Radiation sensitive diazo sulfo-acrylic adducts and method for producing a printing plate
원문보기
IPC분류정보
국가/구분
United States(US) Patent
등록
국제특허분류(IPC7판)
G03F-070/21
G03F-070/95
출원번호
US-0797675
(1997-01-31)
발명자
/ 주소
Pappas S. Peter
Huang Jianbing
Shah Ajay
Saraiya Shashikant
출원인 / 주소
Kodak Polychrome Graphics, LLC
대리인 / 주소
Ratner & Prestia
인용정보
피인용 횟수 :
11인용 특허 :
0
초록▼
A radiation sensitive composition containing an adduct of a diazonium resin having pendant diazonium groups, with a sulfonated acrylic copolymer having pendant sulfonate groups. The sulfonated acrylic copolymer contains an acrylic moiety and a sulfonated styryl or acrylic moiety. The copolymer may o
A radiation sensitive composition containing an adduct of a diazonium resin having pendant diazonium groups, with a sulfonated acrylic copolymer having pendant sulfonate groups. The sulfonated acrylic copolymer contains an acrylic moiety and a sulfonated styryl or acrylic moiety. The copolymer may optionally contain styryl moieties. The composition is useful as a radiation sensitive layer in imaging elements for graphic arts applications and is particularly useful in preparing durable, long-wear, printing plates.
대표청구항▼
[ What is claimed is:] [1.] A radiation sensitive composition comprising an adduct of a diazonium resin, having a plurality of pendant diazonium groups, and a sulfonated acrylic copolymer, having a plurality of pendant sulfonate groups; wherein the sulfonated acrylic copolymer comprises at least one
[ What is claimed is:] [1.] A radiation sensitive composition comprising an adduct of a diazonium resin, having a plurality of pendant diazonium groups, and a sulfonated acrylic copolymer, having a plurality of pendant sulfonate groups; wherein the sulfonated acrylic copolymer comprises at least one acrylic moiety, a sulfonated moiety, and optionally a styryl moiety; wherein the copolymer has the structure: [ STR 4 ] with the proviso that the moieties may be randomly distributed within the copolymer; wherein the combination of x, y, and z taken together is 100 weight %, x is about 20 weight % or more, y is between about 1 weight % and about 20 weight % and z is about 50 weight % or less; wherein the sulfonated acrylic copolymer has a weight average molecular weight between about 5000 and about 100,000; and wherein R.sub.a, R.sub.b, and R.sub.c are independently selected from H or methyl, R.sub.1 is an alkyl, aryl or aralkyl group having 1 to 18 carbon atoms, and Q has a phenylene structure --Ph--W--, or a carbonyl structure --CO--U--R.sub.4 --, wherein when Q has the phenylene structure, W is a covalent bond or an alkylene group having 1 to 6 carbon atoms, or a group having the structure: --R.sub.2 --NH--CO.sub.2 --R.sub.3 -- wherein R.sub.2 and R.sub.3 are independently selected from alkylene groups having 1 to 6 carbon atoms and when Q has the carbonyl structure, U is O or NH; R.sub.4 is an alkylene group having 1 to 6 carbon atoms, or a group having the structure: --R.sub.5 --Z--CO.sub.2 --R.sub.6 -- wherein R.sub.5 and R.sub.6 are independently selected from alkylene groups having 1 to 6 carbon atoms and Z is an NH group or a covalent bond. [25.] A method for producing a printing plate from a radiation sensitive element comprising (I) imagewise exposing the radiation sensitive element to actinic radiation, wherein the radiation sensitive element comprises a substrate having a front hydrophilic surface; and a developer-soluble, radiation sensitive layer adhered to the front hydrophilic surface, the radiation sensitive layer consisting essentially of an adduct of a diazonium resin having a plurality of pendant diazonium groups, with a sulfonated acrylic copolymer having a plurality of pendant sulfonate groups, wherein the sulfonated acrylic copolymer comprises at least one acrylic moiety, a sulfonated moiety, and optionally a styryl moiety; wherein the copolymer has the structure: [ STR 8 ] with the proviso that the moieties may be randomly distributed within the copolymer; wherein the combination of x, y, and z taken together is 100 weight %, x is about 20 weight % or more, y is between about 1 weight % and about 20 weight % and z is about 50 weight % or less; wherein the sulfonated acrylic copolymer has a weight average molecular weight between about 5000 and about 100,000; and wherein R.sub.a, R.sub.b, and R.sub.c are independently selected from H or methyl, R.sub.1 is an alkyl, aryl or aralkyl group having 1 to 18 carbon atoms, and Q has a phenylene structure --Ph--W--, or a carbonyl structure --CO--U--R.sub.4 --, wherein when Q has the phenylene structure, W is a covalent bond or an alkylene group having 1 to 6 carbon atoms, or a group having the structure: --R.sub.2 --NH--CO.sub.2 --R.sub.3 -- wherein R.sub.2 and R.sub.3 are independently selected from alkylene groups having 1 to 6 carbon atoms, and when Q has the carbonyl structure, U is O or NH; R.sub.4 is an alkylene group having 1 to 6 carbon atoms, or a group having the structure: --R.sub.5 --Z--CO.sub.2 --R.sub.6 -- wherein R.sub.5 and R.sub.6 are independently selected from alkylene groups having 1 to 6 carbon atoms and Z is an NH group or a covalent bond; whereby areas of the radiation sensitive layer which are exposed are rendered insoluble in a developer solution; and (II) applying the developer to the imagewise exposed radiation sensitive layer.
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이 특허를 인용한 특허 (11)
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Platzer, Stephan J.; Sypek, Maria T.; Perron, Paul; Baumann, Harald; Alden, Melinda, Photosensitive compositions having mixtures of alkoxy and non-alkoxy diazonium salt containing compounds.
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