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Co-axial motorized wafer lift

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • C23C-016/00
출원번호 US-0650198 (1996-05-20)
발명자 / 주소
  • Wytman Joe
출원인 / 주소
  • Applied Materials, Inc.
대리인 / 주소
    Fulbright & Jaworski, L.L.P.
인용정보 피인용 횟수 : 23  인용 특허 : 26

초록

A heating and lifting mechanism for positioning a semiconductor wafer within a processing chamber is provided including a pedestal for supporting the wafer within the process chamber, a drive shaft extending downwardly from a lower region of the pedestal, which has a lead screw at a distal portion t

대표청구항

[ I claim:] [1.] An apparatus for vertically moving and positioning a wafer within a chamber comprising:a pedestal for supporting the wafer within the chamber;a shaft extending downwardly from a lower region of the pedestal;a hollow shaft motor surrounding said shaft proximal to a distal portion the

이 특허에 인용된 특허 (26)

  1. Ogami Nobutoshi (Hikone JPX) Mori Noritaki (Hikone JPX), Apparatus for feeding wafers and the like.
  2. Bean John C. (New Providence NJ), Apparatus for simultaneous molecular beam deposition on a plurality of substrates.
  3. Held Kurt (Alte Str. 1 D-7218 Trossingen 2 DEX), Automatic drafting device with adjusting aid.
  4. Grossmann Walter (Baltmannsweiler DEX) Link Helmut F. (Aichwald DEX), Automatic lathe.
  5. Huang Yuchi (Madison WI) Hoerning Jeffrey M. (Madison WI), Cryogenically cooled radiation detection apparatus.
  6. Chizinsky George (143 West St. Beverly Farms MA 01915), Heated plate rapid thermal processor.
  7. Iwamatsu Noboru (Yamanashi JPX) Endo Yuichi (Yamanashi JPX), Hollow shaft motor.
  8. Libby Charles J. (West Roxbury MA), Method and apparatus for image acquisition utilizing a hollow shaft motor and a concave, cylindrical reflector.
  9. Linner John G. (Houston TX), Method for cryopreparing biological tissue for ultrastructural analysis.
  10. Bramhall ; Jr. Robert B. (Gloucester MA) Cloutier Richard M. (Salisbury MA), Platen assembly for a vacuum processing system.
  11. Takahashi Nobuaki (Hachioji JPX), Processing apparatus with means for rotating an object mounting means and a disk body located in the mounting means diff.
  12. Lei Lawrence C. (Milpitas CA) Leung Cissy S. (Fremont CA) Englhardt Eric A. (Palo Alto CA) Sinha Ashok K. (Palo Alto CA), Reducing backside deposition in a substrate processing apparatus through the use of a shadow ring.
  13. Tanaka Yasuhiko (Nara JPX), Rotary compressor with low-pressure and high-pressure gas cut-off valves.
  14. McDiarmid James (San Jose CA), Rotary/linear actuator for closed chamber, and reaction chamber utilizing same.
  15. Hormansdorfer Gerd (Kastanieneck 6a 3167 Burgdorf DEX), Screw seal.
  16. Faria Carl R. (San Leandro CA) Snouse Thomas W. (Fremont CA), Seal structure for metal vacuum joint.
  17. Schneider Joachim (Dusseldorf DEX), Speed changing device.
  18. Ikeda Jiro (Shizuoka JPX), Sputtering apparatus.
  19. Osawa Kazunori (Chiba JPX) Satoh Susumu (Chiba JPX) Kato Toshiyuki (Chiba JPX) Abe Hideo (Chiba JPX) Nishimura Keiji (Chiba JPX), Steel sheets for procelain enameling and method of producing the same.
  20. Takahashi Nobuaki (Hachioji JPX), Surface treatment method and apparatus.
  21. Roth Marvin E. (Reading PA) Vallere Donald J. (Reading PA), Synchronous shielding in vacuum deposition system.
  22. Ogure Naoaki (Tokyo JPX) Kanemitsu Yoichi (Kanagawa-ken JPX), Thin-film forming apparatus with magnetic bearings and a non-contact seal and drive.
  23. Stevens Joseph J. (5653 Enning Ave. San Jose CA 95123) Edwards Roy J. (215 Mont Clair Rd. Los Gatos CA 95030) Tepman Avi (21610 Rainbow Dr. Cupertino CA 95014), Two piece anti-stick clamp ring.
  24. Colgate Samuel O. (4132 NW. 38 St. Gainesville FL 32606) Schrag Grant M. (8114 SW. 53rd Pl. Gainesville FL 32608), Ultra-high vacuum device gasket with means of insertion and removal.
  25. Nishida Keijiro (Nimomiya JPX) Kakei Mitsuo (Tokyo JPX) Kamiya Osamu (Yokohama JPX) Sekimura Nobuyuki (Yokohama JPX), Vapor deposition apparatus.
  26. Coad George L. (Lafayette CA) Shaw R. Howard (Palo Alto CA) Hutchinson Martin A. (Santa Clara CA), Wafer transfer system.

이 특허를 인용한 특허 (23)

  1. Pharand,Michel; Durant,Thomas L.; Eiriksson,Ari; Gueler,Richard, Apparatus for positioning an elevator tube.
  2. Waldner Paul R.,DEX ; Gennat Bernd,DEX ; Recchia Matt, Apparatus for transporting workpiece holders in circulation.
  3. Li Tingkai ; Scott Dane C. ; Wyckoff Brian, Chemical vapor deposition chamber having an adjustable flow flange.
  4. Bhatia,Ritwik; Xia,Li Qun; Peterson,Chad; M'Saad,Hichem, Decreasing the etch rate of silicon nitride by carbon addition.
  5. Jack D. Carrell ; Dennis L. Goodwin, Dual orientation leveling platform for semiconductor apparatus.
  6. Sen, Soovo; Shmurun, Inna; Nowak, Thomas; Fung, Nancy; Hopper, Brian; Kaszuba, Andrzej; Juco, Eller, Heated gas box for PECVD applications.
  7. Yang, Charles Chiun-Chieh, Method and apparatus for forming a silicon wafer with a denuded zone.
  8. Tom Torack ; Michael John Ries, Method and apparatus for forming an epitaxial silicon wafer with a denuded zone.
  9. Yang, Charles Chiun-Chieh; Watkins, Jr., Darrell D., Method for the preparation of an epitaxial silicon wafer with intrinsic gettering.
  10. Crawford, Charles K, Minimal thickness, double-sided flange for insertion between two ultra-high vacuum flanges.
  11. Crawford, Charles K., Minimal thickness, double-sided flanges for ultra-high vacuum components.
  12. Ho, Henry; Cui, Anqing; Yuan, Xiaoxiong, Multi-zone resistive heater.
  13. Yang, Yun-sik; Kim, Kyung-dae; Hong, Hyung-sik; Kim, Min-gyu, Pedestal of a load-cup which supports wafers loaded/unloaded onto/from a chemical mechanical polishing apparatus.
  14. Yang, Yun-sik; Kim, Kyung-dae; Hong, Hyung-sik; Kim, Min-gyu, Pedestal of a load-cup which supports wafers loaded/unloaded onto/from a chemical mechanical polishing apparatus.
  15. Nishikawa, Katsuhito, Rotating susceptor.
  16. Cho,Chun Ho, Sealed line structure for use in process chamber.
  17. Selyutin Leonid ; Zhao Jun, Self aligning lift mechanism.
  18. Selyutin Leonid ; Sajoto Talex ; Zhao Jun, Self-aligning lift mechanism.
  19. Schutte, Christopher L.; Wallace, George T., Semiconductor wafer handler.
  20. Schutte, Christopher L.; Wallace, George T., Semiconductor wafer handler.
  21. Miyazaki, Mitsuru; Inoue, Takuya, Substrate holding apparatus and substrate cleaning apparatus.
  22. Huang, Yu-Chih; Ma, Yin-Cheng; Ho, Sawyer; Tsai, Wen-Shyang; Lin, Chen-Feng, Thermocoupled lift pin system for etching chamber.
  23. Yudovsky, Joseph; Lei, Lawrence C.; Umotoy, Salvador, Tungsten chamber with stationary heater.
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