Kwon,Soon Bum, Light irradiating device.
    상세보기
  22. Huang, Yang-Shan; Butler, Hans; Van Eijk, Jan; Hol, Sven Antoin Johan; Van Der Pasch, Engelbertus Antonius Fransiscus; Van De Ven, Bastiaan Lambertus Wilhelmus Marinus; Vermeulen, Johannes Petrus Martinus Bernardus; Cadee, Theodorus Petrus Maria; Van Leeuwen, Robbert Edgar, Lithographic apparatus, method of deforming a substrate table and device manufacturing method.
    상세보기
  23. Nimmakayala,Pawan K.; Sreenivasan,Sidlgata V.; Choi,Byung Jin; Cherala,Anshuman, Magnification correction employing out-of-plane distortion of a substrate.
    상세보기
  24. Hirai, Yuma; Minoura, Kiyoshi; Nomura, Fumiyasu, Method and device for manufacturing sheet having fine shape transferred thereon.
    상세보기
  25. Hirai, Yuma; Minoura, Kiyoshi; Nomura, Fumiyasu, Method and device for manufacturing sheet having fine shape transferred thereon.
    상세보기
  26. Choi, Byung-Jin; Sreenivasan, Sidlgata V., Method and system for double-sided patterning of substrates.
    상세보기
  27. Choi, Byung-Jin; Sreenivasan, Sidlgata V.; McMackin, Ian Matthew; Lad, Pankaj B., Method for expelling gas positioned between a substrate and a mold.
    상세보기
  28. Choi, Byung J.; Voisin, Ronald D.; Sreenivasan, Sidlgata V.; Watts, Michael P. C.; Willson, C. Grant; Schumaker, Norman E.; Meissl, Mario J., Method for modulating shapes of substrates.
    상세보기
  29. Cherala, Anshuman; Sreenivasan, Sidlgata V.; Choi, Byung-Jin; Thompson, Ecron D., Method for obtaining force combinations for template deformation using nullspace and methods optimization techniques.
    상세보기
  30. Choi, Byung-Jin; Sreenivasan, Sidlgata V.; Willson, Carlton Grant; Colburn, Mattherw E.; Bailey, Todd C.; Ekerdt, John G., Method of automatic fluid dispensing for imprint lithography processes.
    상세보기
  31. Sreenivasan, Sidlgata V.; McMackin, Ian M.; Melliar-Smith, Christopher Mark; Choi, Byung-Jin, Method of concurrently patterning a substrate having a plurality of fields and a plurality of alignment marks.
    상세보기
  32. Sreenivasan,Sidlgata V.; Choi,Byung Jin; Colburn,Matthew E.; Bailey,Todd C., Method of determining alignment of a template and a substrate having a liquid disposed therebetween.
    상세보기
  33. Rubin, Daniel I., Method of reducing pattern distortions during imprint lithography processes.
    상세보기
  34. Choi, Byung Jin; Cherala, Anshuman; Babbs, Daniel A., Method of retaining a substrate to a wafer chuck.
    상세보기
  35. Choi, Byung Jin; Cherala, Anshuman; Choi, Yeong jun; Meissl, Mario J.; Sreenivasan, Sidlgata V.; Schumaker, Norman E.; Lu, Xiaoming; McMackin, Ian M.; Babbs, Daniel A., Method of separating a mold from a solidified layer disposed on a substrate.
    상세보기
  36. Sreenivasan, Sidlgata V.; Choi, Byung J.; Colburn, Matthew; Bailey, Todd, Method of varying template dimensions to achieve alignment during imprint lithography.
    상세보기
  37. Sreenivasan, Sidlgata V.; Watts, Michael P. C., Method to arrange features on a substrate to replicate features having minimal dimensional variability.
    상세보기
  38. Choi, Byung J.; Colburn, Matthew; Sreenivasan, S. V.; Willson, C. Grant; Bailey, Todd; Ekerdt, John, Methods for high-precision gap and orientation sensing between a transparent template and substrate for imprint lithography.
    상세보기
  39. Johnson Kenneth C., Microlens scanner for microlithography and wide-field confocal microscopy.
    상세보기
  40. Liu, Weijun; Xu, Frank Y., Nano-imprint lithography stack with enhanced adhesion between silicon-containing and non-silicon containing layers.
    상세보기
  41. Hogue, Eric L.; Krak, Stephen J.; Stanfield, Timothy J., Patterning non-planar surfaces.
    상세보기
  42. Choi, Byung-Jin; Sreenivasan, Sidlgata V., Patterning substrates employing multiple chucks.
    상세보기
  43. Shinji Suzuki JP, Process for controlling a gap between a mask and a workpiece in proximity exposure and a proximity exposure device.
    상세보기
  44. Watts,Michael P. C.; McMackin,Ian, Scatterometry alignment for imprint lithography.
    상세보기
  45. Cherala, Anshuman; Sreenivasan, Sidlgata V.; Adusumilli, Kranthimitra, System and method for improvement of alignment and overlay for microlithography.
    상세보기
  46. Cherala,Anshuman; Choi,Byung Jin; Nimmakayala,Pawan K.; Meissl,Mario J.; Sreenivasan,Sidlgata V., System for varying dimensions of a substrate during nanoscale manufacturing.
    상세보기
  47. Choi,Byung Jin; Sreenivasan,Sidlgata V.; Meissl,Mario J., Systems for magnification and distortion correction for imprint lithography processes.
    상세보기

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