초록 ▼

An ion implantation system that rapidly and efficiently processes large quantities of workpieces, such as flat panel displays. The ion implantation system includes a high vacuum process chamber that mounts an ion source, a single workpiece translating stage, and a loadlock. The single workpiece hand

An ion implantation system that rapidly and efficiently processes large quantities of workpieces, such as flat panel displays. The ion implantation system includes a high vacuum process chamber that mounts an ion source, a single workpiece translating stage, and a loadlock. The single workpiece handling assembly mounted within the process chamber both removes the workpiece from the loadlock and supports the workpiece during implantation by the ion beam generated by the ion source. The process chamber is in selective fluid communication with a loadlock assembly, which in turn is mechanically integrated with a workpiece loading or end station. Additionally, the workpiece handling assembly includes a translation stage or element for translating the workpiece in a linear scanning direction during implantation. This linear scanning direction extends along a path transverse or orthogonal to the horizontal longitudinal axis of the implantation system. According to one practice, the scanning direction and the longitudinal axis form an angle therebetween that is less than or equal to about 85 degrees.

대표청구항 ▼

[ Having described the invention, what is claimed as new and desired to be secured by Letters Patent is:] [1.] An ion implantation system for processing a workpiece, comprisingan ion source for ionizing selected matter to generate an ion beam,a housing defining a process chamber that is fluidly coup

[ Having described the invention, what is claimed as new and desired to be secured by Letters Patent is:] [1.] An ion implantation system for processing a workpiece, comprisingan ion source for ionizing selected matter to generate an ion beam,a housing defining a process chamber that is fluidly coupled to the ion source,a loadlock chamber coupled to the housing and separately pressurizable relative to the process chamber, anda single workpiece handling assembly mounted within the process chamber for removing the workpiece from the loadlock chamber and for supporting the workpiece during implantation by the ion beam generated by the ion source.