초록 ▼

A resin composition for stereolithography and a process for producing a three-dimensional object using the same. The resin composition comprises (1) a liquid photohardenable resin composition containing at least one of photo-polymerizable compounds and a photosensitive polymerization initiator, and

A resin composition for stereolithography and a process for producing a three-dimensional object using the same. The resin composition comprises (1) a liquid photohardenable resin composition containing at least one of photo-polymerizable compounds and a photosensitive polymerization initiator, and (2) at least one of radiation energy absorbers in an amount of from 0.001 to 1.0% by weight based on the total amount of the liquid photohardenable resin composition (1).

대표청구항 ▼

[ What is claimed is:] [1.] A resin composition for stereolithography comprising (1) a liquid photohardenable resin composition comprising an epoxy photohardenable resin composition and a monofunctional or polyfunctional (meth)acrylate monomer, at least one photo-polymerizable compound selected from

[ What is claimed is:] [1.] A resin composition for stereolithography comprising (1) a liquid photohardenable resin composition comprising an epoxy photohardenable resin composition and a monofunctional or polyfunctional (meth)acrylate monomer, at least one photo-polymerizable compound selected from the group consisting of aliphatic diepoxy compounds, alicyclic diepoxy compounds and aromatic diepoxy compounds, and a photo-initiator for polymerization, and (2) at least one radiation energy absorber in an amount of from 0.001 to 1.0% by weight based on the total amount of said liquid photohardenable resin composition (1), wherein said at least one radiation energy absorber (2) has an absorbance in a wavelength region of from 300 to 350 nm of at least 0.1 when measuring a solution obtained by dissolving 1 mg of said at least one radiation energy absorber in 100 ml of ethanol which is placed in a quartz cell having a light path length of 10 mm and said at least one radiation energy absorber (2) is selected from the group consisting of:(i) a benzotriazole compound represented by the formula (I): [ STR 6 ] wherein R.sup.1 and R.sup.2 are independently selected from the group consisting of a hydrogen atom, linear or branched chain substituted or unsubstituted alkyl groups having from 1 to 20 carbon atoms, and substituted or unsubstituted phenyl groups; and X is a hydrogen atom or a halogen atom;(ii) a benzophenone compound represented by formula (II): [ STR 7 ] wherein R.sup.3 and R.sup.4 are independently selected from the group consisting of a hydrogen atom, linear or branched chain substituted or unsubstituted alkyl groups having from 1 to 20 carbon atoms, and substituted or unsubstituted phenyl groups; a is 0 or 1; and b is 0 or 1;(iii) a phenyl salicylate compound is represented by formula (III): [ STR 8 ] wherein R.sup.5 is selected from the group consisting of a hydrogen atom, linear or branched chain substituted or unsubstituted alkyl groups having from 1 to 20 carbon atoms, and substituted or unsubstituted phenyl groups; and(iv) a cyanoacrylate compound represented by formula (IV): [ STR 9 ] wherein R.sup.6 and R.sup.7 are independently selected from the group consisting of a hydrogen atom, linear or branched chain substituted or unsubstituted alkyl groups having from 1 to 20 carbon atoms, and substituted or unsubstituted phenyl groups; and R.sup.8 is a linear or branched chain alkyl group having from 1 to 20 carbon atoms. [2.] A process for fabricating an integral three-dimensional object from successive layers of a photohardenable liquid resin composition, said process comprising the steps of:(a) forming a layer of a photohardenable liquid resin composition;(b) photohardening at least a portion of said layer of said photohardenable liquid resin composition by exposure to an actinic radiation to form a hardened layer;(c) introducing a new layer of said photohardenable liquid resin composition onto said hardened layer formed by exposure to an actinic radiation;(d) photohardening at least a portion of said new layer of said photohardenable liquid resin composition by exposure to an actinic radiation;(e) repeating the steps (c) and (d), d photohardenable liquid resin composition being a resin composition according to claim 1.