[특허]Processing furnace for oxidizing objects

Processing furnace for oxidizing objects 원문보기

IPC분류정보
국가/구분	United States(US) Patent 등록
국제특허분류(IPC7판)	H05B-006/80 H01L-021/31
출원번호	US-0341052 (1994-11-16)
우선권정보	JP-0026084 (1994-01-28)
발명자 / 주소	Homma Kenji,JPX Yomiya Koichi,JPX
출원인 / 주소	Tokyo Electron Tohoku Kabushiki Kaisha, JPX
대리인 / 주소	Beveridge, DeGrandi, Weilacher & Young, L.L.P.
인용정보	피인용 횟수 : 45 인용 특허 : 7

초록 ▼

The present invention comprises a processing furnace for oxidizing object to be processed at a high temperature, pressure reducing means for evacuating the interior of the processing furnace, a burning apparatus disposed outside the processing furnace for burning hydrogen gas and oxygen gas to generate water vapor, a water vapor supply pipe interconnecting the burning apparatus and to the processing furnace, and a throttle disposed on the water vapor supply pipe for generating a pressure difference in the water vapor supply pipe between a side of the burning apparatus and a side of the processing furnace. Stable burning is ensured in the burning apparatus, which makes set oxidation under low pressures possible. It is possible that in place of the throttle, atomization means for atomizing pure water, or a boiling water vapor generating unit, or a microwave water vapor generating unit.

대표청구항 ▼

[ What is claimed is:] [1.] A reduced pressure and wet oxidation system comprising:a processing furnace for oxidizing object to be processed at a high temperature and under reduced pressure;pressure reducing means for evacuating the interior of the processing furnace and reducing a pressure therein;burning means disposed outside the processing furnace for burning hydrogen gas and oxygen gas to generate water vapor;water vapor supply means interconnecting the burning means and the processing furnace operating at a reduced pressure; andthrottle means disposed on the water vapor supply means for generating a pressure difference in the water vapor supply means between a side of the burning means and a side of the processing furnace so that the pressure in the burning means is higher than the pressure in the processing furnace.

이 특허에 인용된 특허 (7)

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Eschbach Rudolph J. B. (Amenia NY), Manufacturing system for low temperature chemical vapor deposition of high purity metals.
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Toole Monte M. (Mill Valley CA) Champagne Robert B. (Mountain View CA), Silicon wafer steam oxidizing apparatus.
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이 특허를 인용한 특허 (45)

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Yang, Cheol-Kyu; Lee, Seog-Min; Jang, Chul-Young; Son, Dong-Min; Ahn, Byung-Ho; Jeon, Du-Han; Joo, Yong-Kyu; Ha, Sang-Cheol, Batch type apparatus for manufacturing semiconductor devices.
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Nagata, Hiroshi; Shingaki, Yoshinori, Coating method and apparatus, a permanent magnet, and manufacturing method thereof.
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Yukimasa Saito JP; Hitoshi Murata JP; Hiroyuki Yamamoto JP, Heat treatment apparatus and cleaning method of the same.
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Hargett, Jr., Wyatt P.; Thomas, James E., Method and apparatus for microwave assisted high throughput high pressure chemical synthesis.
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Tokai, Nobuo; Maeda, Yuji; Hashimoto, Masayuki, Method and system for forming film, semiconductor device and fabrication method thereof.
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Donohoe, Kevin G., Method for improving uniformity in batch processing of semiconductor wafers.
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IPC	Description
A	생활필수품
A62	인명구조; 소방(사다리 E06C)
A62B	인명구조용의 기구, 장치 또는 방법(특히 의료용에 사용되는 밸브 A61M 39/00; 특히 물에서 쓰이는 인명구조 장치 또는 방법 B63C 9/00; 잠수장비 B63C 11/00; 특히 항공기에 쓰는 것, 예. 낙하산, 투출좌석 B64D; 특히 광산에서 쓰이는 구조장치 E21F 11/00)
A62B-1/08	.. 윈치 또는 풀리에 제동기구가 있는 것

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연합인증

Processing furnace for oxidizing objects 원문보기

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이 특허에 인용된 특허 (7)

이 특허를 인용한 특허 (45)

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Processing furnace for oxidizing objects 원문보기

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이 특허에 인용된 특허 (7)

이 특허를 인용한 특허 (45)

관련 콘텐츠

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