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Liquid vaporizer system and method 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • C23C-014/26
출원번호 US-0890041 (1997-07-09)
발명자 / 주소
  • Li Ting Kai
  • Scott Dane C.
출원인 / 주소
  • Emcore Corporation
대리인 / 주소
    Lerner, David, Littenberg, Krumholz & Mentlik
인용정보 피인용 횟수 : 51  인용 특허 : 19

초록

A liquid vaporizer apparatus and method for chemical vapor deposition of liquid solutions into a controlled atmosphere of a CVD reaction chamber. The apparatus comprises an atomizer, gas curtain, heated porous media disks and a carrier gas mixer. The invention provides for the independent control of

대표청구항

[ What is claimed is:] [1.] A modular liquid vaporizing apparatus comprising a housing including at least one liquid precursor supply inlet and at least one vapor outlet, a removable ultrasonic module sized for removable insertion and replacement in said housing at a location with respect to said at

이 특허에 인용된 특허 (19)

  1. Gardiner Robin A. (Bethel CT) Van Buskirk Peter (Newtown CT) Kirlin Peter S. (Bethel CT), Apparatus and method for delivering reagents in vapor form to a CVD reactor, incorporating a cleaning subsystem.
  2. Arnold Manfred (Aschaffenburg DEX) Gegenwart Rainer (Rdermark DEX) Noll Sonja (Frankfurt DEX) Ritter Jochen (Laubach DEX) Stoll Helmut (Sulzbach DEX), Apparatus for the evaporation of liquids.
  3. Tsubouchi Kazuo (30-38 ; Hitokita 2-chome Taihaku-Ku ; Sendai-shi ; Miyagi-ken JPX) Masu Kazuya (3-3-201 ; Mikamine 1-chome Taihaku-Ku ; Sendai-shi ; Miyagi-ken JPX), Apparatus for vaporizing liquid raw material and apparatus for forming thin film.
  4. Hayakawa Yukihiro (Atsugi JPX) Kawasumi Yasushi (Fujisawa JPX) Makino Kenji (Yokohama JPX) Kataoka Yuzo (Atsugi JPX), Chemical vapor deposition method and apparatus making use of liquid starting material.
  5. Asaba Tetsuo (Odawara JPX) Makino Kenji (Yokohama JPX), Chemical vapor deposition method for forming a deposited film with the use of a liquid raw material and apparatus suitab.
  6. Swiatosz Edmund (Maitland FL), Electrically heated non-toxic smoke generator.
  7. Vukelic Michael (Felton CA), Fluid dispersion head for CVD appratus.
  8. Berger Harvey L. (Poughkeepsie NY), High volume ultrasonic liquid atomizer.
  9. Bartholomew Lawrence D. (Santa Cruz County CA) Provancha Kenneth M. (Santa Cruz County CA) Kamian George (Santa Cruz County CA) DeDontney Jay B. (Santa Cruz County CA) McDaniel Gregory M. (Santa Cruz, Injector and method for delivering gaseous chemicals to a surface.
  10. Stauffer Craig M. (3066 Scott Blvd. Santa Clara CA 95054), Integrated delivery system for chemical vapor from non-gaseous sources for semiconductor proccessing.
  11. Ewing James H. (Lexington MA), Liquid pump and vaporizer.
  12. Ono Hirofumi (Shiga JPX), Liquid vaporizer/feeder.
  13. Versteeg Vera A. (Rochester NY) Avedisian C. Thomas (Ithaca NY) Raj Rishi (Ithaca NY), Method and apparatus for CVD using liquid delivery system with an ultrasonic nozzle.
  14. Kirlin Peter S. (Brookfield) Binder Robin L. (Bethlehem) Gardiner Robin A. (Bethel CT), Method for delivering an involatile reagent in vapor form to a CVD reactor.
  15. Fukui Keitaro (Kamakura JPX) Nakamura Osamu (Tokyo JPX) Okayama Yasushi (Tokyo JPX) Tsunoda Atsushi (Kamifukuoka JPX), Method for forming oxide superconducting films with an ultrasonic wave sprayer.
  16. Conti Richard A. (Mt. Kisco NY) Kotecki David E. (Hopewell Junction NY) Wilson Donald L. (New Windsor NY) Wong Justin W. (South Burlington VT) Zuhoski Steven P. (Rowlett TX), Removable gas injectors for use in chemical vapor deposition of aluminium oxide.
  17. Ohmori Toshiaki (Itami JPX) Fukumoto Takaaki (Itami JPX), Semiconductor manufacturing apparatus.
  18. Berger, Harvey L.; Ericson, A. Earle; Levine, Carl, Ultrasonic liquid atomizer, particularly for high volume flow rates.
  19. Wang Christine A. (Bedford MA) Brown Robert A. (Winchester MA) Caunt James W. (Concord MA), Vapor phase reactor for making multilayer structures.

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  2. Teff, Daniel J.; Chagolla, John L., Additives to prevent degradation of cyclic alkene derivatives.
  3. Teff, Daniel J.; Chagolla, John L., Additives to prevent degradation of cyclic alkene derivatives.
  4. Teff, Daniel J.; Chagolla, John L., Additives to prevent degradation of cyclic alkene derivatives.
  5. Hillman, Joseph T.; Yasar, Tugrul; Kubo, Kenichi; Vezin, Vincent; Yamasaki, Hideaki; Kojima, Yasuhiko; Kawano, Yumiko; Yoshikawa, Hideki, Apparatus and method for delivery of precursor vapor from low vapor pressure liquid sources to a CVD chamber.
  6. Nolan, James F., Apparatus and method for depositing a material on a substrate.
  7. Babaev,Eilaz, Apparatus and method for the treatment of tissue with ultrasound energy by direct contact.
  8. Babaev, Eilaz, Apparatus and methods for debridement with ultrasound energy.
  9. Andrew T. Hunt ; Subramaniam Shanmugham ; William D. Danielson ; Henry A. Luten ; Tzyy Jiuan Hwang ; Girish Deshpande, Apparatus and process for controlled atmosphere chemical vapor deposition.
  10. Yin,Xiang Dong; Neagoe,Gabriel; Cioraca,Dorin; Sun,Andy Kwan Leung, Apparatus for steam sterilization of articles.
  11. Moffat, William A.; Randazzo, Boris C.; McCoy, Craig W.; Allen, Stuart V., Apparatus for the efficient coating of substrates including plasma cleaning.
  12. Cunning, Hugh; Williams, Graham; Odedra, Rajesh; Kanjolia, Ravi, Bubbler for the transportation of substances by a carrier gas.
  13. Uhlenbrock,Stefan, Chemical vapor deposition methods utilizing ionic liquids.
  14. Begarney, Michael J.; Campanale, Frank J., Chemical vapor deposition reactor.
  15. Marsh, Eugene P.; Atwell, David R., Chemical vaporizer for material deposition systems and associated methods.
  16. Francke,Tom; Ullberg,Christer, Dual-energy scanning-based detection of ionizing radiation.
  17. Loan James F. ; Salerno Jack P., Film processing system.
  18. Loan, James F.; Salerno, Jack P., Film processing system.
  19. Zhao, Jun; Dornfest, Charles; Chang, Frank; Jin, Xiaoliang; Tang, Po, High temperature filter for CVD apparatus.
  20. Randive, Rajul V.; Messner, William J., High throughput vaporizer.
  21. Xia,Li Qun; Xu,Huiwen; Witty,Derek R.; M'Saad,Hichem, In-situ oxide capping after CVD low k deposition.
  22. Alexander I. Gurary ; Paul Thomas Fabiano ; David Russell Voorhees ; Scott Beherrell, Induction heated chemical vapor deposition reactor.
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  24. Loan James F. ; Salerno Jack P., Method for chemical vapor deposition of a material on a substrate.
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  26. Michael J. Danese, Method for treating an object using ultra-violet light.
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  29. Brutti, Thierry; Pierret, Benoit; Guillon, Herve, Process and apparatus for liquid delivery into a chemical vapor deposition chamber.
  30. Mayorga, Steven Gerard; Haas, Mary Kathryn; O'Neill, Mark Leonard; Sinatore, Dino, Process stability of NBDE using substituted phenol stabilizers.
  31. Babaev, Eilaz; Peterson, Michael T.; Van Houten, Alan; Doten, Greg, Removable applicator nozzle for ultrasound wound therapy device.
  32. Babaev, Eilaz; Van Houten, Alan; Peterson, Michael T.; Doten, Greg, Removable applicator nozzle for ultrasound wound therapy device.
  33. Peterson, Michael T.; Van Houten, Alan, Removable multi-channel applicator nozzle.
  34. Xu, Wanqun; Li, Qilin, Repeated evaporation garment steamer.
  35. Morton, Willard E., Side entry humidifier.
  36. Lakshmanan,Annamalai; Raj,Daemian; Schmitt,Francimar; Kim,Bok Hoen; Balasubramanian,Ganesh, Situ oxide cap layer development.
  37. Scully, Nick, Smoke generating entertainment system.
  38. Kanjolia, Ravi; Platts, Chris; Nguyen, Nam; Wilkinson, Mark, Solid precursor delivery assemblies and related methods.
  39. Buchanan, Daryl; Tariq, Faisal; Mei, Hai; Tison, Stuart, System and method for producing and delivering vapor.
  40. Sajoto, Talex; Dornfest, Charles; Selyutin, Leonid; Zhao, Jun; Ku, Vincent; Jin, Xiao Liang, Temperature controlled gas feedthrough.
  41. Babaev, Eliaz, Ultrasonic catheter drug delivery method and device.
  42. Babaev, Eilaz, Ultrasonic method and device for wound treatment.
  43. Babaev, Eilaz, Ultrasonic method and device for wound treatment.
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  45. Babaev, Eilaz, Ultrasound wound treatment method and device using standing waves.
  46. Gelernt,Barry; Matthews,James Clifford, Vapor flow controller.
  47. Somekh Sasson ; Zhao Jun ; Dornfest Charles ; Sajoto Talex ; Selyutin Leonid ; Ku Vincent ; Wang Chris ; Chang Frank ; Tang Po, Vaporization and deposition apparatus.
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  49. Long,Michael; Strip,David R.; Grace,Jeremy M.; Freeman,Dennis R.; Redden,Neil P.; Koppe,Bruce E., Vaporizing fluidized organic materials.
  50. Babaev, Eilaz, Wound treatment method and device with combination of ultrasound and laser energy.
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