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특허 상세정보

MyON담기
내보내기 페이스북 공유 카카오톡 공유

Robotic wafer handler

특허상세정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판) B25J-009/06   
미국특허분류(USC) 414/744.5 ; 414/935 ; 901/015 ; 901/021 ; 74/490.04
출원번호 US-0589554 (1996-01-22)
발명자 / 주소
  • Tepolt Gary B.
출원인 / 주소
  • Integrated Solutions, Inc.
대리인 / 주소
    Weingarten, Schurgin, Gagnebin & Hayes LLP
인용정보 피인용 횟수 : 67  인용 특허 : 49
초록

A robotic wafer handler has first and second arms pivotally connected at a swing point to operate in a plane. Each arm is independently drivable through greater than 360.degree. of rotation in the plane. The wafer handler may also include mechanisms for adjusting the plane of rotation, i.e., for providing lift and tilt.

대표
청구항
▼

[ What is claimed is:] [1.] A robotic wafer handler comprising:a first drive mechanism;a first arm portion coupled to said first drive mechanism, and drivable by said first drive mechanism through 360 degrees of rotation;a second drive mechanism;a second arm portion coupled to said second drive mechanism, and pivotally engaged with said first arm portion, said second arm portion drivable by said second drive mechanism through more than 360 degrees of rotation with respect to said first arm portions;a lift mechanism coupled to said first arm portion, said...

인용문헌 (49)

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  49. Takanabe Eiichiro (Kanagawa JPX), Wafers transferring method in vertical type heat treatment apparatus and the vertical type heat treatment apparatus prov.

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  3. Chen,Linlin; Wilson,Gregory J.; McHugh,Paul R.; Weaver,Robert A.; Ritzdorf,Thomas L., Apparatus and method for electrochemically depositing metal on a semiconductor workpiece.
  4. Hanson,Kyle M., Apparatus and methods for electrochemical processing of microelectronic workpieces.
  5. Hanson,Kyle M.; Ritzdorf,Thomas L.; Wilson,Gregory J.; McHugh,Paul R., Apparatus and methods for electrochemical processing of microelectronic workpieces.
  6. Hanson,Kyle M.; Ritzdorf,Thomas L.; Wilson,Gregory J.; McHugh,Paul R., Apparatus and methods for electrochemical processing of microelectronic workpieces.
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  11. Hanson, Kyle M.; Klocke, John L., Chambers, systems, and methods for electrochemically processing microfeature workpieces.
  12. Klocke,John; Hanson,Kyle M, Chambers, systems, and methods for electrochemically processing microfeature workpieces.
  13. Klocke,John; Hanson,Kyle M, Chambers, systems, and methods for electrochemically processing microfeature workpieces.
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  17. Ma Edmund L. ; Lada Christopher O. ; Langhans Donald H., End effector for substrate handling and method for making the same.
  18. Woodruff, Daniel J.; Erickson, James J., End-effectors and transfer devices for handling microelectronic workpieces.
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  31. Vanderpot,John W.; Pollock,John D.; Berrian,Donald W., Reciprocating drive for scanning a workpiece through an ion beam.
  32. Greene, Jr., Daniel Lawson; Sinicki, Ron; Woolley, Kurt, Reticle stop block apparatus and method.
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