초록 ▼

A high throughput ion implantation system that rapidly and efficiently processes large quantities of flat panel displays. The ion implantation system has an ion chamber generating a stream of ions, a plasma electrode having an elongated slot with a high aspect ratio for shaping the stream of ions in

A high throughput ion implantation system that rapidly and efficiently processes large quantities of flat panel displays. The ion implantation system has an ion chamber generating a stream of ions, a plasma electrode having an elongated slot with a high aspect ratio for shaping the stream of ions into a ribbon beam, and an electrode assembly for directing the stream of ions towards a workpiece. The plasma electrode can include a split extraction system having a plurality of elongated slots oriented substantially parallel to each other. The ion implantation system can also have a diffusing system for homogenizing the ion stream. Various exemplary diffusing systems include an apertured plate having an array of openings, diffusing magnets, diffusing electrodes, and dithering magnets.

대표청구항 ▼

[ Having described the invention, what is claimed as new and desired to be secured by Letters Patent is:] [1.] A ribbon beam generating ion implantation apparatus for treating a workpiece, the apparatus comprising:an ion chamber for containing a plasma formed of ionized matter, the chamber having an

[ Having described the invention, what is claimed as new and desired to be secured by Letters Patent is:] [1.] A ribbon beam generating ion implantation apparatus for treating a workpiece, the apparatus comprising:an ion chamber for containing a plasma formed of ionized matter, the chamber having an opening,a plasma electrode adapted for engaging the opening in the chamber and for shaping a stream of ions exiting the chamber, the plasma electrode having an elongated slot,a diffuser that homogenizes the path of the stream of ions exiting the chamber such that a diffused ion stream is formed, the diffused ion stream having a substantially uniform current density along at least one axis, andan electrode assembly for directing the diffused ion stream to treat the workpiece,wherein the diffused ion stream treating the workpiece is in the shape of a ribbon beam.