[특허]Method for depositing diamond films by dielectric barrier discharge

Method for depositing diamond films by dielectric barrier discharge 원문보기

IPC분류정보
국가/구분	United States(US) Patent 등록
국제특허분류(IPC7판)	B05D-003/06 C23C-016/26
출원번호	US-0607279 (1996-02-23)
발명자 / 주소	Jaffe Stephen M. Simpson Matthew Shepard Cecil B. Heuser Michael S.
출원인 / 주소	Saint Gobain/Norton Industrial Ceramics Corp.
대리인 / 주소	Ulbrich
인용정보	피인용 횟수 : 29 인용 특허 : 13

초록 ▼

A method is disclosed for depositing diamond film, including the following steps: providing an environment comprising hydrogen gas and a hydrocarbon gas; dissociating hydrogen gas of the environment by dielectric barrier discharge to obtain atomic hydrogen; and providing a deposition surface in the environment and implementing diamond deposition on the deposition surface from the hydrocarbon gas, assisted by the atomic hydrogen. In a preferred embodiment, the atomic hydrogen is transported by molecular diffusion from its dissociation site to the deposition surface.

대표청구항 ▼

[ We claim:] [1.] A method for depositing diamond film, comprising the steps of:providing an environment comprising hydrogen gas and a hydrocarbon gas;dissociating hydrogen gas of said environment by dielectric barrier discharge to obtain atomic hydrogen; andproviding a deposition surface having an area of at least 300 cm.sup.2 in said environment and implementing diamond deposition on said deposition surface from said hydrocarbon gas, assisted by said atomic hydrogen;said atomic hydrogen being transported by molecular diffusion from its dissociation site to said deposition surface, and said hydrogen gas being dissociated over an area opposing said deposition surface of at least 300 cm.sup.2 and at a distance of less than 10 millimeters from said deposition surface.

이 특허에 인용된 특허 (13)

Kaganowicz Grzegorz (Belle Mead NJ), Apparatus for making a plasma coating.
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Anthony Thomas R. (Schenectady NY) DeVries Robert C. (Burnt Hills NY) Engler Richard A. (Schenectady NY) Ettinger Robert H. (Schenectady NY) Fleischer James F. (Scotia NY), Apparatus for synthetic diamond deposition including curved filaments and substrate cooling means.
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D\Aoust James R. (San Diego CA) Ohkawa Tihiro (La Jolla CA), Corona discharge treatment.
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Lowther Frank E. (Phelps NY), Corona generator method and apparatus.
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Cann Gordon L. (Laguna Beach CA), Diamond deposition cell.
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Cann Gordon L. (Laguna Beach CA), Diamond deposition cell.
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Kurihara Kazuaki (Atsugi JPX) Sasaki Kenichi (Atsugi JPX) Kawarada Motonobu (Atsugi JPX) Koshino Nagaaki (Yokohama JPX), Method and apparatus for vapor deposition of diamond.
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Ikegaya Akihiko (Itami JPX) Tobioka Masaaki (Kobe JPX), Method for synthesizing diamond.
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Rosenthal Louis A. (Highland Park NJ), Method for the surface treatment of thermoplastic materials.
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Okazaki Satiko (Tokyo JPX) Kogoma Masuhiro (Saitama JPX), Method of forming a thin polymeric film by plasma reaction under atmospheric pressure.
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Wooten Robert D. (Rockville MD) Egermeier John C. (Vienna VA), Ozone generator with improved dielectric and method of manufacture.
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Calcote Hartwell F. (Princeton NJ), Process for forming diamond coating using a silent discharge plasma jet process.
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Collins Wayne M. (Oconomowoc WI), Resilient dielectric electrode for corona discharge devices.
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이 특허를 인용한 특허 (29)

Rego, Robby Jozef Martin; Havermans, Danny; Cools, Jan Jozef, Atmospheric-pressure plasma jet.
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Veerasamy Vijayen S. ; Petrmichl Rudolph Hugo ; Thomsen Scott V., Coated article including a DLC inclusive layer(s) and a layer(s) deposited using siloxane gas, and corresponding method.
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Murokh, Igor, Dielectric plasma chamber apparatus and method with exterior electrodes.
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Veerasamy Vijayen S., Highly tetrahedral amorphous carbon coating on glass.
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Veerasamy Vijayen S., Highly tetrahedral amorphous carbon coating on glass.
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Veerasamy, Vijayen S., Highly tetrahedral amorphous carbon coating on glass.
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Veerasamy Vijayen S. ; Petrmichl Rudolph Hugo ; Thomsen Scott V., Hydrophobic coating including DLC and/or FAS on substrate.
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Vijayen S. Veerasamy, Hydrophobic coating including DLC on substrate.
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Veerasamy Vijayen S. ; Petrmichl Rudolph Hugo, Hydrophobic coating with DLC & FAS on substrate.
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Vijayen S. Veerasamy ; Rudolph Hugo Petrmichl ; Scott V. Thomsen, Low-E coating system including protective DLC.
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Lee, Wook-Seong; Baik, Young-Joon; Jeong, Jeung-Hyun; Chae, Ki-Woong, Method for DC plasma assisted chemical vapor deposition in the absence of a positive column.
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Vijayen S. Veerasamy ; Rudolph Hugo Petrmichl, Method of depositing DLC inclusive coating on substrate.
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Vijayen S. Veerasamy ; Rudolph Hugo Petrmichl ; Scott V. Thomsen, Method of deposition DLC inclusive layer(s) using hydrocarbon and/or siloxane gas(es).
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Veerasamy, Vijayen S.; Petrmichl, Rudolph Hugo, Method of ion beam milling a glass substrate prior to depositing a coating system thereon, and corresponding system for carrying out the same.
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Vijayen S. Veerasamy ; Rudolph Hugo Petrmichl, Method of ion beam milling substrate prior to depositing diamond like carbon layer thereon.
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Veerasamy, Vijayen S.; Petrmichl, Rudolph Hugo, Method of making a coated article including DLC and FAS.
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Veerasamy, Vijayen S.; Petrmichl, Rudolph Hugo; Thomsen, Scott V., Method of making coated article including DLC inclusive layer over low-E coating.
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Vijayen S. Veerasamy ; Rudolph Hugo Petrmichl ; Scott V. Thomsen, Method of making coated article including diamond-like carbon (DLC) and FAS.
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Veerasamy, Vijayen S., Method of making coated article including layer(s) of diamond-like carbon which may be hydrophobic.
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Veerasamy, Vijayen S., Method of making coating article including carbon coating on glass.
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Veerasamy,Vijayen S., Method of making heat treatable coated article with diamond-like carbon (DLC) inclusive layer.
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Veerasamy, Vijayen S., Method of making heat treatable coated article with protective layer.
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Satoshi Takaki JP; Yoshio Segi JP; Atsushi Yamagami JP; Hiroyuki Katagiri JP; Hitoshi Murayama JP; Yasuyoshi Takai JP, Plasma CVD apparatus and plasma processing method.
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Willkofer, Stefan; Wahl, Uwe; Knott, Bernhard; Hammer, Markus; Strasser, Andreas, Semiconductor device and method of manufacture thereof.
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Willkofer, Stefan; Wahl, Uwe; Knott, Bernhard; Hammer, Markus; Strasser, Andreas, Semiconductor device and method of manufacture thereof.
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Willkofer, Stefan; Wahl, Uwe; Knott, Bernhard; Hammer, Markus; Strasser, Andreas, Semiconductor device and method of manufacture thereof.
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Veerasamy, Vijayen S.; Petrmichl, Rudolph Hugo; Thomsen, Scott V., Solar management coating system including protective DLC.
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Vijayen S. Veerasamy ; Rudolph Hugo Petrmichl ; Scott V. Thomsen, Solar management coating system including protective DLC.
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Busche, Matt; Mace, Adam; Kang, Michael; Ronne, Allan, Temperature controlled window of a plasma processing chamber component.
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Method for depositing diamond films by dielectric barrier discharge 원문보기