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Apparatus for real-time, in situ measurement of temperature and a method of fabricating and using same 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • G01K-011/20
출원번호 US-0703500 (1996-08-27)
발명자 / 주소
  • Pan Shaoher X.
출원인 / 주소
  • Applied Materials, Inc.
대리인 / 주소
    Thomason & Moser
인용정보 피인용 횟수 : 26  인용 특허 : 9

초록

Apparatus having a plurality of temperature sensors (probes) positioned at a number of locations upon a platform such as a placebo or dummy wafer and a method of fabricating and using the apparatus. The temperature sensors are photoemissive temperature sensors. To fabricate each of the photoemissive

대표청구항

[ What is claimed is:] [1.] Apparatus for measuring temperature comprising:a placebo wafer; anda plurality of luminescent temperature probes affixed to a surface of said placebo wafer wherein each of said luminescent temperature probes further comprises a mound of thermally conductive material, form

이 특허에 인용된 특허 (9)

  1. Williams Willard J. (P.O. Box 1809 Wilmington CA 90744), Bag and adjustable bag opener frame.
  2. Sun Mei H. (Los Altos CA) Wickersheim Kenneth A. (Menlo Park CA) Heinemann Stanley O. (Irvine CA), Fiberoptic sensing of temperature and/or other physical parameters.
  3. Wissinger Alan B. (Wilton CT), Laser diode temperature sensing system.
  4. Cheng David (San Jose CA) Maydan Dan (Los Altos Hills CA) Somekh Sasson (Los Altos Hills CA) Stalder Kenneth R. (Redwood City CA) Andrews Dana L. (Mountain View CA) Chang Mei (San Jose CA) White John, Magnetic field-enhanced plasma etch reactor.
  5. Hanley Peter R. (Danville CA) Savas Stephen E. (San Jose CA) Levy Karl B. (Saratoga CA) Jha Neeta (Santa Clara CA) Donohoe Kevin (Mountain View CA), Magnetically enhanced plasma reactor system for semiconductor processing.
  6. Tamura Naoyuki (Yamaguchi-ken JPX) Edamura Manabu (Ibaraki-ken JPX) Takahashi Kazue (Yamaguchi-ken JPX), Method and apparatus for detecting the temperature of a sample.
  7. Wickersheim Kenneth A. (Menlo Park CA) Sun Mei H. (Los Altos CA) Heinemann Stanley O. (Irvine CA), Optical temperature measurement techniques.
  8. Kaufmann Meinolph (Baden CHX) Schultheis Lothar (Fislisbach CHX), Pyrometric temperature measuring instrument.
  9. Sandroff Claude J. (Tinton Falls NJ) Sandroff Francoise S. (Tinton Falls NJ), Temperature measurement in a processing chamber using in-situ monitoring of photoluminescence.

이 특허를 인용한 특허 (26)

  1. Sasaki, Yasuharu; Ueda, Takehiro; Okajo, Taketoshi; Oohashi, Kaoru, Apparatus and method for evaluating a substrate mounting device.
  2. Herzog,Marc Jacques, Apparatus and process for locating and for measuring variations in temperature and/or in degree of fouling over the internal surface of equipment.
  3. Syracuse, Steven J.; Clark, Roy, Apparatus and system for monitoring temperature of high voltage conductors.
  4. Gaff, Keith; Benjamin, Neil Martin Paul, Apparatus for determining a temperature of a substrate and methods therefor.
  5. Gaff,Keith; Benjamin,Neil Martin Paul, Apparatus for determining a temperature of a substrate and methods therefor.
  6. Renken Wayne G. ; Sun Mei H., Apparatus for sensing temperature on a substrate in an integrated circuit fabrication tool.
  7. Gotthold, John P.; Hoang, Anh N.; Sandhu, Surinder S.; Shaver, John Leonard; Stapleton, Terry M., In situ optical surface temperature measuring techniques and devices.
  8. Gotthold,John P.; Stapleton,Terry M.; Champetier,Robert; Dang,Hung, In situ optical surface temperature measuring techniques and devices.
  9. Gotthold,John P.; Stapleton,Terry M.; Champetier,Robert; Dang,Hung, In situ optical surface temperature measuring techniques and devices.
  10. Renken Wayne Glenn ; Sun Mei H. ; Miller Paul ; Gordon Roy ; Vandenabeele Peter Michael Noel,BEX, Integrated wafer temperature sensors.
  11. Van Cleemput, Patrick A.; Ndiege, Nicholas Muga; Mohn, Jonathan D., Low k dielectric deposition via UV driven photopolymerization.
  12. Hawkins Mark Richard ; Vyne Robert Michael ; van der Jeugd Cornelius Alexander, Method and system for adjusting semiconductor processing equipment.
  13. Pevzner, Pavel; Weller, Tanchum; Berkovits, Avraham, Method and system for detecting damage in layered structures.
  14. Sharratt, Stephen; Quli, Farhat; Jensen, Earl; Sun, Mei, Method and system for measuring heat flux.
  15. Draeger, Nerissa Sue; Ashtiani, Kaihan Abidi; Padhi, Deenesh; Wong, Derek B.; van Schravendijk, Bart J.; Antonelli, George Andrew; Kolics, Artur; Zhao, Lie; van Cleemput, Patrick A., Method for selectively sealing ultra low-k porous dielectric layer using flowable dielectric film formed from vapor phase dielectric precursor.
  16. Steger, Robert J., Methods and apparatus for in situ substrate temperature monitoring.
  17. Hunter,Reginald, Sensor device for non-intrusive diagnosis of a semiconductor processing system.
  18. Hunter,Reginald, Sensor device for non-intrusive diagnosis of a semiconductor processing system.
  19. Edward B. Stokes ; Steven H. Azzaro ; Thomas G. O'Keeffe, Status detection apparatus and method for fluid-filled electrical equipment.
  20. Mohn, Jonathan D.; te Nijenhuis, Harald; Hamilton, Shawn M.; Madrigal, Kevin; Lingampalli, Ramkishan Rao, System and apparatus for flowable deposition in semiconductor fabrication.
  21. Khaja, Fareen Adeni; Mordo, David, Systems and methods for detecting the existence of one or more environmental conditions within a substrate processing system.
  22. Hirano, Ryoichi; Yoshitake, Shusuke; Tojo, Toru; Fukutome, Shuichiro; Yamamoto, Teruaki; Toriumi, Masaki, Temperature measuring method in pattern drawing apparatus.
  23. Lue, Brian; Ishikawa, Tetsuya; Wang, Liang-Guo, Temperature sensor with shell.
  24. Aderhold, Wolfgang; Ravi, Jallepally; Ramachandran, Balasubramanian; Hunter, Aaron M.; Iliopoulos, Ilias, Temperature uniformity measurement during thermal processing.
  25. Aderhold, Wolfgang; Hegedus, Andreas G.; Merry, Nir, Temperature uniformity measurements during rapid thermal processing.
  26. Reilly, Patrick; te Nijenhuis, Harald; Draeger, Nerissa; van Schravendijk, Bart J.; Ndiege, Nicholas Muga, Treatment for flowable dielectric deposition on substrate surfaces.
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