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Process and system for selective abatement of reactive gases and recovery of perfluorocompound gases

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • B01D-053/22
  • B01D-053/04
출원번호 US-0663884 (1996-06-14)
발명자 / 주소
  • Li Yao-En
  • Duchateau Eric L.
출원인 / 주소
  • American Air Liquide Inc.
대리인 / 주소
    Wendt
인용정보 피인용 횟수 : 44  인용 특허 : 47

초록

Processes and systems to recover at least one perfluorocompound gas from a gas mixture are provided. In one embodiment the inventive process comprises the steps of a) providing a gas mixture comprising at least one perfluorocompound gas and at least one carrier gas, the gas mixture being at a predet

대표청구항

[ What is claimed is:] [1.] A process to recover at least one perfluorocompound gas from a gas mixture comprising reactive gases, perfluorocompound gases, and carrier gases, the process comprising the steps of:a) providing a gas mixture comprising at least one perfluorocompound gas, at least one car

이 특허에 인용된 특허 (47)

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  4. Arno, Jose I., Atmospheric pressure plasma enhanced abatement of semiconductor process effluent species.
  5. O'Brien William G. ; Noelke Charles J. ; Harker Raymond C. ; Van Bramer David John, CO.sub.2 removable from fluorocarbons by semipermeable membrane.
  6. Hosch, Jimmy W.; Goeckner, Matthew J.; Whelan, Mike; Kueny, Andrew Weeks; Harvey, Kenneth C.; Thamban, P.L. Stephan, Electron beam exciter for use in chemical analysis in processing systems.
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  13. Pittroff, Michael; Schwarze, Thomas; Belt, Heinz-Joachim, Isolation of SF6 from insulating gases in gas-insulated lines.
  14. Ishihara, Yoshio; Hayashida, Shigeru; Nagasaka, Toru; Kimijima, Tetsuya; Ohmi, Tadahiro, Method and apparatus for collecting rare gas.
  15. Ohno, Hiromoto; Ohi, Toshio; Sakai, Yuji, Method and apparatus for producing nitrogen trifluoride.
  16. Chae, Seung-Ki; Lee, Sang-Gon; Chung, Sang-Hyuk; Heo, Seong-Jin, Method and apparatus for reducing PFC emission during semiconductor manufacture.
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  18. Lomax, Jr., Franklin D.; Carr, Gregory S.; Todd, Richard S., Method and system for atmosphere recycling.
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  21. Chandler, Phil; Clark, Daniel O.; Vermeulen, Robbert M.; Jung, Jay J.; Johnson, Roger M.; Loldj, Youssef A.; Smith, James L., Methods and apparatus for assembling and operating electronic device manufacturing systems.
  22. Raoux, Sebastien; Curry, Mark W.; Porshnev, Peter; Fox, Allen, Methods and apparatus for improving operation of an electronic device manufacturing system.
  23. Curry, Mark W.; Raoux, Sebastien; Porshnev, Peter, Methods and apparatus for pressure control in electronic device manufacturing systems.
  24. Clark, Daniel O.; Raoux, Sebastien; Vermeulen, Robert M.; Crawford, Shaun W., Methods and apparatus for sensing characteristics of the contents of a process abatement reactor.
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  35. Li Yao-En ; Meimari Magdy,CAX, Process for recovering SF.sub.6 from a gas.
  36. Singh,Rajiv R.; Paonessa,Martin R.; Luly,Matthew H.; Orlowski,David F., Purification of nitrogen trifluoride.
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  38. Wayne Thomas McDermott ; Richard Carl Ockovic ; Alexander Schwarz ; Rakesh Agrawal, Reclamation and separation of perfluorocarbons using condensation.
  39. Yang James Hsu-Kuang ; Chernyakov Iosif ; Hsiung Thomas Hsiao-Ling ; Schwarz Alexander, Recovery of perfluorinated compounds from the exhaust of semiconductor fabs using membrane and adsorption in series.
  40. Roh, Young-Seok, Separation and recycling system of perfluorinated compounds.
  41. Li Yao-En, Separation of CF4 and C2F6 from a perfluorocompound mixture.
  42. O'Brien William G. ; Noelke Charles J. ; Harker Raymond C. ; Van Bramer David John, Separation of CO.sub.2 from unsaturated fluorinated compounds by semipermeable membrane.
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