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Alignment method 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • G06F-094/55
출원번호 US-0826064 (1997-03-24)
우선권정보 JP-0016116 (1994-02-10)
발명자 / 주소
  • Magome Nobutaka,JPX
  • Mizutani Shinji,JPX
출원인 / 주소
  • Nikon Corporation, JPX
대리인 / 주소
    Pennie & Edmonds LLP
인용정보 피인용 횟수 : 34  인용 특허 : 10

초록

An alignment method for achieving accurate alignment by accurately eliminating an isolated area with a large nonlinear component of an alignment error from sample areas. A conversion parameter is calculated by statistical processing on the basis of a result obtained by measuring the position of each

대표청구항

[ What is claimed is:] [1.] A method of aligning each of a plurality of areas on a substrate to a predetermined position in a coordinate system for defining a moving position of said substrate, comprising:a first step of measuring coordinate positions, on the coordinate system, of N (N is an integer

이 특허에 인용된 특허 (10)

  1. Hamasaki Bunei (Yokohama JPX) Igarashi Hajime (Kawasaki JPX) Nakai Akiya (Tokyo JPX) Ayata Naoki (Machida JPX), Alignment method usable in a step-and-repeat type exposure apparatus for either global or dye-by-dye alignment.
  2. Ormond A. Newman (12030 E. Rivera Rd. Santa Fe Springs CA 90670-2291), Data linearization system.
  3. Iwamoto Yoshichika (Kumagaya JPX) Tateno Hiroki (Kawasaki JPX), Exposure method.
  4. Shimoda Isamu (Zama JPX) Kariya Takao (Hino JPX) Mizusawa Nobutoshi (Yamato JPX) Ozawa Kunitaka (Isehara JPX) Uzawa Shunichi (Nakamachi JPX), Exposure method.
  5. Ota Kazuya (Tokyo JPX) Kawakubo Masaharu (Odawara JPX) Nishi Kenji (Kawasaki JPX), Method for aligning shot areas on a substrate.
  6. Umatate Toshikazu (Kawasaki JPX) Suzuki Hiroyuki (Tokyo JPX), Method for successive alignment of chip patterns on a substrate.
  7. Umatate Toshikazu (Kawasaki JPX), Method of and apparatus for aligning a substrate.
  8. Imai Yuji (Ohmiya JPX) Tanaka Yasuaki (Chigasaki JPX) Wakamoto Shinji (Tokyo JPX), Method of and apparatus for detecting plane position.
  9. Suzuki Hiroyuki (Tokyo JPX) Furukawa Osamu (Tokyo JPX), Projection exposure apparatus.
  10. Wakamoto Shinji (Tokyo JPX) Imai Yuji (Ohmiya JPX) Tanaka Yasuaki (Chigasaki JPX), Surface-position setting apparatus.

이 특허를 인용한 특허 (34)

  1. Hoshi,Tai, Aligning method, exposure method, exposure apparatus, and device manufacturing method.
  2. Kurosawa,Hiroshi, Alignment apparatus, control method therefor, exposure apparatus, device manufacturing method, semiconductor manufacturing factory, and exposure apparatus maintenance method.
  3. Matsumoto,Takahiro, Alignment method and apparatus and exposure apparatus.
  4. Yasuda, Masahiko; Furukawa, Osamu; Kawakubo, Masaharu; Tateno, Hiroki; Magome, Nobutaka, Alignment method and apparatus therefor.
  5. Koji Maeda JP, Alignment method and method for producing device using the alignment method.
  6. Yamamoto,Takeshi, Alignment method, alignment apparatus, exposure apparatus using the same, and device manufactured by using the same.
  7. Yamamoto,Takeshi, Alignment method, alignment apparatus, exposure apparatus using the same, and device manufactured by using the same.
  8. Wagenleitner, Thomas, Apparatus and method for ascertaining orientation errors.
  9. Lee, Dae-Sik; Go, Jeung Sang; Jung, Mun Youn, Apparatus and method for blood analysis.
  10. Morimoto, Osamu, Apparatus and method for measuring at least one of arrangement and shape of shots on substrate, exposure apparatus, and device manufacturing method.
  11. Facchini Angelo,ITX ; Serapiglia Antonio,ITX, Apparatus and method for optimizing integrated circuit fabrication.
  12. Dunn Thomas J. ; Farmiga Nestor O. ; Jain Kanti, Apparatus for projection patterning of large substrates using limited-travel precision x-y stage.
  13. Jeong, Hwan J.; Rabello, Silvio J.; Casavant, Thomas Andre, Dark field diffraction based overlay.
  14. Okamoto, Yosuke; Koike, Takashi, Dose-data generating apparatus.
  15. Koga, Shinichiro, Exposure apparatus.
  16. Koga, Shinichiro, Exposure apparatus.
  17. Morimoto,Osamu, Exposure apparatus, method of controlling same, method of manufacturing devices, computer-readable memory and program.
  18. Kawakubo, Masaharu; Kanaya, Yuho; Nakagawa, Chiaki; Kikuchi, Takahisa; Akizuki, Masahiko, Exposure method and device manufacturing method, exposure apparatus, and program.
  19. Kyoh, Suigen; Higashikawa, Iwao; Inoue, Soichi, Exposure method for making precision patterns on a substrate.
  20. Higashiki Tatsuhiko,JPX ; Asanuma Keita,JPX, Exposure tool and method capable of correcting high (N-TH) order light exposure errors depending upon an interfield coordinate.
  21. Itai, Daisuke, Information processing apparatus, information processing method, and computer program product.
  22. Itai, Daisuke; Kawauchi, Yoshihiro; Ozawa, Kunitaka, Information processing apparatus, information processing method, and memory medium.
  23. Oishi,Satoru; Ina,Hideki; Suzuki,Takehiko; Sentoku,Koichi; Matsumoto,Takahiro, Management system and apparatus, method therefor, and device manufacturing method.
  24. Matsumoto,Takahiro; Ina,Hideki; Suzuki,Takehiko; Sentoku,Koichi; Oishi,Satoru, Management system, apparatus, and method, exposure apparatus, and control method therefor.
  25. Suzuki,Takehiko; Ina,Hideki; Sentoku,Koichi; Matsumoto,Takahiro; Oishi,Satoru, Management system, management apparatus, management method, and device manufacturing method.
  26. Endo, Masatoshi; Morooka, Takanori, Measuring apparatus, measuring method, lithography apparatus, and article manufacturing method.
  27. Yamaguchi Akira,JPX, Method of placing marks for alignment accuracy measurement.
  28. Sullivan,Jeffrey S., Method of registering a blank substrate to a pattern generating particle beam apparatus and of correcting alignment during pattern generation.
  29. Gui,Cheng Qun, Optical position assessment apparatus and method.
  30. Chien, Chen-Fu; Chang, Kuo-Hao; Chen, Chih-Ping; Lin, Shun-Li, Overlay error model, sampling strategy and associated equipment for implementation.
  31. Nakajima, Eriko, Pattern drawing apparatus and pattern drawing method.
  32. Chung, Woong Jae, Photolithography systems and associated alignment correction methods.
  33. Yoshida, Kouji, Position detection method and position detector, exposure method and exposure apparatus, and device and device manufacturing method.
  34. Pike, Alger C., Semiconductor substrate processing method and apparatus.
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