초록 ▼

A substrate processing apparatus comprises a substrate transfer chamber; a plurality of substrate processing chambers disposed on a first side wall of the substrate transfer chamber and stacked in the vertical direction; a plurality of first gate valves, each being disposed between each of the subst

A substrate processing apparatus comprises a substrate transfer chamber; a plurality of substrate processing chambers disposed on a first side wall of the substrate transfer chamber and stacked in the vertical direction; a plurality of first gate valves, each being disposed between each of the substrate processing chambers and the substrate transfer chamber; a substrate accommodating chamber disposed on a second side wall of the substrate transfer chamber; a substrate transfer device, disposed within the substrate transfer chamber, for transferring the substrate under reduced pressure between the substrate processing chambers and the substrate accommodating chamber; an elevator disposed outside the substrate transfer chamber and comprising a stationary portion and an elevating portion which is vertically movable with respect to the stationary portion; a rigid connecting member capable of moving through a through-hole formed in a predetermined face of the substrate transfer chamber, the rigid connecting member mechanically connecting the elevating portion and the substrate transfer device through the through-hole; and a sealing member for establishing a hermetic vacuum seal between the predetermined surface and the connecting member which penetrates through the through-hole.

대표청구항 ▼

[ What is claimed is:] [1.] A substrate processing apparatus, comprising:a substrate transfer chamber which can be depressurized;a plurality of substrate processing chambers disposed on a first side wall of said substrate transfer chamber, said plurality of the substrate processing chambers being st

[ What is claimed is:] [1.] A substrate processing apparatus, comprising:a substrate transfer chamber which can be depressurized;a plurality of substrate processing chambers disposed on a first side wall of said substrate transfer chamber, said plurality of the substrate processing chambers being stacked in the vertical direction;a plurality of first valves, each being disposed between each of said substrate processing chambers and said substrate transfer chamber, and each of said plurality of the first valves being capable of providing hermetic vacuum isolation between each of said substrate processing chambers and said substrate transfer chamber when closed and allowing a substrate to pass therethrough when opened;a substrate accommodating chamber disposed on a second side wall of said substrate transfer chamber;a substrate transfer device disposed within said substrate transfer chamber and being capable of transferring said substrate under reduced pressure between said substrate processing chambers and said substrate accommodating chamber;an elevating device disposed outside said substrate transfer chamber and comprising a stationary portion and an elevating portion which is vertically movable with respect to said stationary portion;a rigid connecting member capable of moving through a through-hole formed in a predetermined face of said substrate transfer chamber, said rigid connecting member mechanically connecting said elevating portion and said substrate transfer device through said through-hole; anda sealing member for establishing a hermetic vacuum seal between said predetermined face and said connecting member which penetrates through said through-hole.