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Method of adding on chip capacitors to an integrated circuit

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • H01L-021/20
출원번호 US-0680286 (1996-07-11)
발명자 / 주소
  • Leung Pak K.,CAX
  • Emesh Ismail T.,CAX
출원인 / 주소
  • Northern Telecom Limited, CAX
대리인 / 주소
    de Wilton
인용정보 피인용 횟수 : 135  인용 특허 : 7

초록

A capacitor structure and method of forming a capacitor structure for an integrated circuit is provided. The capacitor structure, comprising a bottom electrode, capacitor dielectric and top electrode, is formed on a passivation layer overlying the interconnect metallization. The capacitor electrodes

대표청구항

[ What is claimed is:] [1.] A method of providing a capacitor for an integrated circuit, the integrated circuit having interconnect metallization and an overlying passivation layer comprising a substantially planar surface; the method comprising:opening vias through the passivation layer for contact

이 특허에 인용된 특허 (7)

  1. Summerfelt Scott R. (Dallas TX), Conductive exotic-nitride barrier layer for high-dielectric-constant materials.
  2. Miller William D. (Rio Rancho NM) Evans Joseph T. (Albuquerque NM) Kinney Wayne I. (Albuquerque NM) Shepherd William H. (Corrales NM), Fabrication of ferroelectric capacitor and memory cell.
  3. Summerfelt Scott R. (Dallas TX) Beratan Howard R. (Richardson TX) Kirlin Peter S. (Bethel CT) Gnade Bruce E. (Dallas TX), High-dielectric-constant material electrodes comprising thin platinum layers.
  4. Yamamichi Shintaro (Tokyo JPX) Watanabe Hirohito (Tokyo JPX) Hashimoto Toshiki (Tokyo JPX) Sakuma Toshiyuki (Tokyo JPX), Method for fabricating a thin film capacitor.
  5. Nishioka Yasushiro (Tsukuba TX JPX) Summerfelt Scott R. (Dallas TX) Park Kyung-Ho (Tsukuba JPX) Bhattacharya Pijush (Midnapur INX), Method of forming high-dielectric-constant material electrodes comprising sidewall spacers.
  6. Maniar Papu D. (Austin TX) Moazzami Reza (Austin TX) Mogab C. Joseph (Austin TX), Process for forming a semiconductor device having a reducing/oxidizing conductive material.
  7. Chung Henry W. (Cupertino CA), Stacked capacitor with a thin film ceramic oxide layer.

이 특허를 인용한 특허 (135)

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