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Electronic substrate processing system using portable closed containers 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • G26B-019/00
출원번호 US-0803818 (1997-02-24)
우선권정보 JP-0221475 (1992-08-20)
발명자 / 주소
  • Yamashita Teppei,JPX
  • Murata Masanao,JPX
  • Tanaka Tsuyoshi,JPX
  • Morita Teruya,JPX
  • Kawano Hitoshi,JPX
  • Hayashi Mitsuhiro,JPX
  • Okuno Atsushi,JPX
  • Nakamura Akio,JPX
출원인 / 주소
  • Shinko Electric Co., Ltd., JPX
대리인 / 주소
    Bacon & Thomas
인용정보 피인용 횟수 : 41  인용 특허 : 9

초록

Disclosed is an electronic substrate processing system comprising a processing equipment for processing electronic substrates including semiconductor wafers and liquid crystal substrates; a cleaning equipment for cleaning said electronic substrate in a predetermined processing step; a portable close

대표청구항

[ What is claimed is:] [4.] An electronic substrate processing system including a substrate cleaning system, said cleaning system including, in combination:at least one cassette for holding substrates to be processed;a housing enclosing the substrate cleaning system, said housing including a cassett

이 특허에 인용된 특허 (9)

  1. Kawano Hitoshi (Ise JPX) Okuno Atsushi (Ise JPX) Tsuda Masanori (Ise JPX) Hayashi Mitsuhiro (Ise JPX) Yamashita Teppei (Ise JPX) Murata Masanao (Ise JPX) Tanaka Tsuyoshi (Ise JPX) Morita Teruya (Ise , Article storage house in a clean room.
  2. Oba Yoichi (Tokyo JPX) Oba Shota (Tokyo JPX), Drying method and apparatus therefor.
  3. Brooks Ray G. (Irving TX) Brooks Timothy W. (Irving TX) Corris C. James (Elkmont AL), Method and apparatus for maintaining clean articles.
  4. Bonora Anthony C. (Menlo Park CA) Guerre Gilles (Les Loges en Josas CA FRX) Parikh Mihir (San Jose CA) Rosenquist Frederick T. (Redwood City CA) Jain Sudhir (Santa Clara CA), Method and apparatus for transferring articles between two controlled environments.
  5. Maydan Dan (Los Altos Hills CA) Somekh Sasson (Redwood City CA) Wang David N. (Cupertino CA) Cheng David (San Jose CA) Toshima Masato (San Jose CA) Harari Isaac (Mountain View CA) Hoppe Peter D. (Sun, Multichamber integrated process system.
  6. Parikh Mihir (San Jose CA) Bonora Anthony C. (Menlo Park CA), Sealable transportable container having a particle filtering system.
  7. Bonora Anthony C. (Menlo Park CA) Rosenquist Frederick T. (Redwood City CA), Sealable transportable container having improved latch mechanism.
  8. Thompson Raymon F. (Kalispell MT) Owczarz Aleksander (Kalispell MT), Semiconductor processor with extendible receiver for handling multiple discrete wafers without wafer carriers.
  9. Kato Shigekazu (Kudamatsu JPX) Nishihata Kouji (Tokuyama JPX) Tsubone Tsunehiko (Hikari JPX) Itou Atsushi (Kudamatsu JPX), Vacuum processing apparatus and operating method therefor.

이 특허를 인용한 특허 (41)

  1. Biberger, Maximilian Albert; Layman, Frederick Paul; Sutton, Thomas Robert, Apparatus for supercritical processing of a workpiece.
  2. Biberger, Maximilian Albert; Layman, Frederick Paul; Sutton, Thomas Robert, Apparatus for supercritical processing of multiple workpieces.
  3. Chang,Ko Pin; Shih,Jui An; Liu,Hui Tang; Chang,Simon; Lee,Nain Sung; Peng,Yung Chang, Automatic N2 purge system for 300 mm full automation fab.
  4. Keiichi Ando JP, Automatic storage unit and automatic storing method.
  5. Jones,William Dale, Control of fluid flow in the processing of an object with a fluid.
  6. Schneider, Reinhard, Device and method for chemically and electrolytically treating work pieces using a conveyor system to transport work pieces between treatment tanks.
  7. Sheydayi,Alexei; Sutton,Thomas, Gate valve for plus-atmospheric pressure semiconductor process vessels.
  8. Aoki, Shigeki; Sakai, Yuichi; Yamashita, Mitsuo; Shinya, Hiroshi, Heat processing apparatus and heat processing method.
  9. Aoki, Shigeki; Sakai, Yuichi; Yamashita, Mitsuo; Shinya, Hiroshi, Heat processing apparatus and heat processing method.
  10. Sutton, Thomas R.; Biberger, Maximilan A., High pressure compatible vacuum chuck for semiconductor wafer including lift mechanism.
  11. Jones, William D., High pressure fourier transform infrared cell.
  12. Biberger, Maximilian A.; Layman, Frederick Paul; Sutton, Thomas Robert, High pressure processing chamber for semiconductor substrate.
  13. Biberger,Maximilian A.; Layman,Frederick Paul; Sutton,Thomas Robert, High pressure processing chamber for semiconductor substrate.
  14. Jones,William Dale, High-pressure processing chamber for a semiconductor wafer.
  15. Jones,William Dale, High-pressure processing chamber for a semiconductor wafer.
  16. Tseronis, James A.; Mortiz, Heiko D.; Chandra, Mohan; Farmer, Robert B.; Jafri, Ijaz H.; Talbott, Jonathan, Inverted pressure vessel with horizontal through loading.
  17. Robert B Farmer ; Jonathan A. Talbott ; Mohan Chandra ; James A. Tseronis ; Heiko D. Moritz, Inverted pressure vessel with shielded closure mechanism.
  18. Sheydayi,Alexei, Method and apparatus for clamping a substrate in a high pressure processing system.
  19. Goshi,Gentaro, Method and apparatus for cooling motor bearings of a high pressure pump.
  20. Biberger, Maximilian Albert; Layman, Frederick Paul; Sutton, Thomas Robert, Method and apparatus for supercritical processing of multiple workpieces.
  21. Parent,Wayne M.; Goshi,Gentaro, Method and system for cooling a pump.
  22. Parent,Wayne M., Method and system for determining flow conditions in a high pressure processing system.
  23. Parent, Wayne M.; Geshell, Dan R., Method and system for passivating a processing chamber.
  24. Hansen,Brandon; Lowe,Marie, Method and system for treating a substrate with a high pressure fluid using fluorosilicic acid.
  25. Kawamura,Kohei; Asano,Akira; Miyatani,Koutarou; Hillman,Joseph T.; Palmer,Bentley, Method for supercritical carbon dioxide processing of fluoro-carbon films.
  26. Biberger, Maximilian Albert; Layman, Frederick Paul; Sutton, Thomas Robert, Method for supercritical processing of multiple workpieces.
  27. Biberger,Maximilian Albert; Layman,Frederick Paul; Sutton,Thomas Robert, Method of supercritical processing of a workpiece.
  28. Sheydayi,Alexei, Non-contact shuttle valve for flow diversion in high pressure systems.
  29. Noriaki Yoshikawa JP; Tadashi Yotsumoto JP; Terumi Muguruma JP; Yoshitaka Hasegawa JP; Yuichi Kuroda JP, Pod and method of cleaning it.
  30. Yoshikawa Noriaki,JPX ; Yotsumoto Tadashi,JPX ; Muguruma Terumi,JPX ; Hasegawa Yoshitaka,JPX ; Kuroda Yuichi,JPX, Pod and method of cleaning it.
  31. Sheydayi,Alexei, Pressure energized pressure vessel opening and closing device and method of providing therefor.
  32. Wuester,Christopher D., Process flow thermocouple.
  33. Mullee, William H., Removal of photoresist and photoresist residue from semiconductors using supercritical carbon dioxide process.
  34. Heiko D Moritz ; Jonathan A. Talbott ; Mohan Chandra ; James A. Tseronis ; Ijaz Jafri, Supercritical fluid drying system and method of use.
  35. Gale,Glenn; Hillman,Joseph T.; Jacobson,Gunilla; Palmer,Bentley, System and method for processing a substrate using supercritical carbon dioxide processing.
  36. Kishkovich, Oleg P.; Gabarre, Xavier; Goodwin, William M.; Lo, James; Scoggins, Troy, System for purging reticle storage.
  37. Sawado, Kazutoshi; Fujiwara, Yoshiaki; Murata, Masanao; Yamaji, Takashi; Kirihata, Naofumi, Transfer system.
  38. Jacobson,Gunilla; Yellowaga,Deborah, Treatment of a dielectric layer using supercritical CO.
  39. Kevwitch, Robert, Treatment of substrate using functionalizing agent in supercritical carbon dioxide.
  40. Sheydayi,Alexei, Vacuum chuck utilizing sintered material and method of providing thereof.
  41. Bonora, Anthony C.; Netsch, Robert R.; Gould, Richard, Wafer transport system.

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