초록 ▼

An ion source for generating an ion beam of primary ions is disclosed that includes a plasma chamber and magnets positioned therein for separating the primary ions of the plasma from secondary ions within the plasma. An electrode assembly extracts the primary ions through an extractor outlet port of

An ion source for generating an ion beam of primary ions is disclosed that includes a plasma chamber and magnets positioned therein for separating the primary ions of the plasma from secondary ions within the plasma. An electrode assembly extracts the primary ions through an extractor outlet port of the plasma chamber to form an ion beam, which preferentially is shaped as a ribbon beam. The primary ions are accelerated in the form of a ribbon beam toward the target workpiece for doping the device. The magnets are oriented in the chamber to produce a uniform current density of primary ions parallel to the elongated axis of the ribbon beam.

대표청구항 ▼

[ Having described the invention, what is claimed as new and desired to be secured by Letters Patent is:] [1.] Apparatus for controlling the extraction of an ion beam from a plasma having a mixture of primary ions and secondary ions, said apparatus comprising:a chamber for enclosing said plasma, sai

[ Having described the invention, what is claimed as new and desired to be secured by Letters Patent is:] [1.] Apparatus for controlling the extraction of an ion beam from a plasma having a mixture of primary ions and secondary ions, said apparatus comprising:a chamber for enclosing said plasma, said chamber having an outlet port,a magnetic field generating means for separating said primary ions from said secondary ions within said chamber, andan extractor coupled to said outlet port for forming a ribbon shaped ion beam elongated along a first axis,wherein said extractor cooperates with said magnetic field generating means to extract a ribbon shaped ion beam of the primary ions the ribbon shaped ion beam having reduced non-uniformities.