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Fluid cooled trap 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • B01D-053/26
출원번호 US-0599622 (1996-02-09)
발명자 / 주소
  • Gu Youfan
  • Hauschultz Dana S.
출원인 / 주소
  • MKS Instruments, Inc.
대리인 / 주소
    Allison
인용정보 피인용 횟수 : 63  인용 특허 : 11

초록

The liquid cooled trap for effectively and efficiently collecting condensable vapor in a chemical vapor reaction system includes two stages. The first stage includes an entrance area to the trap that is purposely designed to be large in space and a very poor heat exchanger in order to avoid condensa

대표청구항

[ The embodiments of the invention in which an exclusive property or privilege is claimed are defined as follows:] [1.] In a trap for deposition of a material in a gas stream, said trap having an entrance for said gas stream and an exit for said gas stream wherein said gas enters said trap through s

이 특허에 인용된 특허 (11)

  1. Max John K. (1420 Healdsburg Ave. Healdsburg CA 95448), Cold trap.
  2. Obuchi Akira (Tsukuba JPX) Yoshiyama Hidenori (Tsukuba JPX) Ohi Akihiko (Tsukuba JPX) Aoyama Hyogoro (Tsukuba JPX) Ohuchi Hideo (Tsukuba JPX) Ogata Atsushi (Tsukuba JPX) Mizuno Koichi (Ibaraki JPX) M, Exhaust gas cleaner.
  3. Stoltenberg Kevin J. (8090 - 205th St. East Hastings MN 55033), Method and apparatus for improving the yield of integrated circuit devices.
  4. Karger Robert (Dortmund DEX) Dungs Horst (Herne DEX), Method for cooling and separating chlorides and fluorides from ammoniacal gas.
  5. Young Walter L. (Tulsa OK) Douglas C. J. (Tulsa OK) Connally Carl A. (Tulsa OK) Cheek Robert L. (Tulsa OK), Multi-stage processing and concentration of solutions.
  6. Parry Robert W. (Salt Lake City UT) Baumann John A. (Ossining NY) Schachter Rozalie (Flushing NY), Pnictide trap for vacuum systems.
  7. Gordon Joseph (Morris Township ; Morris County NJ) Sukornick Bernard (Elizabeth NJ), Process for synthesis of chlorodifluoroamine.
  8. Yamaguchi Katsunobu (Yokohama JPX) Kurihara Tateo (Yokohama JPX) Yanai Isamu (Yokosuka JPX) Kikuchi Kazuo (Yokosuka JPX) Saito Tomoo (Yokohama JPX) Hamanaka Suguru (Yokohama JPX) Nagai Teruo (Chigasa, Shell-and-tube apparatus having an intermediate tube plate.
  9. Miyagi Katsushin (Sagamihara JPX) Yokokawa Osamu (Kanagawa JPX) Okada Yoshitaka (Sagamihara JPX) Nagasaki Ichiro (Yokohama JPX) Hashimoto Akira (Yokohama JPX), Trap device for vapor phase reaction apparatus.
  10. Gutlhuber Friedrich (Metten DEX), Tubular reactor and method.
  11. Kumada Masatoshi (Kawasaki JPX) Nakagawa Koichi (Kawasaki JPX), Vacuum extraction system for chemical vapor deposition reactor vessel and trapping device incorporated therein.

이 특허를 인용한 특허 (63)

  1. Arena, Chantal; Werkhoven, Christiaan, Abatement of reaction gases from gallium nitride deposition.
  2. Arena, Chantal; Werkhoven, Christiaan, Abatement of reaction gases from gallium nitride deposition.
  3. Gealy, Dan; Weimer, Ronald A., Ampoules for producing a reaction gas and systems for depositing materials onto microfeature workpieces in reaction chambers.
  4. Carpenter,Craig M.; Mardian,Allen P.; Dando,Ross S.; Tschepen,Kimberly R.; Derderian,Garo J., Apparatus and method for depositing materials onto microelectronic workpieces.
  5. Gu Youfan, Apparatus and method for removing condensable aluminum vapor from aluminum etch effluent.
  6. Mardian, Allen P.; Rodriguez, Santiago R., Apparatus and methods for manufacturing microfeatures on workpieces using plasma vapor processes.
  7. Derderian,Garo J., Apparatus and methods for plasma vapor deposition processes.
  8. Carpenter,Craig M.; Dando,Ross S.; Mardian,Allen P., Apparatus for controlling gas pulsing in processes for depositing materials onto micro-device workpieces.
  9. Paul Dozoretz ; Youfan Gu, Apparatus for controlling polymerized teos build-up in vacuum pump lines.
  10. Dando, Ross S.; Carpenter, Craig M.; Campbell, Philip H.; Mardian, Allen P., Chemical vapor deposition apparatus.
  11. Dando,Ross S.; Carpenter,Craig M.; Campbell,Philip H.; Mardian,Allen P., Chemical vapor deposition apparatus.
  12. Dando, Ross S.; Campbell, Philip H.; Carpenter, Craig M.; Mardian, Allen P., Chemical vapor deposition methods.
  13. Sajoto Talex ; Zhao Jun ; Ku Vincent ; Dornfest Charles, Cold trap.
  14. Umotoy, Salvador P.; Lei, Lawrence Chung-Lai; Ellwanger, Russell C.; Rose, Ronald L.; Huston, Joel; Chen, James Jin-Long, Cold trap assembly.
  15. Lin, Leon; Fan, Tom; Chen, Steven; Lee, Vito; Wu, Yu-Hsiang, Cold trap for CVD furnace.
  16. Tojo, Yukio; Noro, Naotaka; Fujita, Yoshiyuki; Ito, Yuji, Collecting unit for semiconductor process.
  17. Arena, Chantal; Werkhoven, Christiaan, Equipment for high volume manufacture of group III-V semiconductor materials.
  18. Arena, Chantal; Werkhoven, Christiaan, Gallium trichloride injection scheme.
  19. Arena, Chantal; Werkhoven, Christiaan, Gallium trichloride injection scheme.
  20. Arena, Chantal; Werkhoven, Christiaan, Gallium trichloride injection scheme.
  21. Arena, Chantal; Bertram, Jr., Ronald Thomas; Lindow, Ed; Werkhoven, Christiaan, Gas injectors including a funnel- or wedge-shaped channel for chemical vapor deposition (CVD) systems and CVD systems with the same.
  22. Xia,Li Qun; Xu,Huiwen; Witty,Derek R.; M'Saad,Hichem, In-situ oxide capping after CVD low k deposition.
  23. Dozoretz Paul ; Gu Youfan, Method and apparatus for controlling polymerized teos build-up in vacuum pump lines.
  24. Shinoda, Setsuji; Nakazawa, Toshiharu; Noji, Nobuharu; Aiyoshizawa, Shunichi, Method and apparatus for forming required gas atmosphere.
  25. Gu,Youfan, Method and apparatus for preventing products of TiCLand NHor other feed gas reactions from damaging vacuum pumps in TiN or other deposition systems.
  26. Sauer,Richard A., Method and apparatus for removing waxy materials from a gas stream.
  27. Titmas, James A., Method and apparatus for treating air emissions and recovering products therefrom.
  28. Gu, Youfan, Method for removing condensable aluminum chloride vapor from aluminum etch effluent.
  29. Zheng,Lingyi A.; Doan,Trung T.; Breiner,Lyle D.; Ping,Er Xuan; Beaman,Kevin L.; Weimer,Ronald A.; Kubista,David J.; Basceri,Cem, Methods and apparatus for processing microfeature workpieces, e.g., for depositing materials on microfeature workpieces.
  30. Beaman,Kevin L.; Weimer,Ronald A.; Breiner,Lyle D.; Ping,Er Xuan; Doan,Trung T.; Basceri,Cem; Kubista,David J.; Zheng,Lingyi A., Methods and apparatus for processing microfeature workpieces; methods for conditioning ALD reaction chambers.
  31. Beaman, Kevin L.; Doan, Trung T.; Breiner, Lyle D.; Weimer, Ronald A.; Ping, Er-Xuan; Kubista, David J.; Basceri, Cem; Zheng, Lingyi A., Methods and systems for controlling temperature during microfeature workpiece processing, E.G. CVD deposition.
  32. Beaman, Kevin L.; Doan, Trung T.; Breiner, Lyle D.; Weimer, Ronald A.; Ping, Er-Xuan; Kubista, David J.; Basceri, Cem; Zheng, Lingyi A., Methods and systems for controlling temperature during microfeature workpiece processing, E.G., CVD deposition.
  33. Beaman,Kevin L.; Doan,Trung T.; Breiner,Lyle D.; Weimer,Ronald A.; Ping,Er Xuan; Kubista,David J.; Basceri,Cem; Zheng,Lingyi A., Methods and systems for controlling temperature during microfeature workpiece processing, e.g., CVD deposition.
  34. Carpenter,Craig M.; Dynka,Danny, Methods for controlling mass flow rates and pressures in passageways coupled to reaction chambers and systems for depositing material onto microfeature workpieces in reaction chambers.
  35. Dando, Ross S.; Gealy, Dan, Methods for depositing material onto microfeature workpieces in reaction chambers and systems for depositing materials onto microfeature workpieces.
  36. Dando, Ross S.; Gealy, Dan, Methods for depositing material onto microfeature workpieces in reaction chambers and systems for depositing materials onto microfeature workpieces.
  37. Zheng, Lingyi A.; Doan, Trung T.; Breiner, Lyle D.; Ping, Er-Xuan; Beaman, Kevin L.; Weimer, Ronald A.; Basceri, Cem; Kubista, David J., Methods for forming small-scale capacitor structures.
  38. Arena, Chantal; Werkhoven, Christiaan, Methods for high volume manufacture of group III-V semiconductor materials.
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  40. Basceri,Cem; Doan,Trung T.; Weimer,Ronald A.; Beaman,Kevin L.; Breiner,Lyle D.; Zheng,Lingyi A.; Ping,Er Xuan; Sarigiannis,Demetrius; Kubista,David J., Microfeature workpiece processing apparatus and methods for controlling deposition of materials on microfeature workpieces.
  41. Basceri,Cem; Doan,Trung T.; Weimer,Ronald A.; Beaman,Kevin L.; Breiner,Lyle D.; Zheng,Lingyi A.; Ping,Er Xuan; Sarigiannis,Demetrius; Kubista,David J., Microfeature workpiece processing apparatus and methods for controlling deposition of materials on microfeature workpieces.
  42. Mardian,Allen P.; Campbell,Philip H., Process byproduct trap and system including same.
  43. Mardian,Allen P.; Campbell,Philip H., Process byproduct trap, methods of use, and system including same.
  44. Carpenter, Craig M.; Dando, Ross S.; Dynka, Danny, Reactors with isolated gas connectors and methods for depositing materials onto micro-device workpieces.
  45. Carpenter,Craig M.; Dando,Ross S.; Dynka,Danny, Reactors with isolated gas connectors and methods for depositing materials onto micro-device workpieces.
  46. Dando, Ross S., Reactors with isolated gas connectors and methods for depositing materials onto micro-device workpieces.
  47. Miller, Matthew W.; Basceri, Cem, Reactors, systems and methods for depositing thin films onto microfeature workpieces.
  48. Taniyama, Tomoshi; Takashima, Yoshikazu; Ohno, Mikio, Semiconductor device manufacturing apparatus and manufacturing method of semiconductor device.
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  50. Fairbourn,David C., Simple chemical vapor deposition system and methods for depositing multiple-metal aluminide coatings.
  51. Fairbourn, David C., Simple chemical vapor deposition systems for depositing multiple-metal aluminide coatings.
  52. Lakshmanan,Annamalai; Raj,Daemian; Schmitt,Francimar; Kim,Bok Hoen; Balasubramanian,Ganesh, Situ oxide cap layer development.
  53. Raj N. Master ; Mohammad Zubair Khan ; Maria Guardado ; Sp Lee MY; Sofi Mohd MY, Solder reflow furnace with flux effluent collector and method of preventing flux contamination.
  54. Sarigiannis,Demetrius; Meng,Shuang; Derderian,Garo J., Systems and methods for depositing material onto microfeature workpieces in reaction chambers.
  55. Kubista, David J.; Doan, Trung T.; Breiner, Lyle D.; Weimer, Ronald A.; Beaman, Kevin L.; Ping, Er-Xuan; Zheng, Lingyi A.; Basceri, Cem, Systems for depositing material onto workpieces in reaction chambers and methods for removing byproducts from reaction chambers.
  56. Sajoto, Talex; Dornfest, Charles; Selyutin, Leonid; Zhao, Jun; Ku, Vincent; Jin, Xiao Liang, Temperature controlled gas feedthrough.
  57. Arena, Chantal; Werkhoven, Christiaan, Temperature-controlled purge gate valve for chemical vapor deposition chamber.
  58. Arena, Chantal; Werkhoven, Christiaan, Temperature-controlled purge gate valve for chemical vapor deposition chamber.
  59. Youfan Gu, Trap apparatus and method for condensable by-products of deposition reactions.
  60. Hara, Masamichi; Yamamoto, Kaoru; Mizusawa, Yasushi, Trap assembly in film forming apparatus.
  61. Engerran, David, Trap device.
  62. Shaw, Christopher John; Huntley, Graeme; Seeley, Andrew James, Trap device.
  63. Somekh Sasson ; Zhao Jun ; Dornfest Charles ; Sajoto Talex ; Selyutin Leonid ; Ku Vincent ; Wang Chris ; Chang Frank ; Tang Po, Vaporization and deposition apparatus.
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