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Electroless gold plating bath 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • B22F-007/00
출원번호 US-0782564 (1997-01-10)
우선권정보 JP-0092202 (1993-03-26)
발명자 / 주소
  • Murakami Tooru,JPX
  • Morimoto Keizin,JPX
  • Yanada Isamu,JPX
  • Tsujimoto Masanobu,JPX
출원인 / 주소
  • C. Uyemura & Co.,Ltd., JPX
대리인 / 주소
    Sughrue, Mion, Zinn, Macpeak & Seas, PLLC
인용정보 피인용 횟수 : 10  인용 특허 : 18

초록

To an electroless gold plating bath comprising a water-soluble gold compound, a complexing agent, and a reducing agent is added a small amount of polyvinyl pyrrodidone. The bath allows a satisfactory gold plating film to be formed on metal portions on a non-conductive substrate without plating sprea

대표청구항

[ We claim:] [1.] An electroless gold plating bath comprising a water-soluble gold plating bath comprising a water-soluble salt of a gold sulfite in an amount of 1 to 20 grams/liter of gold ion, a complexing agent selected from the group consisting of alkali metal and ammonium salts of sulfite, and

이 특허에 인용된 특허 (18)

  1. Iacovangelo Charles D. (Schenectady NY), Autocatalytic electroless gold plating composition.
  2. Gesemann, Renate; Spindler, Jurgen; Richter, Falk; Broulik, Renate; Janotta, Klaus; Ruther, Robert; Dettke, Manfred, Combination of aqueous baths for electroless gold deposition.
  3. Halecky Alan A. (Bayonne NJ) El-Shazly Mohamed F. (Bloomfield NJ), Electroless direct deposition of gold on metallized ceramics.
  4. Krulik Gerald A. (El Toro CA) Mandich Nenad V. (Homewood IL), Electroless gold plating composition.
  5. Ushio Jiro (Yokohama JPX) Miyazawa Osamu (Yokosuka JPX) Yokono Hitoshi (Fujisawa JPX) Tomizawa Akira (Yokohama JPX), Electroless gold plating solution.
  6. Ando Setsuo (Kawasaki) Ushio Jiro (Yokohama) Inoue Takashi (Yokohama) Okudaira Hiroaki (Yokohama) Shimazaki Takeshi (Hitachi) Yokono Hitoshi (Fujisawa JPX), Electroless gold plating solution and method for plating gold therewith.
  7. Ushio Jiro (Yokohama) Miyazawa Osamu (Yokosuka) Tomizawa Akira (Yokohama) Yokono Hitoshi (Ibaraki) Kanda Naoya (Yokohama) Matsuura Naoko (Yokohama) Ando Setsuo (Kawasaki) Okudaira Hiroaki (Yokohama J, Electroless gold plating solution, method of plating with gold by using the same, and electronic device plated with gold.
  8. Nakazawa Masao (Nagano JPX) Yoshitani Masaaki (Ueda JPX) Wakabayashi Shinichi (Nagano JPX), Electroless gold plating solutions.
  9. Ushio Jiro (Yokohama JPX) Miyazawa Osamu (Yokosuka JPX) Tomizawa Akira (Yokohama JPX) Yokono Hitoshi (Ibaraki JPX) Kanda Naoya (Yokohama JPX) Matsuura Naoko (Yokohama JPX) Ando Setsuo (Kawasaki JPX) , Electronic device plated with gold by means of an electroless gold plating solution.
  10. Redmond John Peter (Mechanicsburg PA) Andrews Daniel Marshall (Harrisburg PA) Guyler Karl Edward (Harrisburg PA), Gold deposition procedures and substrates upon which gold has been deposited.
  11. Perovetz Lawrence M. (Stanmore GB2) Bhattacharya Nagendra N. (Greenway Tylers Green GBX), Gold plating solutions, creams and baths.
  12. Inaba Yoshiharu (Kodaira JA) Kawanobe Toru (Kodaira JA), Method for electroless plating gold directly on tungsten or molybdenum.
  13. Canaperi Donald F. (Bridgewater CT) Jagannathan Rangarajan (Patterson NY) Krishnan Mahadevaiyer (Hopewell Junction NY), Method of replenishing electroless gold plating baths.
  14. Krulik Gerald A. (Lake Forest CA) Mandich Nenad V. (Homewood IL) Singh Rajwant (Fullerton CA), Plating rate improvement for electroless silver and gold plating.
  15. Hattori Noriko (Higashiosaka JPX) Torikai Eiichi (Yao JPX) Kawagishi Shigemitsu (Suita JPX) Tadakoshi Mitsuaki (Osaka JPX) Okuno Kazuyoshi (Ashiya JPX), Process for electroless gold plating.
  16. Brandenburger Jrgen (Selb DEX), Process for electrolessly depositing nickel.
  17. Prost-Tournier Patrick (Epagny FRX) Allemmoz Christiane (Loisin FRX), Process for the chemical deposition of gold by autocatalytic reduction.
  18. Ott Walter (Graz DEX), Stabilized alkaline gold bath for the electro-less deposition of gold.

이 특허를 인용한 특허 (10)

  1. Virnig Michael J. ; Sierakoski J. Michael, Ammonium thiosulfate complex of gold or silver and an amine.
  2. Chen, Qingyun; Valverde, Charles; Paneccasio, Vincent; Petrov, Nicolai; Stritch, Daniel; Witt, Christian; Hurtubise, Richard, Defectivity and process control of electroless deposition in microelectronics applications.
  3. Kato,Masaru; Senda,Kazutaka, Electroless gold plating solution.
  4. Yomogida, Koichi, Electroless gold plating solution.
  5. Asakawa, Takanobu; Fujinami, Tomoyuki, Electroless gold plating solution and electroless gold plating method.
  6. Michael P. Toben ; James L. Martin ; Yasuo Ohta JP; Yasushi Takizawa JP; Haruki Enomoto JP, Electroless gold plating solution and process.
  7. Iwai, Ryota; Tokuhisa, Tomoaki; Kato, Masaru; Yokoshima, Tokihiko; Aoyagi, Masahiro; Yamaji, Yasuhiro; Kikuchi, Katsuya; Nakagawa, Hiroshi, Electroless gold plating solution for forming fine gold structure, method of forming fine gold structure using same, and fine gold structure formed using same.
  8. Ota Yasuo,JPX ; Takizawa Yasushi,JPX ; Enomoto Haruki,JPX, Non-electrolytic gold plating liquid and non-electrolytic gold plating method using same.
  9. Kanzler, Miriana; Toben, Michael P., Plating composition.
  10. Kolics, Artur, Solutions and methods for metal deposition.
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