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Pressure gradient CVI/CVD apparatus process and product 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • C23C-016/00
출원번호 US-0851860 (1997-05-06)
발명자 / 주소
  • Rudolph James W.
  • Purdy Mark J.
출원인 / 주소
  • The B. F. Goodrich Company
대리인 / 주소
    Leffel
인용정보 피인용 횟수 : 24  인용 특허 : 21

초록 ▼

The invention relates to the field of high temperature composites made by the chemical vapor infiltration and deposition of a binding matrix within a porous structure. More particularly, the invention relates to pressure gradient processes for forcing infiltration of a reactant gas into a porous str

대표청구항 ▼

[ What is claimed is:] [5.] An apparatus for CVI/CVD densifying a plurality of porous aircraft brake disk structures, comprising:a CVI/CVD furnace that defines a furnace volume;a vacuum apparatus in fluid communication with said furnace volume;a first main gas line for supplying a first reactant gas

이 특허에 인용된 특허 (21)

  1. Drowley Clifford I. (Phoenix AZ) Turner John E. (Woodside CA), Apparatus for forming shallow electrical junctions.
    상세보기
  2. Vaudel Serge (Teuillac FRX), Apparatus for preheating a flow of gas in an installation for chemical vapor infiltration, and a densification method us.
    상세보기
  3. Higashiyama Kazutoshi (Hitachi) Ushida Takahisa (Nagoya) Hirabayashi Izumi (Nagoya) Tanaka Shoji (Tokyo JPX), Apparatus for producing superconducting oxide film.
    상세보기
  4. Rudolph James W. (Colorado Springs CO) Purdy Mark J. (Akron OH) Bok Lowell D. (Anna OH), Apparatus for use with CVI/CVD processes.
    상세보기
  5. Fisher Ronald (Rugby GB2) Smith Norman (Rugby GB2), Apparatus for vapor deposition on tubular substrate.
    상세보기
  6. Caputo Anthony J. (Knoxville TN) Devore Charles E. (Knoxville TN) Lowden Richard A. (Powell TN) Moeller Helen H. (Concord VA), CVD apparatus and process for the preparation of fiber-reinforced ceramic composites.
    상세보기
  7. Miyazaki Shinji (Yokohama JPX), Chemical vapor growth apparatus having an exhaust device including trap.
    상세보기
  8. Kanai Masahiro (Tokyo JPX) Hirooka Masaaki (Toride JPX) Hanna Junichi (Yokohama JPX) Shimizu Isamu (Yokohama JPX) Takeuchi Eiji (Yokohama JPX), Device for forming a deposited film.
    상세보기
  9. Bauer Dieter W. (Whittier CA), Fiber reinforced composite product.
    상세보기
  10. Goldman Jon C. (Orange CA) Rappaport Robert E. (Westminster CA), Gas control system for chemical vapor deposition system.
    상세보기
  11. Stauffer Craig M. (3066 Scott Blvd. Santa Clara CA 95054), Integrated delivery system for chemical vapor from non-gaseous sources for semiconductor processing.
    상세보기
  12. Zachman Joseph M. (Greentown IN) Ragan Clyde E. (Greentown IN) Alexander Steven L. (Westfield IN) Myers Bruce A. (Kokomo IN) Eytcheson Charles T. (Kokomo IN), Method and apparatus for through hole substrate printing.
    상세보기
  13. Fisher Ronald (Rugby GB2) Smith Norman (Rugby GB2), Method for the production of carbon/carbon composite material.
    상세보기
  14. Bernard Bruno C. (Eusines FRX) Brosse Christian B. (Le Haillan FRX) Cavalier Jean-Claude (Le Pian Medoc FRX), Method of densifying a porous substrate by means of a matrix containing carbon.
    상세보기
  15. Golecki Ilan (Parsippany NJ) Morris Robert C. (Ledgewood NJ) Narasimhan Dave (Flemington NJ), Method of rapidly densifying a porous structure.
    상세보기
  16. Fujii Atsuhiro (Itami JPX), Method of treating a substrate wherein the flow rates of the treatment gases are equal.
    상세보기
  17. Nishikawa Yukinobu (Tokyo JPX) Hashizume Yoshinori (Tokyo JPX) Kimura Takako (Tokyo JPX), Mixed gas supply system with a backup supply system.
    상세보기
  18. Okamura Ryuji (Shiga JPX) Otoshi Hirokazu (Nagahama JPX) Takei Tetsuya (Nagahama JPX), Process and apparatus for microwave plasma chemical vapor deposition.
    상세보기
  19. Lackey ; Jr. Walter J. (Oak Ridge TN) Caputo Anthony J. (Knoxville TN), Process for the preparation of fiber-reinforced ceramic composites by chemical vapor deposition.
    상세보기
  20. Maeda Kazuo (Tokyo JPX) Ohira Kouichi (Tokyo JPX) Hirose Mitsuo (Tokyo JPX), Semiconductor fabrication equipment.
    상세보기
  21. Anderson Roger N. (San Jose CA) Lindstrom Paul R. (Aptos CA) Johnson Wayne (Phoenix AZ), Variable rate distribution gas flow reaction chamber.
    상세보기

이 특허를 인용한 특허 (24)

  1. Lau, Sai-Kwing; Calandra, Salvatore J.; Nixon, Thomas D.; Stover, Edward R., Boron carbide based ceramic matrix composites.
    상세보기
  2. Nixon,Thomas Dwayne; Lau,Sai Kwing; Stover,Edward R.; Calandra,Salvatore J.; Pujar,Vijay V.; Ritz,Lanny; Clark,Gary L.; Keller,Steve T., Boron carbide based ceramic matrix composites.
    상세보기
  3. Vargas, Joseph R.; Seelman, Steven; Roberts, David B., Chemical vapor infiltration apparatus and process.
    상세보기
  4. Leluan Jean-Luc,FRX ; Domblides Jean-Luc,FRX ; Delperier Bernard,FRX ; Thebault Jacques,FRX ; Toussaint Jean-Marie,FRX, Chemical vapor infiltration method with variable infiltration parameters.
    상세보기
  5. Fiala Robert ; Zeigler Dary ; Welson Darren ; Del Real Jose ; Rudolph James W., Combination CVI/CVD and heat treat susceptor lid.
    상세보기
  6. Jonnalagadda, Rajanikant; Miller, Brian J., Gas port sealing for CVD/CVI furnace hearth plates.
    상세보기
  7. Jonnalagadda, Rajanikant; Miller, Brian J., Gas port sealing for CVD/CVI furnace hearth plates.
    상세보기
  8. Daws, David E.; Rudolph, James W.; Zeigler, Dary; Bazshushtari, Afshin, Hardware assembly for CVI/CVD processes.
    상세보기
  9. Dennis T. Garn ; Jerry S. Lee ; James W. Rudolph, Method and apparatus for cooling a CVI/CVD furnace.
    상세보기
  10. Fiala, Robert; Rudolph, James W.; Garn, Dennis T.; Lee, Jerry S., Method and apparatus for cooling a CVI/CVD furnace.
    상세보기
  11. Garn, Dennis T.; Lee, Jerry S.; Rudolph, James W., Method and apparatus for cooling a CVI/CVD furnace.
    상세보기
  12. James Warren Rudolph, Method and apparatus for inhibiting infiltration of a reactive gas into porous refractory insulation.
    상세보기
  13. Melcer,Chris; Lane,John, Method and apparatus for pressure and mix ratio control.
    상세보기
  14. Roger A. Ross ; Patrick C. Trujillo ; Robert Fiala, Method and apparatus for pressure measurement in a CVI/CVD furnace.
    상세보기
  15. Rudolph,James W.; Daws,David E.; Zeigler,Dary; Bazshushtari,Afshin, Method for measurement of weight during a CVI/CVD process.
    상세보기
  16. Rudolph, James Warren; She, Ying; Dardas, Zissis A.; Filburn, Thomas P.; St. Rock, Brian; Linck, John, Methods for modifying pressure differential in a chemical vapor process.
    상세보기
  17. Rudolph, James W.; Fry, Vincent, Non-pressure gradient single cycle CVI/CVD apparatus and method.
    상세보기
  18. Rudolph, James W.; Fry, Vincent R., Non-pressure gradient single cycle CVI/CVD apparatus and method.
    상세보기
  19. Rudolph,James W.; Perea,Paul T.; Linck,John S.; Kirkpatrick,Chris T.; Jones,Richard, Pressure gradient CVI/CVD apparatus and method.
    상세보기
  20. Purdy, Mark J.; Rudolph, James W.; Bok, Lowell D., Pressure gradient CVI/CVD process.
    상세보기
  21. Rudolph James Warren, Sealed reactant gas inlet for a CVI/CVD furnace.
    상세보기
  22. Park, Jong-chul; Kim, Dong-hyun; Kwon, O-ik; Jo, Hye-jin, Shower head of a wafer treatment apparatus having a gap controller.
    상세보기
  23. Hara, Daisuke; Itoh, Takeshi; Fukuda, Masanao; Yamaguchi, Takatomo; Hiramatsu, Hiroaki; Saido, Shuhei; Sasaki, Takafumi, Substrate processing apparatus.
    상세보기
  24. Lay, Eddy; Tseng, Shih-Min; Wu, Sheng-Wei; Chen, Jen-Chung; Chen, Shih-Fang, Vertical furnace for improving wafer uniformity.
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