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Liquid vaporizing apparatus 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • B01F-003/04
출원번호 US-0856575 (1997-05-15)
우선권정보 JP-0251461 (1992-09-21)
발명자 / 주소
  • Yamaguchi Tooru,JPX
  • Tsutahara Kouichirou,JPX
  • Suenaga Takayuki,JPX
출원인 / 주소
  • Ryoden Semiconductor System Engineering Corporation, JPX
대리인 / 주소
    Leydig, Voit & Mayer, Ltd.
인용정보 피인용 횟수 : 21  인용 특허 : 9

초록

A liquid vaporizing apparatus includes a container for holding a liquid at a constant temperature with a temperature adjustment unit and a gas that does not react with the liquid is bubbled through the liquid in the container to vaporize the liquid. The container for holding the liquid has an intern

대표청구항

[ What is claimed is:] [1.] A liquid vaporizing apparatus comprising:a container for holding a liquid to be vaporized;a bubbling tube inserted into said container for vaporizing the liquid by blowing a gas into the liquid;a gas ejection pipe for ejecting blown gas and vaporized liquid outside of sai

이 특허에 인용된 특허 (9)

  1. Sielaff Gnter (Bensheim DEX) Joseph Frank (Gernsheim DEX) Harder Norbert (Aschaffenburg DEX), Apparatus for producing a gas mixture by the saturation method.
  2. Ban Cozy (Itami JPX) Ohmori Toshiaki (Itami JPX) Fukumoto Takaaki (Itami JPX), Apparatus for treating the surface of a semiconductor substrate.
  3. Mihira Hiroshi (Kyoto JPX) Shimizu Tetsuo (Kyoto JPX) Hirahara Kazuhiro (Nigata JPX) Ishihara Toshinobu (Nigata JPX) Takaya Seiki (Kanagawa JPX), Apparatus for vaporizing and supplying organometal compounds.
  4. Gomi Hideki (Tokyo JPX), Chemical vapor deposition apparatus.
  5. Beer Gary L. (Plano TX) Skinner James L. (Plano TX), Method and apparatus for separating and recovering water and light aromatic hydrocarbons from a gaseous stream.
  6. Casper Clemens (Krefeld DEX) Lippert Axel (Krefeld-Verberg DEX) Sajben Johannes O. (Krefeld DEX), Multi-phase flow tube for mixing, reacting and evaporating components.
  7. Mulholland D. Lindsay (Puslinch CAX) Sheppard John D. (Montreal CAX), Separation of volatiles from aqueous solutions by gas stripping.
  8. Partus Fred P. (Cobbs County GA), Vapor delivery control system and method.
  9. McMenamin Joseph C. (Oceanside CA), Vapor mass flow control system.

이 특허를 인용한 특허 (21)

  1. Gealy, Dan; Weimer, Ronald A., Ampoules for producing a reaction gas and systems for depositing materials onto microfeature workpieces in reaction chambers.
  2. Carpenter,Craig M.; Mardian,Allen P.; Dando,Ross S.; Tschepen,Kimberly R.; Derderian,Garo J., Apparatus and method for depositing materials onto microelectronic workpieces.
  3. Mardian, Allen P.; Rodriguez, Santiago R., Apparatus and methods for manufacturing microfeatures on workpieces using plasma vapor processes.
  4. Carpenter,Craig M.; Dando,Ross S.; Mardian,Allen P., Apparatus for controlling gas pulsing in processes for depositing materials onto micro-device workpieces.
  5. Mizunaga, Kouichi; Kudoh, Hiroyuki; Ooshima, Kazuhiko, Chemical solution vaporizing tank and chemical solution treating system.
  6. Hirata, Kaoru; Nagase, Masaaki; Hidaka, Atsushi; Matsumoto, Atsushi; Dohi, Ryousuke; Nishino, Kouji; Ikeda, Nobukazu, Evaporation supply apparatus for raw material and automatic pressure regulating device used therewith.
  7. Loan, James F.; Salerno, Jack P., Film processing system.
  8. Rius, Jean-Michel, Gas feed installation for machines depositing a barrier layer on containers.
  9. Zhang, Chaojiong, Gas humidifier.
  10. Shero, Eric J.; Verghese, Mohith; Maes, Jan Willem, High concentration water pulses for atomic layer deposition.
  11. Shimizu, Akira; Kobayashi, Akiko; Kanayama, Hiroki, Method for controlling flow and concentration of liquid precursor.
  12. Zheng,Lingyi A.; Doan,Trung T.; Breiner,Lyle D.; Ping,Er Xuan; Beaman,Kevin L.; Weimer,Ronald A.; Kubista,David J.; Basceri,Cem, Methods and apparatus for processing microfeature workpieces, e.g., for depositing materials on microfeature workpieces.
  13. Dando, Ross S.; Gealy, Dan, Methods for depositing material onto microfeature workpieces in reaction chambers and systems for depositing materials onto microfeature workpieces.
  14. Dando, Ross S.; Gealy, Dan, Methods for depositing material onto microfeature workpieces in reaction chambers and systems for depositing materials onto microfeature workpieces.
  15. Pomarede, Christophe; Shero, Eric; Verghese, Mohith; Maes, Jan Willem; Wang, Chang-Gong, Methods of vapor deposition with multiple vapor sources.
  16. Pomarede, Christophe; Shero, Eric; Verghese, Mohith; Maes, Jan Willem; Wang, Chang-Gong, Multiple vapor sources for vapor deposition.
  17. Itonaga, Masashi; Watanabe, Masanobu, Processing gas generating apparatus, processing gas generating method, substrate processing method, and storage medium.
  18. Carpenter,Craig M.; Dando,Ross S.; Dynka,Danny, Reactors with isolated gas connectors and methods for depositing materials onto micro-device workpieces.
  19. Dando, Ross S., Reactors with isolated gas connectors and methods for depositing materials onto micro-device workpieces.
  20. Miller, Matthew W.; Basceri, Cem, Reactors, systems and methods for depositing thin films onto microfeature workpieces.
  21. Yao,Isoji, Steam-supplying apparatus for hairdressing and beauty care.
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