Bridged bis-fluorenyl metallocenes, process for the preparation thereof and use thereof in catalysts for the polymerizat
원문보기
IPC분류정보
국가/구분
United States(US) Patent
등록
국제특허분류(IPC7판)
C07F-009/00
C07F-017/00
C07F-007/00
C07F-007/28
출원번호
US-0609721
(1996-03-01)
우선권정보
IT-0000410 (1995-03-03)
발명자
/ 주소
Resconi Luigi,ITX
Jones Robert L.
출원인 / 주소
Montell Technology Company BV, NLX
대리인 / 주소
Bryan Cave LLP
인용정보
피인용 횟수 :
29인용 특허 :
0
초록▼
Metallocene compounds of a Group 4 or 5 metal having two fluorenyl ligands bridged with a single silicon or germanium atom, said atom having two substituent groups containing a total of at least four carbon atoms, are useful as catalyst components for the polymerization of olefins. Particularly, it
Metallocene compounds of a Group 4 or 5 metal having two fluorenyl ligands bridged with a single silicon or germanium atom, said atom having two substituent groups containing a total of at least four carbon atoms, are useful as catalyst components for the polymerization of olefins. Particularly, it is possible to prepare high molecular weight atactic polypropylene with improved yields with respect to the known catalysts.
대표청구항▼
[ What is claimed is:] [1.] A metallocene compound of formula (I): [ STR 9 ] wherein each R.sup.1, same or different, is a hydrogen atom, a C.sub.1 -C.sub.20 --alkyl cycloalkyl radical, a C.sub.2 -C.sub.20 --alkenyl radical, a C.sub.6 -C.sub.20 aryl radical, a C.sub.7 -C.sub.20 --alkylaryl radical,
[ What is claimed is:] [1.] A metallocene compound of formula (I): [ STR 9 ] wherein each R.sup.1, same or different, is a hydrogen atom, a C.sub.1 -C.sub.20 --alkyl cycloalkyl radical, a C.sub.2 -C.sub.20 --alkenyl radical, a C.sub.6 -C.sub.20 aryl radical, a C.sub.7 -C.sub.20 --alkylaryl radical, or a C.sub.7 -C.sub.20 arylalkyl radical, and further wherein two adjacent R.sup.1 substituents can form a cycle comprising from 5 to 8 carbon atoms, and furthermore the R.sup.1 substituents can contain silicon or germanium atoms;E is a bridging group selected from the group consisting of an SiR.sup.3.sub.2 group and a GeR.sup.3.sub.2 group, wherein each R.sup.3, same or different, is a C.sub.3 -C.sub.20 --alkyl radical, a C.sub.3 -C.sub.20 --cycloalkyl radical, a C.sub.2 -C.sub.20 --alkenyl radical, a C.sub.7 -C.sub.20 --alkylaryl radical, or a C.sub.7 --C.sub.20 arylalkyl radical, optionally containing heteroatoms, or the two R.sup.3 substituents can be joined to form a cycle comprising up to 8 atoms, at least four total carbon atoms being contained in the two R.sup.3 substituents;M is an atom of a transition metal selected from those belonging to Group 4 and 5 in the Periodic Table of the Elements (new IUeach Z substituent, same or different, is a halogen atom, an --OH, --SH, --R.sup.4 OR.sup.4, --SR.sup.4, --NR.sup.4.sub.2, or --PR.sup.4.sub.2 group, wherein R.sup.4 has the same definition as R.sup.1.
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이 특허를 인용한 특허 (29)
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