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Control mechanisms for dosimetry control in ion implantation systems 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • H01J-037/30
출원번호 US-0757726 (1996-11-26)
발명자 / 주소
  • Blake Julian G.
  • Sferlazzo Piero
  • Rose Peter H.
  • Brailove Adam A.
출원인 / 주소
  • Eaton Corporation
대리인 / 주소
    Engellenner
인용정보 피인용 횟수 : 25  인용 특허 : 30

초록

A high throughput ion implantation system that rapidly and efficiently processes large quantities of flat panel displays. The ion implantation system has an ion source, an electrode assembly, a platform mounting a workpiece, and a ion beam measuring structure. The ion source in conjunction with the

대표청구항

[ Having described the invention, what is claimed as new and desired to be secured by letters patent is:] [1.] An apparatus for treating a workpiece by directing an ion beam at the workpiece, the apparatus comprisingan ion source for producing the ion beam extending along a beam path,an electrode as

이 특허에 인용된 특허 (30)

  1. Dykstra Jerald P. (Austin TX) Bellamy Brad L. (Austin TX), Atomic mass measurement system.
  2. Uehara, Akira; Hijikata, Isamu; Nakane, Hisashi; Nakayama, Muneo, Automatic plasma processing device and heat treatment device.
  3. Shibata Atsushi (Katsuta JPX) Ueno Yukichi (Katsuta JPX), Beam scanning control device for ion implantation system.
  4. Shiraiwa Hirotsugu (Hino JPX), Conveyor apparatus.
  5. Freytsis Avrum (Swampscott MA) Hertel Richard J. (Boxford MA) Mears Eric L. (Rockport MA), Disk scanning apparatus for batch ion implanters.
  6. Farley Marvin (Ipswich MA), Dose control apparatus.
  7. Farley, Marvin, Dose control method.
  8. Brune Robert A. (Austin TX) Smith Dorsey T. (Austin TX) Ray Andrew M. (Austin TX), End station for a parallel beam ion implanter.
  9. Brubaker Stephen R. (Austin TX), Fluid flow control method and apparatus for an ion implanter.
  10. Yoshinouchi Atsushi (Kashiba JPX) Morita Tatsuo (Kyoto JPX) Tsuchimoto Shuhei (Nara JPX), Ion implantation apparatus.
  11. Gault Roger B. (Austin TX) Keutzer Larry L. (Austin TX), Ion implantation control system.
  12. Robinson William P. (Newberry Park CA) Seliger Robert L. (Agoura CA), Ion implantation system.
  13. Robinson William P. (Newbury Park CA) Seliger Robert L. (Agoura CA), Ion implantation system.
  14. Turner Norman L. (Gloucester MA), Ion implantation with variable implant angle.
  15. Wittkower Andrew B. (Rockport MA) Ryding Geoffrey (Manchester MA), Isolation lock for workpieces.
  16. Tokoro Nobuhiro (West Newbury MA), Method of monitoring ion beam current in ion implantation apparatus for use in manufacturing semiconductors.
  17. Koch George R. (Los Altos CA) Petersen ; III Carl T. (Fremont CA), Modular loadlock.
  18. Stark Lawrence R. (San Jose CA) Turner Frederick (Sunnyvale CA), Modular wafer transport and processing system.
  19. Usami Yasutsugu (Katsuta JPX), Process and apparatus for transferring an object and for processing semiconductor wafers.
  20. Davis Cecil J. (Greenville TX) Freeman Dean W. (Garland TX) Matthews Robert T. (Plano TX) Tomlin Joel T. (Garland TX) Jucha Rhett B. (Celeste TX), Processing apparatus and method.
  21. Rose Peter H. (N. Conway NH), Producing ion beams suitable for ion implantation and improved ion implantation apparatus and techniques.
  22. O\Connor John P. (Andover MA) Smith John W. (Newburyport MA), Scan technique to reduce transient wafer temperatures during ion implantation.
  23. Sugiyama Toshiaki (Tokyo JPX), Scanning control system involved in an ion-implantation apparatus.
  24. Ryding Geoffrey (Manchester MA), Treating workpieces with beams.
  25. Ryding Geoffrey (Manchester MA), Vacuum chamber for treating workpieces with beams.
  26. Purser, Kenneth H., Wafer holding apparatus for ion implantation.
  27. Ryding Geoffrey (Manchester MA), Wafer loading apparatus for beam treatment.
  28. Layman Frederick P. (Fremont CA) Huntley David A. (Mountain View CA) Dick Paul H. (San Jose CA) Coad George L. (Lafayette CA) Kuhlman Michael J. (Fremont CA) Vecta Roger M. (San Jose CA) Hobson Phill, Wafer processing system.
  29. Lee Steven N. (Irvine CA) Kim Jae Y. (Irvine CA), Wafer transfer apparatus.
  30. Hertel Richard J. (Bradford MA) Delforge Adrian C. (Rockport MA) Mears Eric L. (Rockport MA) MacIntosh Edward D. (Gloucester MA) Jennings Robert E. (Nethuen MA) Bhargava Akhil (Reading MA), Wafer transfer system.

이 특허를 인용한 특허 (25)

  1. Gammel, George M.; Evans, Morgan D.; Todorov, Stanislav S.; Hussey, Norman E.; Gibilaro, Gregory R., Apparatus and method for controlling implant process.
  2. Angel,Gordon C.; MacIntosh,Edward D.; Schaefer,Thomas A., Apparatus and methods for two-dimensional ion beam profiling.
  3. Bassom, Neil J.; Klos, Leo V.; Olson, Joseph C., Apparatus and system for controlling ion ribbon beam uniformity in an ion implanter.
  4. Blake, Julian G.; Murphy, Paul J., Cooled cleaving implant.
  5. Reece, Ronald N.; Satoh, Shu; Kondratenko, Serguei; Ray, Andy, Implant-induced damage control in ion implantation.
  6. Ryding,Geoffrey; Sakase,Takao; Farley,Marvin; Smick,Theodore, Ion beam diagnostics.
  7. Chang,Shengwu; Cucchetti,Antonella; Dzengeleski,Joseph P.; Gibilaro,Gregory R.; Mollica,Rosario; Norris,Gregg A.; Olson,Joseph C.; Welsch,Marie J., Ion beam implant current, spot width and position tuning.
  8. Renau,Anthony; Olson,Joseph C.; Hermanson,Eric; Angel,Gordon C., Ion beam neutral detection.
  9. Benveniste,Victor M.; Kellerman,Peter L.; DiVergilio,William F., Ion beam scanning control methods and systems for ion implantation uniformity.
  10. Kariya, Hiroyuki; Ishikawa, Masaki; Inda, Yoshiaki; Kurose, Takeshi; Yagita, Takanori; Yumiyama, Toshio, Ion implantation apparatus and control method thereof.
  11. Yasuda,Satoshi, Ion implanter and ion implantation control method thereof.
  12. Wan, Zhimin; Shen, Cheng-Hui; Jen, Ko-Chuan, Ion implanter and method for implanting a wafer.
  13. Parrill, Thomas; Agarwal, Aditya, Ion implanter for noncircular wafers.
  14. Parrill, Thomas; Agarwal, Aditya, Ion implanter for photovoltaic cell fabrication.
  15. Iwasawa,Koji; Nagai,Nobuo, Ion implanting method and apparatus.
  16. Richards, Steven; Ryding, Geoffrey; Smick, Theodore, Isolation circuit for transmitting AC power to a high-voltage region.
  17. Olson, Joseph C.; Smatlak, Donna L.; Daniel, Paul, Method and apparatus for determining beam parallelism and direction.
  18. Tse, Tom; Zhao, Zhiyong; Hendrix, David M., Method and system for dose control during an ion implantation process.
  19. Ye, John Zheng; Benveniste, Victor M.; Cristoforo, Michael Paul, Method and system for ion beam containment in an ion beam guide.
  20. Wenzel, Kevin W.; Vanderberg, Bo H., Method and system for ion beam containment using photoelectrons in an ion beam guide.
  21. Steeples,Kenneth, Methods for integrated implant monitoring.
  22. Benveniste, Victor M., Multichannel ion gun.
  23. Kienlen, Gabriel, Positioning device for positioning an aperture plate in an ion beam.
  24. Bo H. Vanderberg, Power supply hardening for ion beam systems.
  25. Benveniste, Victor M.; Ye, John; DiVergilio, William F., Waveguide for microwave excitation of plasma in an ion beam guide.
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