The present invention relates to a method of removing harmful components selected from the group consisting of volatile inorganic hydrides, volatile inorganic halides and organometallic compounds and a method of detecting the same, apparatus employed according to these methods. The harmful component
The present invention relates to a method of removing harmful components selected from the group consisting of volatile inorganic hydrides, volatile inorganic halides and organometallic compounds and a method of detecting the same, apparatus employed according to these methods. The harmful components can be removed by bringing it into contact with a crystalline cupric hydroxide. The harmful components can be detected based on the color change of the copper hydroxide.
대표청구항▼
[ What is claimed is:] [1.] A method of removing a volatile harmful component selected from the group consisting of hydrides of Si, P, As, B, Se and Ge and alkylates and alkoxides of B, Al, Si, P, Ti, Zn, Ga, Ge, As, Se, Zr, In, Sn and Ta from a gas stream containing the harmful component, which com
[ What is claimed is:] [1.] A method of removing a volatile harmful component selected from the group consisting of hydrides of Si, P, As, B, Se and Ge and alkylates and alkoxides of B, Al, Si, P, Ti, Zn, Ga, Ge, As, Se, Zr, In, Sn and Ta from a gas stream containing the harmful component, which comprises contacting the gas stream with crystalline cupric hydroxide.
연구과제 타임라인
LOADING...
LOADING...
LOADING...
LOADING...
LOADING...
이 특허에 인용된 특허 (11)
Teller Aaron Joseph (Westboro MA), Abatement of high concentrations of acid gas emissions.
Kitayama Masayasu (Kawasaki JPX) Sugimori Yoshiaki (Tokyo JPX) Ohta Schunich (Fujisawa JPX), Absorbent for treating gases containing the materials used for semiconductor products and process of treating such gases.
Kitayama Masayasu (Kawasaki JPX) Sugimori Yoshiaki (Tokyo JPX) Ohta Schunich (Fujisawa JPX), Absorbent for treating gases containing the materials used for semiconductor products and process of treating such gases.
Tom Glenn M. (New Milford CT) McManus James V. (Danbury CT), Process for purifying semiconductor process gases to remove lewis acid and oxidant impurities therefrom.
Audeh Costandi A. (Princeton NJ) Hoffman Barry E. (Duncanville TX), Simultaneous dehydration and removal of residual impurities from gaseous hydrocarbons.
Holst, Mark; Carpenter, Kent; Lane, Scott; Arya, Prakash V., Effluent gas stream treatment system having utility for oxidation treatment of semiconductor manufacturing effluent gases.
Sweeney, Joseph D.; Marganski, Paul J.; Olander, W. Karl; Wang, Luping, Method and apparatus for the abatement of toxic gas components from a semiconductor manufacturing process effluent stream.
Sweeney,Joseph D.; Marganski,Paul J.; Olander,W. Karl, Method and apparatus for the abatement of toxic gas components from a semiconductor manufacturing process effluent stream.
Shioya,Yasushi; Yatsuda,Masanori; Takachi,Minoru; Wada,Hiroshi, Treating agent for exhaust gas containing metal hydride compound and method for treating exhaust gas containing metal hydride compound.
Teshigawara,Satoshi; Takachi,Minoru; Matsuda,Yoshihiro; Shibano,Hidetaka; Tomiyama,Yoshiyuki, Treating agent for metal-hydride-containing exhaust gas and method of preparing the same as well as method of treating metal-hydride-containing exhaust gas.
※ AI-Helper는 부적절한 답변을 할 수 있습니다.