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Composite metal membrane 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • B01D-053/22
  • B01D-071/02
출원번호 US-0484801 (1995-06-07)
발명자 / 주소
  • Peachey Nathaniel M.
  • Dye Robert C.
  • Snow Ronny C.
  • Birdsell Stephan A.
출원인 / 주소
  • The Regents of the University of California Office of Technology Transfer
대리인 / 주소
    Cottrell
인용정보 피인용 횟수 : 143  인용 특허 : 12

초록 ▼

A composite metal membrane including a first metal layer of Group IVB met or Group VB metals, the first metal layer sandwiched between two layers of an oriented metal of palladium, platinum or alloys thereof is provided together with a process for the recovery of hydrogen from a gaseous mixture incl

대표청구항 ▼

[ What is claimed is:] [1.] A process for the recovery of hydrogen from a gaseous mixture comprising:contacting a hydrogen-containing gaseous mixture with a first side of a nonporous composite metal membrane including a first metal layer selected from the group consisting of Group IVB metals and Gro

이 특허에 인용된 특허 (12)

  1. Vaiman Lev A. (Bellevue WA), Apparatus and method for extracting hydrogen.
    상세보기
  2. Edlund David J. (Redmond OR), Composite hydrogen separation metal membrane.
    상세보기
  3. Buxbaum Robert E. (811 Oak St. East Lansing MI 48823), Composite metal membrane for hydrogen extraction.
    상세보기
  4. Kirkpatrick Allen R. (Lexington MA), Diamond films and method of growing diamond films on nondiamond substrates.
    상세보기
  5. Hill Eugene F. (11517 Bianca Ave. Granada Hills CA 91344), Hydrogen separation using coated titanium alloys.
    상세보기
  6. Manier Karl-Heinz (Scheyern DEX) Wydra Gerhard (Oberschleissheim DEX), Iron-base alloy structural component having a corrosion-inhibiting coating, and method of producing the coating.
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  7. Przybysz John X. (Penn Hills PA), Method for forming refractory resistors with etch stop for superconductor integrated circuits.
    상세보기
  8. Buxbaum Robert E. (East Lansing MI) Hsu Peter C. (Overland Park KS), Method for plating palladium.
    상세보기
  9. Morimoto Kiyoshi (Mobara JP), Method of depositing III-V compounds on group IV element wafers by the cluster ion technique.
    상세보기
  10. Ando Yasunori (Kyoto JPX) Ogata Kiyoshi (Kyoto JPX), Method of forming a thin aluminum film.
    상세보기
  11. Brar Amarjit S. (Edina MN) Narayan Prativadi B. (Eden Prairie MN), Micro-contamination-free coating for die-cast component in magnetic disk drive.
    상세보기
  12. Kobayashi Masahiko (Fuchu JPX) Numajiri Kenji (Fuchu JPX), Thin film deposition method and apparatus.
    상세보기

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