초록 ▼

Waste water from an apparatus that rinses particles from semiconductor wafers is collected in a tank. A pump sends waste water from the tank through a particle filter and onward to a supply inlet for initial rinse stages of the processing apparatus. Some of the waste water is bleed from the tank and

Waste water from an apparatus that rinses particles from semiconductor wafers is collected in a tank. A pump sends waste water from the tank through a particle filter and onward to a supply inlet for initial rinse stages of the processing apparatus. Some of the waste water is bleed from the tank and replenished by fresh water introduced into the final rinse stage of the apparatus. If the semiconductor processing so dictates, chemicals may be added to the waste water to alter the pH and/or prevent the precipitation of solids in the tank. The addition of such chemicals can be controlled automatically in response to sensed characteristics of the waste water.

대표청구항 ▼

[ We claim:] [1.] A method for recycling water used to rinse particles from semiconductor wafers in a processing apparatus, said method comprising the steps of receiving waste water from an outlet of the processing apparatus; removing particles from waste water to produce less than ultra pure, deion

[ We claim:] [1.] A method for recycling water used to rinse particles from semiconductor wafers in a processing apparatus, said method comprising the steps of receiving waste water from an outlet of the processing apparatus; removing particles from waste water to produce less than ultra pure, deionized water; and supplying the less than ultra pure, deionized water to an inlet of the processing apparatus to rinse particles from a wafer, then supplying ultra pure, deionized water to said processing apparatus to rinse particles from said wafer, wherein said less than ultra pure, deionzed water is free of sufficient particles so as not to leave a solid residue on said wafer.