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Alignment method

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • G01B-011/26
출원번호 US-0704363 (1996-08-29)
우선권정보 JP-0141913 (1993-06-14)
발명자 / 주소
  • Irie Nobuyuki,JPX
  • Hirukawa Shigeru,JPX
출원인 / 주소
  • Nikon Corporation, JPX
대리인 / 주소
    Shapiro and Shapiro
인용정보 피인용 횟수 : 33  인용 특허 : 0

초록

A substrate has a plurality of areas, from which several specific areas are selected. The coordinate positions of the specific areas on a static coordinate system are measured and the coordinate positions of the specific areas on the static coordinate system are calculated by the statistic calculati

대표청구항

[ What is claimed is:] [1.] A method of aligning each of a plurality of areas on a substrate and a predetermined position in a static coordinate system for defining a moving position of said substrate, comprising:the first step of selecting several areas from said plurality of areas as specific area

이 특허를 인용한 특허 (33)

  1. Yasuda Masahiko,JPX ; Furukawa Osamu,JPX ; Kawakubo Masaharu,JPX ; Tateno Hiroki,JPX ; Magome Nobutaka,JPX, Alignment method and apparatus therefor.
  2. Yasuda, Masahiko; Furukawa, Osamu; Kawakubo, Masaharu; Tateno, Hiroki; Magome, Nobutaka, Alignment method and apparatus therefor.
  3. Navarro Y Koren, Ramon; Simons, Hubertus Johannes Gertrudus; Jeunink, Andre Bernardus, Alignment system and methods for lithographic systems using at least two wavelengths.
  4. Dohse, Hans, Alignment system for various materials and material flows.
  5. Van Bilsen, Franciscus Bernardus Maria; Burghoorn, Jacobus; Van Haren, Richard Johannes Franciscus; Hinnen, Paul Christiaan; Van Horssen, Hermanus Gerardus; Huijbregtse, Jeroen; Jeunink, Andre Bernardus; Megens, Henry; Koren, Ramon Navarro Y; Tolsma, Hoite Pieter Theodoor; Simons, Hubertus Johannes Gertrudus; Schuurhuis, Johny Rutger; Schets, Sicco Ian; Lee, Brian Young Bok; Dunbar, Allan Reuben, Alignment systems and methods for lithographic systems.
  6. Van Bilsen, Franciscus Bernardus Maria; Burghoorn, Jacobus; Van Haren, Richard Johannes Franciscus; Hinnen, Paul Christiaan; Van Horssen, Hermanus Gerardus; Huijbregtse, Jeroen; Jeunink, Andre Bernardus; Megens, Henry; Koren, Ramon Navarro Y; Tolsma, Hoite Pieter Theodoor; Simons, Hubertus Johannes Gertrudus; Schuurhuis, Johny Rutger; Schets, Sicco Ian; Lee, Brian Young Bok; Dunbar, Allan Reuben, Alignment systems and methods for lithographic systems.
  7. Van Bilsen,Franciscus Bernardus Maria; Burghoorn,Jacobus; Van Haren,Richard Johannes Franciscus; Hinnen,Paul Christiaan; Van Horssen,Hermanus Gerardus; Huijbregtse,Jeroen; Jeunink,Andre Bernardus; Megens,Henry; Koren,Ramon Navarro Y; Tolsma,Hoite Pieter Theodoor; Simons,Hubertus Johannes Gertrudus; Schuurhuis,Johny Rutger; Schets,Sicco Ian; Lee,Brian Young Bok; Dunbar,Allan Reuben, Alignment systems and methods for lithographic systems.
  8. Van Bilsen,Franciscus Bernardus Maria; Burghoorn,Jacobus; Van Haren,Richard Johannes Franciscus; Hinnen,Paul Christiaan; Van Horssen,Hermanus Gerardus; Huijbregtse,Jeroen; Jeunink,Andre Bernardus; Megens,Henry; Koren,Ramon Navarro Y; Tolsma,Hoite Pieter Theodoor; Simons,Hubertus Johannes Gertrudus; Schuurhuis,Johny Rutger; Schets,Sicco Ian; Lee,Brian Young Bok; Dunbar,Allan Reuben, Alignment systems and methods for lithographic systems.
  9. Van Bilsen,Franciscus Bernardus Maria; Burghoorn,Jacobus; Van Haren,Richard Johannes Franciscus; Hinnen,Paul Christiaan; Van Horssen,Hermanus Gerardus; Huijbregtse,Jeroen; Jeunink,Andre Bernardus; Megens,Henry; Koren,Ramon Navarro Y; Tolsma,Hoite Pieter Theodoor; Simons,Hubertus Johannes Gertrudus; Schuurhuis,Johny Rutger; Schets,Sicco Ian; Lee,Brian Young Bok; Dunbar,Allan Reuben, Alignment systems and methods for lithographic systems.
  10. Van Bilsen,Franciscus Bernardus Maria; Burghoorn,Jacobus; Van Haren,Richard Johannes Franciscus; Hinnen,Paul Christiaan; Van Horssen,Hermanus Gerardus; Huijbregtse,Jeroen; Jeunink,Andre Bernardus; Megens,Henry; Navarro Y Koren,Ramon; Tolsma,Hoite Pieter Theodoor; Simons,Hubertus Johannes Gertrudus; Schuurhuis,Johny Rutger; Schets,Sicco Ian; Lee,Brian Young Bok; Dunbar,Allan Reuben, Alignment systems and methods for lithographic systems.
  11. Den Boef,Arie Jeffrey; Bornebroek,Frank; Cramer,Hugo Augustinus Joseph; Dusa,Mircea; Van Haren,Richard Johannes Franciscus; Kiers,Antoine Gaston Marie; Kreuzer,Justin Lloyd; Van Der Schaar,Maurits; V, Device inspection method and apparatus using an asymmetric marker.
  12. Yamada, Ryo; Yasaka, Satoru, Displacement calculation method, drawing data correction method, substrate manufacturing method, and drawing apparatus.
  13. Egashira, Shinichi, Exposure apparatus and device manufacturing method.
  14. Kaneko, Kenichirou, Exposure apparatus and exposure method.
  15. Sasaki, Ryo, Exposure apparatus, exposure method, and device manufacturing method.
  16. Kawakubo, Masaharu; Kanaya, Yuho; Nakagawa, Chiaki; Kikuchi, Takahisa; Akizuki, Masahiko, Exposure method and device manufacturing method, exposure apparatus, and program.
  17. Higashiki Tatsuhiko,JPX ; Asanuma Keita,JPX, Exposure tool and method capable of correcting high (N-TH) order light exposure errors depending upon an interfield coordinate.
  18. Sajan Marokkey Raphael,SGX ; Cheng Alex (Tsun-Lung),SGX, Hybrid alignment marks for optimal alignment of three-dimensional layers.
  19. Fujimoto, Masashi, Image processing alignment method and method of manufacturing semiconductor device.
  20. Fujimoto,Masashi, Image processing alignment method and method of manufacturing semiconductor device.
  21. Van Bilsen, Franciscus Bernardus Maria, Lithographic apparatus with multiple alignment arrangements and alignment measuring method.
  22. Van Bilsen, Franciscus Bernardus Maria, Lithographic apparatus with multiple alignment arrangements and alignment measuring method.
  23. Van Bilsen, Franciscus Bernardus Maria, Lithographic apparatus with multiple alignment arrangements and alignment measuring method.
  24. Bornebroek Frank,NLX, Lithographic projection apparatus with an alignment system for aligning substrate on mask.
  25. Van Haren, Richard Johannes Franciscus; Hinnen, Paul Christiaan; Lalbahadoersing, Sanjay; Megens, Henry; Van Der Schaar, Maurits, Marker structure for optical alignment of a substrate, a substrate including such a marker structure, an alignment method for aligning to such a marker structure, and a lithographic projection apparatus.
  26. Van Haren,Richard Johannes Franciscus; Hinnen,Paul Christiaan; Lalbahadoersing,Sanjay; Megens,Henry; Van Der Schaar,Maurits, Marker structure for optical alignment of a substrate, a substrate including such a marker structure, an alignment method for aligning to such a marker structure, and a lithographic projection apparatus.
  27. Chung, Woong Jae, Photolithography systems and associated alignment correction methods.
  28. Matsumoto,Takahiro; Ina,Hideki, Position detecting method and apparatus.
  29. Hayashi,Nozomu, Position measurement technique.
  30. Pike, Alger C., Semiconductor substrate processing method and apparatus.
  31. Han-Ming Sheng TW, System to position defect location on production wafers.
  32. Yoshikiyo Yui JP; Masato Muraki JP, Transfer apparatus and transfer method.
  33. Nguyen,Phong T.; Hill,Stephen L.; Orlova,Nadja, Wafer stage position calibration method and system.
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