초록 ▼

A semiconductor wafer processing carousel comprises an elevator chamber that accepts cassettes loaded with semiconductor wafers through a removable vacuum lock door, an elevator platform on which the cassettes ride up and down, an elevator drive to automatically position the elevator platform, a lid

A semiconductor wafer processing carousel comprises an elevator chamber that accepts cassettes loaded with semiconductor wafers through a removable vacuum lock door, an elevator platform on which the cassettes ride up and down, an elevator drive to automatically position the elevator platform, a lid and a circular wafer handling chamber with an anteroom chamber connection to the elevator chamber. A double-axis wafer transfer arm provides for linear transfer through the anteroom chamber of selected wafers between the cassettes and a first pre-heating and cool-down process station within the circular wafer handling chamber. A multiple-spoke single-axis rigid-arm transfer carousel is centrally located within the circular wafer handling chamber and has access to multiple process stations. A set of independent cylindrical rings are positioned to rise up from the handling chamber bottom of the circular wafer handling chamber to contact and seal against the lid to isolate each of the process stations. A circular port with a diameter larger than the wafer is thus coupled from a detachable process reactor mounted on the lid down deep into the circular wafer handling chamber. The multiple-spoke single-axis rigid-arm transfer carousel is automatically positioned out of the way before the cylindrical rings are raised and sealed.

대표청구항 ▼

[ What is claimed is:] [3.] A modular wafer processing system, comprising:a circular wafer handling chamber with a detachable lid that provides a mounting platform with a plurality of process-reactor circular ports for a plurality of interchangeable processing modules;an anteroom chamber connected t

[ What is claimed is:] [3.] A modular wafer processing system, comprising:a circular wafer handling chamber with a detachable lid that provides a mounting platform with a plurality of process-reactor circular ports for a plurality of interchangeable processing modules;an anteroom chamber connected to one side of the circular wafer handling chamber and including a double-axis wafer transfer arm for linearly transferring through the anteroom chamber a plurality of semiconductor wafers each with diameters less than any of said plurality of process-reactor circular ports;an elevator chamber accessible to said double-axis wafer transfer arm and that accepts a cassette loaded with a plurality of said semiconductor wafers through a removable door including an elevator platform on which said cassettes ride up and down, and an elevator drive to automatically position said elevator platform;a plurality of equally distributed processing stations each associated with a corresponding one of said plurality of interchangeable processing modules and each intersecting the circular wafer handling chamber, wherein a first one of said plurality of equally distributed processing stations is accessible to said double-axis wafer transfer arm providing for an exchange of said semiconductor wafers between said first processing station and said cassette in the elevator chamber;a multiple-spoke single-axis rigid-arm transfer carousel centrally located within the circular wafer handling chamber and having access to every one of said plurality of equally distributed processing stations and providing for a clockwise or counterclockwise transfer of said semiconductor wafers between adjacent ones of the plurality of equally distributed processing stations; anda plurality of cylindrical metal sleeves with top and bottom end ring seals each disposed at every one of the plurality of equally distributed processing stations and having means for independently raising and sealing each cylindrical metal sleeve with top and bottom end ring seals between a handling chamber bottom of the circular wafer handling chamber and the detachable lid, wherein the interior of each respective processing station can be isolated from the others and the remaining interior of the circular wafer handling chamber.