$\require{mediawiki-texvc}$

연합인증

연합인증 가입 기관의 연구자들은 소속기관의 인증정보(ID와 암호)를 이용해 다른 대학, 연구기관, 서비스 공급자의 다양한 온라인 자원과 연구 데이터를 이용할 수 있습니다.

이는 여행자가 자국에서 발행 받은 여권으로 세계 각국을 자유롭게 여행할 수 있는 것과 같습니다.

연합인증으로 이용이 가능한 서비스는 NTIS, DataON, Edison, Kafe, Webinar 등이 있습니다.

한번의 인증절차만으로 연합인증 가입 서비스에 추가 로그인 없이 이용이 가능합니다.

다만, 연합인증을 위해서는 최초 1회만 인증 절차가 필요합니다. (회원이 아닐 경우 회원 가입이 필요합니다.)

연합인증 절차는 다음과 같습니다.

최초이용시에는
ScienceON에 로그인 → 연합인증 서비스 접속 → 로그인 (본인 확인 또는 회원가입) → 서비스 이용

그 이후에는
ScienceON 로그인 → 연합인증 서비스 접속 → 서비스 이용

연합인증을 활용하시면 KISTI가 제공하는 다양한 서비스를 편리하게 이용하실 수 있습니다.

Laser processing method of semiconductor device using a catalyst 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • H01L-021/268
출원번호 US-0562274 (1995-11-22)
우선권정보 JP-0319224 (1994-11-29)
발명자 / 주소
  • Tanaka Koichiro,JPX
  • Yamaguchi Naoaki,JPX
출원인 / 주소
  • Semiconductor Energy Laboratory Co., Ltd., JPX
대리인 / 주소
    Sixbey, Friedman, Leedom & FergusonFerguson
인용정보 피인용 횟수 : 213  인용 특허 : 0

초록 ▼

It is intended to provide a technique of separately forming thin-film transistors disposed in a peripheral circuit area and those disposed in a pixel area in accordance with characteristics required therefor in a manufacturing process of semiconductor devices to constitute a liquid crystal display d

대표청구항 ▼

[ What is claimed is:] [1.] A laser processing method of a semiconductor device having an amorphous silicon film formed on a substrate that is to finally constitute a liquid crystal display device, said method comprising:the first step of depositing a silicon oxide film on the amorphous silicon film

이 특허를 인용한 특허 (213)

  1. Yamazaki Shunpei,JPX ; Kusumoto Naoto,JPX ; Tanaka Koichiro,JPX, Active matrix display device with TFTs of different refractive index.
    상세보기
  2. Im, James S., Advanced excimer laser annealing for thin films.
    상세보기
  3. Shunpei Yamazaki JP; Satoshi Teramoto JP; Naoto Kusumoto JP; Koichiro Tanaka JP, Apparatus and method for laser radiation.
    상세보기
  4. Yamazaki Shunpei,JPX ; Teramoto Satoshi,JPX ; Kusumoto Naoto,JPX ; Tanaka Koichiro,JPX, Apparatus and method for laser radiation.
    상세보기
  5. Yamazaki, Shunpei; Teramoto, Satoshi; Kusumoto, Naoto; Tanaka, Koichiro, Apparatus and method for laser radiation.
    상세보기
  6. Yamazaki,Shunpei; Teramoto,Satoshi; Kusumoto,Naoto; Tanaka,Koichiro, Apparatus and method for laser radiation.
    상세보기
  7. Yamazaki,Shunpei; Teramoto,Satoshi; Kusumoto,Naoto; Tanaka,Koichiro, Apparatus and method for laser radiation.
    상세보기
  8. Arai Kunio,JPX, Apparatus for laser processing with a mechanical cutter.
    상세보기
  9. Tanaka,Koichiro, Beam irradiation apparatus, beam irradiation method, and method for manufacturing thin film transistor.
    상세보기
  10. Im, James S.; Chung, Ui-Jin, Collections of laterally crystallized semiconductor islands for use in thin film transistors.
    상세보기
  11. Im, James S.; Chung, Ui-Jin, Collections of laterally crystallized semiconductor islands for use in thin film transistors.
    상세보기
  12. Hartzell,John W., Digital light valve semiconductor processing.
    상세보기
  13. Yamazaki Shunpei,JPX ; Teramoto Satoshi,JPX ; Koyama Jun,JPX ; Ogata Yasushi,JPX ; Hayakawa Masahiko,JPX ; Osame Mitsuaki,JPX, Display switch with double layered gate insulation and resinous interlayer dielectric.
    상세보기
  14. Ohtani,Hisashi; Koyama,Jun; Yamazaki,Shunpei, Electro-optical device and semiconductor circuit.
    상세보기
  15. Ohtani,Hisashi; Koyama,Jun; Yamazaki,Shunpei, Electro-optical device and semiconductor circuit.
    상세보기
  16. Ohtani, Hisashi; Koyama, Jun; Yamazaki, Shunpei, Electro-optical device and semiconductor device.
    상세보기
  17. Im, James S., Enhancing the width of polycrystalline grains with mask.
    상세보기
  18. Im, James S., Enhancing the width of polycrystalline grains with mask.
    상세보기
  19. Yamazaki,Shunpei; Teramoto,Satoshi; Koyama,Jun; Ogata,Yasushi; Hayakawa,Masahiko; Osame,Mitsuaki, Fabrication method of semiconductor device.
    상세보기
  20. Yamazaki,Shunpei; Teramoto,Satoshi; Koyama,Jun; Ogata,Yasushi; Hayakawa,Masahiko; Osame,Mitsuaki, Fabrication method of semiconductor device.
    상세보기
  21. Im, James S., Flash lamp annealing crystallization for large area thin films.
    상세보기
  22. Yamazaki, Shunpei; Tanaka, Koichiro; Miyairi, Hidekazu; Shiga, Aiko; Shimomura, Akihisa; Akiba, Mai, Laser apparatus, laser irradiation method, semiconductor manufacturing method, semiconductor device, and electronic equipment.
    상세보기
  23. Im,James S., Laser crystallization and selective patterning using multiple beamlets.
    상세보기
  24. Tanaka, Koichiro, Laser irradiation apparatus.
    상세보기
  25. Tanaka, Koichiro, Laser irradiation apparatus.
    상세보기
  26. Shunpei Yamazaki JP; Koichiro Tanaka JP; Naoto Kusumoto JP, Laser irradiation apparatus and laser irradiation method.
    상세보기
  27. Yamazaki, Shunpei; Tanaka, Koichiro; Kusumoto, Naoto, Laser irradiation apparatus and laser irradiation method.
    상세보기
  28. Tanaka, Koichiro; Yamamoto, Yoshiaki, Laser irradiation method and laser irradiation apparatus.
    상세보기
  29. Tanaka, Koichiro; Yamamoto, Yoshiaki, Laser irradiation method, laser irradiation apparatus, and method for fabricating semiconductor device.
    상세보기
  30. Yamazaki, Shunpei; Tanaka, Koichiro, Laser irradiation method, laser irradiation apparatus, and semiconductor device.
    상세보기
  31. Yamazaki, Shunpei; Tanaka, Koichiro, Laser irradiation method, laser irradiation apparatus, and semiconductor device.
    상세보기
  32. Yamazaki, Shunpei; Tanaka, Koichiro, Laser irradiation method, laser irradiation apparatus, and semiconductor device.
    상세보기
  33. Yamazaki,Shunpei; Tanaka,Koichiro, Laser irradiation method, laser irradiation apparatus, and semiconductor device.
    상세보기
  34. Yamazaki,Shunpei; Tanaka,Koichiro, Laser irradiation method, laser irradiation apparatus, and semiconductor device.
    상세보기
  35. Tanaka,Koichiro; Isobe,Atsuo; Moriwaka,Tomoaki, Laser irradiation method, method for manufacturing semiconductor device, and laser irradiation system.
    상세보기
  36. Ishihara Hiroaki,JPX ; Nakashita Kazuhisa,JPX ; Ohnuma Hideto,JPX ; Tanaka Nobuhiro,JPX ; Adachi Hiroki,JPX, Laser processing apparatus and laser processing process.
    상세보기
  37. Ishihara, Hiroaki; Nakashita, Kazuhisa; Ohnuma, Hideto; Tanaka, Nobuhiro; Adachi, Hiroki, Laser processing apparatus and laser processing process.
    상세보기
  38. Ohnuma, Hideto; Tanaka, Nobuhiro; Adachi, Hiroki, Laser processing apparatus and laser processing process.
    상세보기
  39. Ohnuma,Hideto; Tanaka,Nobuhiro; Adachi,Hiroki, Laser processing apparatus and laser processing process.
    상세보기
  40. Zhang Hongyong,JPX ; Tanaka Koichiro,JPX, Laser processing method.
    상세보기
  41. Zhang, Hongyong; Tanaka, Koichiro, Laser processing method.
    상세보기
  42. Zhang,Hongyong; Tanaka,Koichiro, Laser processing method.
    상세보기
  43. David J. McCulloch GB, Laser system.
    상세보기
  44. Im, James S., Laser-irradiated thin films having variable thickness.
    상세보기
  45. Im,James, Laser-irradiated thin films having variable thickness.
    상세보기
  46. Im, James S.; Van Der Wilt, Paul C., Line scan sequential lateral solidification of thin films.
    상세보기
  47. Im, James S.; Van Der Wilt, Paul C., Line scan sequential lateral solidification of thin films.
    상세보기
  48. Im, James S., Method and apparatus for processing thin metal layers.
    상세보기
  49. Im,James S., Method and apparatus for processing thin metal layers.
    상세보기
  50. Yamazaki, Shunpei; Tanaka, Koichiro, Method and apparatus for producing semiconductor device.
    상세보기
  51. Im, James S., Method and system for facilitating bi-directional growth.
    상세보기
  52. Im,James S.; Choi,Jae Beom, Method and system for providing a thin film with a controlled crystal orientation using pulsed laser induced melting and nucleation-initiated crystallization.
    상세보기
  53. Joo Seungki,KRX ; Kim Taekyung,KRX, Method for crystallizing amorphous silicon thin-film for use in thin-film transistors and thermal annealing apparatus therefor.
    상세보기
  54. Joo, Seungki; Kim, Taekyung, Method for crystallizing amorphous silicon thin-film for use in thin-film transistors and thermal annealing apparatus therefor.
    상세보기
  55. Yeh, Wen-Chang, Method for fabricating a polycrystalline silicon film.
    상세보기
  56. Makita Naoki,JPX ; Miyamoto Tadayoshi,JPX ; Shibuya Tsukasa,JPX, Method for fabricating a semiconductor device.
    상세보기
  57. Yamazaki Shunpei,JPX ; Teramoto Satoshi,JPX ; Koyama Jun,JPX ; Ogata Yasushi,JPX ; Hayakawa Masahiko,JPX ; Osame Mitsuaki,JPX, Method for fabricating a semiconductor device.
    상세보기
  58. Yamazaki,Shunpei; Teramoto,Satoshi; Koyama,Jun; Ogata,Yasushi; Hayakawa,Masahiko; Osame,Mitsuaki, Method for fabricating a semiconductor device.
    상세보기
  59. Yamazaki,Shunpei; Teramoto,Satoshi; Koyama,Jun; Ogata,Yasushi; Hayakawa,Masahiko; Osame,Mitsuaki, Method for fabricating a semiconductor device.
    상세보기
  60. Shunpei Yamazaki JP; Satoshi Teramoto JP; Jun Koyama JP; Yasushi Ogata JP; Masahiko Hayakawa JP; Mitsuaki Osame JP, Method for fabricating a semiconductor device using a metal catalyst and high temperature crystallization.
    상세보기
  61. Zhang Hongyong,JPX ; Uochi Hideki,JPX ; Takayama Toru,JPX ; Fukunaga Takeshi,JPX ; Takemura Yasuhiko,JPX, Method for forming a semiconductor device.
    상세보기
  62. Hisashi Ohtani JP; Hiroki Adachi JP; Akiharu Miyanaga JP; Toru Takayama JP, Method for manufacturing a semiconductor device.
    상세보기
  63. Ohtani,Hisashi; Adachi,Hiroki; Miyanaga,Akiharu; Takayama,Toru, Method for manufacturing a semiconductor device.
    상세보기
  64. Yamazaki,Shunpei; Yamaguchi,Naoaki; Nakajima,Setsuo, Method for manufacturing a semiconductor device.
    상세보기
  65. Shimomura,Akihisa; Ohnuma,Hideto; Shoji,Hironobu, Method for manufacturing a thin film transistor and method for manufacturing a semiconductor device.
    상세보기
  66. Zhang, Hongyong; Uochi, Hideki; Takayama, Toru; Fukunaga, Takeshi; Takemura, Yasuhiko, Method for manufacturing a thin film transistor device.
    상세보기
  67. Shimomura,Akihisa; Koyama,Masaki; Shoji,Hironobu, Method for manufacturing semiconductor device, and laser irradiation apparatus.
    상세보기
  68. Tanaka, Koichiro; Ohnuma, Hideto, Method for manufacturing transistor semiconductor devices with step of annealing to getter metal with phosphorous.
    상세보기
  69. Im, James S., Method for processing laser-irradiated thin films having variable thickness.
    상세보기
  70. Kusumoto Naoto,JPX ; Yamazaki Shunpei,JPX, Method for producing insulated gate thin film semiconductor device.
    상세보기
  71. Kusumoto Naoto,JPX ; Yamazaki Shunpei,JPX, Method for producing insulated gate thin film semiconductor device.
    상세보기
  72. Kusumoto, Naoto; Yamazaki, Shunpei, Method for producing insulated gate thin film semiconductor device.
    상세보기
  73. Kusumoto, Naoto; Yamazaki, Shunpei, Method for producing insulated gate thin film semiconductor device.
    상세보기
  74. Kusumoto, Naoto; Yamazaki, Shunpei, Method for producing insulated gate thin film semiconductor device.
    상세보기
  75. Kusumoto,Naoto; Yamazaki,Shunpei, Method for producing insulated gate thin film semiconductor device.
    상세보기
  76. Im, James S., Method for providing a continuous motion sequential lateral solidification for reducing or eliminating artifacts in edge regions, and a mask for facilitating such artifact reduction/elimination.
    상세보기
  77. Shunpei Yamazaki JP, Method of crystallizing a semiconductor layer in a MIS transistor.
    상세보기
  78. Lee Kyung-Eon,KRX ; Choi Jae-Beom,KRX, Method of crystallizing a silicon film and a method of manufacturing a liquid crystal display apparatus.
    상세보기
  79. Yamazaki, Shunpei, Method of fabricating a MIS transistor.
    상세보기
  80. Yamazaki,Shunpei, Method of fabricating a MIS transistor.
    상세보기
  81. Yasuhiko Takemura JP, Method of fabricating a semiconductor device.
    상세보기
  82. Fukunaga,Takeshi; Ohtani,Hisashi; Miyanaga,Akiharu, Method of fabricating a semiconductor device utilizing a catalyst material solution.
    상세보기
  83. Ohtani, Hisashi; Mitsuki, Toru, Method of fabricating semiconductor devices.
    상세보기
  84. Ohtani Hisashi,JPX ; Mitsuki Toru,JPX, Method of fabricating semiconductor devices by crystallizing amorphous silicon with nickel.
    상세보기
  85. Ohtani, Hisashi, Method of forming crystalline silicon film.
    상세보기
  86. Minegishi Masahiro,JPX ; Ino Masumitsu,JPX ; Kunii Masafumi,JPX ; Urazono Takenobu,JPX ; Hayashi Hisao,JPX, Method of forming polycrystalline semiconductor thin film.
    상세보기
  87. Tanaka, Koichiro; Moriwaka, Tomoaki, Method of laser irradiation, laser irradiation apparatus, and method of manufacturing a semiconductor device.
    상세보기
  88. Tanaka, Koichiro; Moriwaka, Tomoaki, Method of laser irradiation, laser irradiation apparatus, and method of manufacturing a semiconductor device.
    상세보기
  89. Tanaka, Koichiro; Moriwaka, Tomoaki, Method of laser irradiation, laser irradiation apparatus, and method of manufacturing a semiconductor device.
    상세보기
  90. Tanaka, Koichiro; Moriwaka, Tomoaki, Method of laser irradiation, laser irradiation apparatus, and method of manufacturing a semiconductor device.
    상세보기
  91. Shunpei Yamazaki JP; Mitsunori Sakama JP; Yasuhiko Takemura JP, Method of making crystal silicon semiconductor and thin film transistor.
    상세보기
  92. Ohnuma, Hideto; Yamazaki, Shunpei; Nakajima, Setsuo; Ohtani, Hisashi, Method of manufacturing a semiconductor device.
    상세보기
  93. Yamazaki Shunpei,JPX ; Ohtani Hisashi,JPX ; Hamatani Toshiji,JPX, Method of manufacturing a semiconductor device.
    상세보기
  94. Yamazaki,Shunpei; Ohtani,Hisashi; Hamatani,Toshiji, Method of manufacturing a semiconductor device.
    상세보기
  95. Mitsuki, Toru; Shichi, Takeshi; Maekawa, Shinji; Shibata, Hiroshi; Miyanaga, Akiharu, Method of manufacturing a semiconductor device having a crystallized semiconductor film.
    상세보기
  96. Yamazaki Shunpei,JPX ; Teramoto Satoshi,JPX ; Koyama Jun,JPX ; Ogata Yasushi,JPX ; Hayakawa Masahiko,JPX ; Osame Mitsuaki,JPX, Method of manufacturing a semiconductor device including reduction of a catalyst.
    상세보기
  97. Zhang, Hongyong; Uochi, Hideki; Takayama, Toru; Fukunaga, Takeshi; Takemura, Yasuhiko, Method of manufacturing a thin film transistor device.
    상세보기
  98. Ohtani Hisashi,JPX, Method of manufacturing a thin film transistor involving laser treatment.
    상세보기
  99. Mishima, Yasuyoshi; Suga, Katsuyuki; Takei, Michiko; Hara, Akito, Method of manufacturing semiconductor device with polysilicon film.
    상세보기
  100. Yamazaki Shunpei,JPX ; Kusumoto Naoto,JPX ; Tanaka Koichiro,JPX, Method of producing a semiconductor device with overlapped scanned linear lasers.
    상세보기
  101. Mitsuhashi Hiroshi,JPX ; Kawakyu Yoshito,JPX, Method of producing polycrystalline silicon.
    상세보기
  102. Im, James S.; Sposili, Robert S.; Crowder, Mark A., Methods for producing uniform large-grained and grain boundary location manipulated polycrystalline thin film semiconductors using sequential lateral solidification.
    상세보기
  103. Im,James S.; Sposili,Robert S.; Crowder,Mark A., Methods for producing uniform large-grained and grain boundary location manipulated polycrystalline thin film semiconductors using sequential lateral solidification.
    상세보기
  104. Im,James S.; Sposili,Robert S.; Crowder,Mark A., Methods for producing uniform large-grained and grain boundary location manipulated polycrystalline thin film semiconductors using sequential lateral solidification.
    상세보기
  105. Im, James S., Methods of producing high uniformity in thin film transistor devices fabricated on laterally crystallized thin films.
    상세보기
  106. Im,James; Van Der Wilt,Paul Christiaan, Polycrystalline TFT uniformity through microstructure mis-alignment.
    상세보기
  107. Wada, Hiroyuki; Hirata, Yoshimi; Taguchi, Ayumu; Tatsuki, Koichi; Umezu, Nobuhiko; Kubota, Shigeo; Abe, Tetsuo; Ooshima, Akifumi; Hattori, Tadashi; Takatoku, Makoto; Sugano, Yukiyasu, Polysilicon evaluating method, polysilicon inspection apparatus and method for preparation of thin film transistor.
    상세보기
  108. Im, James S., Process and mask projection system for laser crystallization processing of semiconductor film regions on a substrate.
    상세보기
  109. Im, James S., Process and system for laser crystallization processing of film regions on a substrate to minimize edge areas, and a structure of such film regions.
    상세보기
  110. Im, James S., Process and system for laser crystallization processing of film regions on a substrate to minimize edge areas, and structure of such film regions.
    상세보기
  111. Im,James S., Process and system for laser crystallization processing of film regions on a substrate to provide substantial uniformity, and a structure of such film regions.
    상세보기
  112. Zhang Hongyong,JPX ; Uochi Hideki,JPX ; Takayama Toru,JPX ; Yamazaki Shunpei,JPX ; Takemura Yasuhiko,JPX, Process for fabricating a thin film transistor semiconductor device.
    상세보기
  113. Hongyong Zhang JP; Shunpei Yamazaki JP; Yasuhiko Takemura JP, Process for laser processing and apparatus for use in the same.
    상세보기
  114. Zhang, Hongyong; Yamazaki, Shunpei; Takemura, Yasuhiko, Process for laser processing and apparatus for use in the same.
    상세보기
  115. Zhang,Hongyong; Yamazaki,Shunpei; Takemura,Yasuhiko, Process for laser processing and apparatus for use in the same.
    상세보기
  116. Im, James S.; van der Wilt, Paul Christiaan, Processes and systems for laser crystallization processing of film regions on a substrate utilizing a line-type beam, and structures of such film regions.
    상세보기
  117. Im, James S.; van der Wilt, Paul Christiaan, Processes and systems for laser crystallization processing of film regions on a substrate utilizing a line-type beam, and structures of such film regions.
    상세보기
  118. Moffatt, Stephen; Ranish, Joseph M., Pulse train annealing method and apparatus.
    상세보기
  119. Moffatt, Stephen; Ranish, Joseph M., Pulse train annealing method and apparatus.
    상세보기
  120. Yamazaki, Shunpei; Teramoto, Satoshi; Koyama, Jun; Ogata, Yasushi; Hayakawa, Masahiko; Osame, Mitsuaki; Ohtani, Hisashi; Hamatani, Toshiji, Semiconductor active region of TFTs having radial crystal grains through the whole area of the region.
    상세보기
  121. Hongyong Zhang JP; Hideki Uochi JP; Toru Takayama JP; Shunpei Yamazaki JP; Yasuhiko Takemura JP, Semiconductor and process for fabricating the same.
    상세보기
  122. Zhang Hongyong,JPX ; Uochi Hideki,JPX ; Takayama Toru,JPX ; Yamazaki Shunpei,JPX ; Takemura Yasuhiko,JPX, Semiconductor and process for fabricating the same.
    상세보기
  123. Kato, Kiyoshi; Ozaki, Tadafumi; Mutaguchi, Kohei, Semiconductor device.
    상세보기
  124. Kato,Kiyoshi; Ozaki,Tadafumi; Mutaguchi,Kohei, Semiconductor device.
    상세보기
  125. Yamazaki, Shunpei; Yamaguchi, Naoaki; Nakajima, Setsuo, Semiconductor device.
    상세보기
  126. Yamazaki Shunpei,JPX ; Teramoto Satoshi,JPX ; Koyama Jun,JPX ; Ogata Yasushi,JPX ; Hayakawa Masahiko,JPX ; Osame Mitsuaki,JPX, Semiconductor device and fabrication method thereof.
    상세보기
  127. Yamazaki Shunpei,JPX ; Teramoto Satoshi,JPX ; Koyama Jun,JPX ; Ogata Yasushi,JPX ; Hayakawa Masahiko,JPX ; Osame Mitsuaki,JPX, Semiconductor device and fabrication method thereof.
    상세보기
  128. Yamazaki, Shunpei; Teramoto, Satoshi; Koyama, Jun; Ogata, Yasushi; Hayakawa, Masahiko; Osame, Mitsuaki, Semiconductor device and fabrication method thereof.
    상세보기
  129. Shunpei Yamazaki JP; Satoshi Teramoto JP; Jun Koyama JP; Yasushi Ogata JP; Masahiko Hayakawa JP; Mitsuaki Osame JP; Hisashi Ohtani JP; Toshiji Hamatani JP, Semiconductor device and its manufacturing method.
    상세보기
  130. Tanaka, Koichiro; Isobe, Atsuo; Yamamoto, Yoshiaki, Semiconductor device and its manufacturing method.
    상세보기
  131. Yamazaki, Shunpei; Teramoto, Satoshi; Koyama, Jun; Ogata, Yasushi; Hayakawa, Masahiko; Osame, Mitsuaki; Ohtani, Hisashi; Hamatani, Toshiji, Semiconductor device and its manufacturing method.
    상세보기
  132. Yamazaki, Shunpei; Teramoto, Satoshi; Koyama, Jun; Ogata, Yasushi; Hayakawa, Masahiko; Osame, Mitsuaki; Ohtani, Hisashi; Hamatani, Toshiji, Semiconductor device and its manufacturing method.
    상세보기
  133. Yamazaki,Shunpei; Teramoto,Satoshi; Koyama,Jun; Ogata,Yasushi; Hayakawa,Masahiko; Osame,Mitsuaki; Ohtani,Hisashi; Hamatani,Toshiji, Semiconductor device and its manufacturing method.
    상세보기
  134. Tanaka, Koichiro; Ohnuma, Hideto, Semiconductor device and manufacturing method thereof.
    상세보기
  135. Yamazaki Shunpei,JPX ; Teramoto Satoshi,JPX ; Koyama Jun,JPX ; Ogata Yasushi,JPX ; Hayakawa Masahiko,JPX ; Osame Mitsuaki,JPX ; Ohtani Hisashi,JPX ; Hamatani Toshiji,JPX, Semiconductor device and method for fabricating the same.
    상세보기
  136. Yamazaki, Shunpei; Teramoto, Satoshi; Koyama, Jun; Ogata, Yasushi; Hayakawa, Masahiko; Osame, Mitsuaki; Ohtani, Hisashi; Hamatani, Toshiji, Semiconductor device and method for fabricating the same.
    상세보기
  137. Yamazaki, Shunpei; Teramoto, Satoshi; Koyama, Jun; Ogata, Yasushi; Hayakawa, Masahiko; Osame, Mitsuaki; Ohtani, Hisashi; Hamatani, Toshiji, Semiconductor device and method for fabricating the same.
    상세보기
  138. Yamazaki,Shunpei; Teramoto,Satoshi; Koyama,Jun; Ogata,Yasushi; Hayakawa,Masahiko; Osame,Mitsuaki; Ohtani,Hisashi; Hamatani,Toshiji, Semiconductor device and method for fabricating the same.
    상세보기
  139. Yamazaki Shunpei,JPX ; Zhang Hongyong,JPX, Semiconductor device and method for forming the same.
    상세보기
  140. Yamazaki,Shunpei; Zhang,Hongyong, Semiconductor device and method for forming the same.
    상세보기
  141. Yamazaki,Shunpei; Zhang,Hongyong, Semiconductor device and method for forming the same.
    상세보기
  142. Shoji,Hironobu; Shimomura,Akihisa; Koyama,Masaki, Semiconductor device and method for manufacturing semiconductor device.
    상세보기
  143. Hongyong Zhang JP; Hideki Uochi JP; Toru Takayama JP; Takeshi Fukunaga JP; Yasuhiko Takemura JP, Semiconductor device and method for manufacturing the same.
    상세보기
  144. Zhang Hongyong,JPX ; Uochi Hideki,JPX ; Takayama Toru,JPX ; Fukunaga Takeshi,JPX ; Takemura Yasuhiko,JPX, Semiconductor device and method for manufacturing the same.
    상세보기
  145. Zhang, Hongyong; Uochi, Hideki; Takayama, Toru; Fukunaga, Takeshi; Takemura, Yasuhiko, Semiconductor device and method for manufacturing the same.
    상세보기
  146. Zhang, Hongyong; Uochi, Hideki; Takayama, Toru; Fukunaga, Takeshi; Takemura, Yasuhiko, Semiconductor device and method for manufacturing the same.
    상세보기
  147. Yamazaki, Shunpei; Yamaguchi, Naoaki; Nakajima, Setsuo, Semiconductor device and method for producing it.
    상세보기
  148. Yamazaki Shunpei,JPX ; Ohtani Hisashi,JPX ; Miyanaga Akiharu,JPX ; Teramoto Satoshi,JPX, Semiconductor device and method for producing the same.
    상세보기
  149. Yamazaki Shunpei,JPX ; Ohtani Hisashi,JPX ; Miyanaga Akiharu,JPX ; Teramoto Satoshi,JPX, Semiconductor device and method for producing the same.
    상세보기
  150. Yamazaki, Shunpei; Kusumoto, Naoto; Tanaka, Koichiro, Semiconductor device and method for producing the same.
    상세보기
  151. Yamazaki, Shunpei; Teramoto, Satoshi; Koyama, Jun; Ogata, Yasushi; Hayakawa, Masahiko; Osame, Mitsuaki; Ohtani, Hisashi; Hamatani, Toshiji, Semiconductor device and method of fabricating same.
    상세보기
  152. Yamazaki,Shunpei; Teramoto,Satoshi; Koyama,Jun; Ogata,Yasushi; Hayakawa,Masahiko; Osame,Mitsuaki; Ohtani,Hisashi; Hamatani,Toshiji, Semiconductor device and method of fabricating same.
    상세보기
  153. Takemura, Yasuhiko, Semiconductor device and method of fabricating the same.
    상세보기
  154. Takemura,Yasuhiko, Semiconductor device and method of fabricating the same.
    상세보기
  155. Shunpei Yamazaki JP; Naoaki Yamaguchi JP; Setsuo Nakajima JP, Semiconductor device comprising a bottom gate type thin film transistor.
    상세보기
  156. Ohtani, Hisashi; Adachi, Hiroki; Miyanaga, Akiharu; Takayama, Toru, Semiconductor device comprising first insulating film, second insulating film comprising organic resin on the first insulating film, and pixel electrode over the second insulating film.
    상세보기
  157. Noguchi, Takashi; Kanaya, Yasuhiro; Kunii, Masafumi; Ikeda, Yuji; Usui, Setsuo, Semiconductor device formed of single crystal grains in a grid pattern.
    상세보기
  158. Hongyong Zhang JP; Toru Takayama JP; Yasuhiko Takemura JP; Akiharu Miyanaga JP; Hisashi Ohtani JP, Semiconductor device forming method.
    상세보기
  159. Zhang Hongyong,JPX ; Takayama Toru,JPX ; Takemura Yasuhiko,JPX ; Miyanaga Akiharu,JPX ; Ohtani Hisashi,JPX, Semiconductor device forming method.
    상세보기
  160. Zhang,Hongyong; Takayama,Toru; Takemura,Yasuhiko; Miyanaga,Akiharu; Ohtani,Hisashi, Semiconductor device forming method.
    상세보기
  161. Yamazaki Shunpei,JPX ; Takemura Yasuhiko,JPX ; Zhang Hongyong,JPX ; Takayama Toru,JPX ; Uochi Hideki,JPX, Semiconductor device having a catalyst enhanced crystallized layer.
    상세보기
  162. Yamazaki,Shunpei; Teramoto,Satoshi; Koyama,Jun; Ogata,Yasushi; Hayakawa,Masahiko; Osame,Mitsuaki; Ohtani,Hisashi; Hamatani,Toshiji, Semiconductor device having a crystalline semiconductor film.
    상세보기
  163. Yamazaki Shunpei,JPX ; Kusumoto Naoto,JPX ; Tanaka Koichiro,JPX, Semiconductor device having channel refractive index in first and second directions.
    상세보기
  164. Yamazaki, Shunpei; Adachi, Hiroki; Kuwabara, Hideaki, Semiconductor device having semiconductor circuit comprising semiconductor element, and method for manufacturing same.
    상세보기
  165. Zhang,Hongyong; Takayama,Toru; Takemura,Yasuhiko; Miyanaga,Akiharu; Ohtani,Hisashi, Semiconductor device structure.
    상세보기
  166. Yamazaki, Shunpei; Tanaka, Koichiro, Semiconductor device, and method of forming the same.
    상세보기
  167. Yamazaki, Shunpei; Tanaka, Koichiro, Semiconductor device, and method of forming the same.
    상세보기
  168. Yamazaki, Shunpei; Tanaka, Koichiro, Semiconductor device, and method of forming the same.
    상세보기
  169. Yamazaki, Shunpei; Koyama, Jun; Miyanaga, Akiharu; Fukunaga, Takeshi, Semiconductor thin film and method of manufacturing the same and semiconductor device and method of manufacturing the same.
    상세보기
  170. Yamazaki,Shunpei; Koyama,Jun; Miyanaga,Akiharu; Fukunaga,Takeshi, Semiconductor thin film and method of manufacturing the same and semiconductor device and method of manufacturing the same.
    상세보기
  171. Ohtani Hisashi,JPX ; Yamazaki Shunpei,JPX ; Koyama Jun,JPX ; Ogata Yasushi,JPX ; Miyanaga Akiharu,JPX, Semiconductor thin film and semiconductor device.
    상세보기
  172. Takeda,Kazuo; Sato,Takeshi; Saito,Masakazu; Gotoh,Jun, Semiconductor thin film decomposing method, decomposed semiconductor thin film, decomposed semiconductor thin film evaluation method, thin film transistor made of decomposed semiconductor thin film, .
    상세보기
  173. Taketomi, Yoshinao; Kuramasu, Keizaburo; Izuchi, Masumi; Satani, Hiroshi; Tsutsu, Hiroshi; Nishitani, Hikaru; Nishitani, Mikihiko; Goto, Masashi; Mino, Yoshiko, Semiconductor thin film, method and apparatus for producing the same, and semiconductor device and method of producing the same.
    상세보기
  174. Taketomi, Yoshinao; Kuramasu, Keizaburo; Izuchi, Masumi; Satani, Hiroshi; Tsutsu, Hiroshi; Nishitani, Hikaru; Nishitani, Mikihiko; Goto, Masashi; MIno, Yoshiko, Semiconductor thin film, method of producing the same, apparatus for producing the same, semiconductor device and method of producing the same.
    상세보기
  175. Yamazaki Shunpei,JPX ; Takemura Yasuhiko,JPX ; Zhang Hongyong,JPX ; Takayama Toru,JPX ; Uochi Hideki,JPX, Semiconductor, semiconductor device, and method for fabricating the same.
    상세보기
  176. Yamazaki Shunpei,JPX ; Takemura Yasuhiko,JPX ; Zhang Hongyong,JPX ; Takayama Toru,JPX ; Uochi Hideki,JPX, Semiconductor, semiconductor device, and method for fabricating the same.
    상세보기
  177. Yamazaki,Shunpei; Takemura,Yasuhiko; Zhang,Hongyong; Takayama,Toru; Uochi,Hideki, Semiconductor, semiconductor device, and method for fabricating the same.
    상세보기
  178. Noguchi Takashi,JPX ; Kanaya Yasuhiro,JPX ; Kunii Masafumi,JPX ; Ikeda Yuji,JPX ; Usui Setsuo,JPX, Silicon thin film, group of silicon single crystal grains and formation process thereof, and semiconductor device, flash memory cell and fabrication process thereof.
    상세보기
  179. Im, James S.; Van Der Wilt, Paul C., Single scan irradiation for crystallization of thin films.
    상세보기
  180. Im,James S.; van der Wilt,Paul Christiaan, Single scan irradiation for crystallization of thin films.
    상세보기
  181. Im, James S., Single-shot semiconductor processing system and method having various irradiation patterns.
    상세보기
  182. Im, James S., Single-shot semiconductor processing system and method having various irradiation patterns.
    상세보기
  183. Im, James S., Single-shot semiconductor processing system and method having various irradiation patterns.
    상세보기
  184. Im, James S.; Sposili, Robert S.; Crowder, Mark A., Surface planarization of thin silicon films during and after processing by the sequential lateral solidification method.
    상세보기
  185. Im,James S.; Sposili,Robert S.; Crowder,Mark A., Surface planarization of thin silicon films during and after processing by the sequential lateral solidification method.
    상세보기
  186. Im,James S., System and process for processing a plurality of semiconductor thin films which are crystallized using sequential lateral solidification techniques.
    상세보기
  187. Im, James S., System for providing a continuous motion sequential lateral solidification for reducing or eliminating artifacts in overlap regions, and a mask for facilitating such artifact reduction/elimination.
    상세보기
  188. Im, James S.; van der Wilt, Paul C., Systems and methods for creating crystallographic-orientation controlled poly-silicon films.
    상세보기
  189. Im, James S.; van der Wilt, Paul Christian, Systems and methods for creating crystallographic-orientation controlled poly-silicon films.
    상세보기
  190. Im, James S., Systems and methods for inducing crystallization of thin films using multiple optical paths.
    상세보기
  191. Im,James, Systems and methods for inducing crystallization of thin films using multiple optical paths.
    상세보기
  192. Im, James S.; Deng, Yikang; Hu, Qiongying; Chung, Ui-Jin; Limanov, Alexander B., Systems and methods for non-periodic pulse partial melt film processing.
    상세보기
  193. Im, James S.; Chung, Ui-Jin; Limanov, Alexander B.; Van Der Wilt, Paul C., Systems and methods for non-periodic pulse sequential lateral soldification.
    상세보기
  194. Im, James S.; Chung, Ui-Jin; Limanov, Alexander B.; Van Der Wilt, Paul C., Systems and methods for non-periodic pulse sequential lateral solidification.
    상세보기
  195. Im, James S., Systems and methods for preparation of epitaxially textured thick films.
    상세보기
  196. Im, James S., Systems and methods for preparation of epitaxially textured thick films.
    상세보기
  197. Im, James S., Systems and methods for preparing epitaxially textured polycrystalline films.
    상세보기
  198. Im, James S., Systems and methods for preparing epitaxially textured polycrystalline films.
    상세보기
  199. Im, James S., Systems and methods for processing a film, and thin films.
    상세보기
  200. Im,James, Systems and methods for processing thin films.
    상세보기
  201. Im, James S., Systems and methods for the crystallization of thin films.
    상세보기
  202. Im, James S.; Sposili, Robert S.; Crowder, Mark A., Systems and methods using sequential lateral solidification for producing single or polycrystalline silicon thin films at low temperatures.
    상세보기
  203. Yamazaki, Shunpei; Miyanaga, Akiharu; Koyama, Jun; Fukunaga, Takeshi, Thin film semiconductor device and its manufacturing method.
    상세보기
  204. Yamazaki Shunpei,JPX ; Teramoto Satoshi,JPX ; Koyama Jun,JPX ; Ogata Yasushi,JPX ; Hayakawa Masahiko,JPX ; Osame Mitsuaki,JPX ; Ohtani Hisashi,JPX ; Hamatani Toshiji,JPX, Thin film transistor having grain boundaries with segregated oxygen and halogen elements.
    상세보기
  205. Yamazaki Shunpei,JPX ; Teramoto Satoshi,JPX, Thin film type monolithic semiconductor device.
    상세보기
  206. Yamazaki Shunpei,JPX ; Teramoto Satoshi,JPX, Thin film type monolithic semiconductor device.
    상세보기
  207. Yamazaki, Shunpei; Teramoto, Satoshi, Thin film type monolithic semiconductor device.
    상세보기
  208. Zhang Hongyong,JPX ; Takayama Toru,JPX ; Takemura Yasuhiko,JPX, Thin-film transistor and fabrication method for same.
    상세보기
  209. Ohnuma Hideto,JPX ; Yamazaki Shunpei,JPX, Thin-film transistor and semiconductor device using thin-film transistors.
    상세보기
  210. Ohnuma, Hideto; Yamazaki, Shunpei, Thin-film transistor and semiconductor device using thin-film transistors.
    상세보기
  211. Im, James S.; Sposili, Robert S.; Crowder, Mark A., Uniform large-grained and gain boundary location manipulated polycrystalline thin film semiconductors formed using sequential lateral solidification and devices formed thereon.
    상세보기
  212. Im, James S.; Sposili, Robert S.; Crowder, Mark A., Uniform large-grained and grain boundary location manipulated polycrystalline thin film semiconductors formed using sequential lateral solidification and devices formed thereon.
    상세보기
  213. Im, James S.; Sposili, Robert S.; Crowder, Mark A., Uniform large-grained and grain boundary location manipulated polycrystalline thin film semiconductors formed using sequential lateral solidification and devices formed thereon.
    상세보기

관련 콘텐츠

섹션별 컨텐츠 바로가기

AI-Helper ※ AI-Helper는 오픈소스 모델을 사용합니다.

AI-Helper 아이콘
AI-Helper
안녕하세요, AI-Helper입니다. 좌측 "선택된 텍스트"에서 텍스트를 선택하여 요약, 번역, 용어설명을 실행하세요.
※ AI-Helper는 부적절한 답변을 할 수 있습니다.

선택된 텍스트

맨위로