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Liquid carbon dioxide cleaning using jet edge sonic whistles at low temperature 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • B08B-005/02
출원번호 US-0003913 (1998-01-07)
발명자 / 주소
  • Chao Sidney C.
  • Purer Edna M.
  • Sorbo Nelson W.
출원인 / 주소
  • Raytheon Company
대리인 / 주소
    Raufer
인용정보 피인용 횟수 : 51  인용 특허 : 8

초록

A cleaning system and method utilizing sonic whistle agitation to enhance the soil removal and mass transport capacity of the liquid carbon dioxide at low process temperatures. Sonic whistles are within a cleaning chamber, and liquid carbon dioxide is forced out of the sonic whistle jets to ultrason

대표청구항

[ What is claimed is:] [1.] In a liquid carbon dioxide cleaning system having a cleaning chamber, a storage tank containing liquid carbon dioxide, a pump for pumping the liquid carbon dioxide from the storage tank to the cleaning chamber, a gas recovery compressor communicating with said cleaning ch

이 특허에 인용된 특허 (8)

  1. Chao Sidney C. (Manhattan Beach CA) Purer Edna M. (Los Angeles CA), Chemical decomposition by sonication in liquid carbon dioxide.
  2. Chao Sidney C. (Manhattan Beach CA) Purer Edna M. (Los Angeles CA) Stanford Thomas B. (San Pedro CA) Townsend Carl W. (Los Angeles CA), Cleaning by cavitation in liquefied gas.
  3. Jackson David P. (Saugus CA) Buck Orval F. (Santa Monica CA), Cleaning process using phase shifting of dense phase gases.
  4. Purer Edna M. (Los Angeles CA) Wilkerson Angela Y. (Los Angeles CA) Townsend Carl W. (Los Angeles CA) Chao Sidney C. (Manhattan Beach CA), Dry-cleaning of garments using gas-jet agitation.
  5. Chao Sidney C. (Manhattan Beach CA) Stanford Thomas B. (San Pedro CA) Purer Edna M. (Los Angeles CA) Wilkerson Angela Y. (Inglewood CA), Dry-cleaning of garments using liquid carbon dioxide under agitation as cleaning medium.
  6. Stanford,Jr. Thomas B. (San Pedro CA) Chao Sidney C. (Manhattan Beach CA), Low cost equipment for cleaning using liquefiable gases.
  7. Stanford ; Jr. Thomas B. (San Pedro CA) Chao Sidney C. (Manhattan Beach CA), Method using megasonic energy in liquefied gases.
  8. Jackson David P. (22328 W. Barcotta Dr. Santa Clarita CA 91350) Lepp Michael A. (22334 W. Barcotta Dr. Santa Clarita CA 91350), Processes for cleaning, sterilizing, and implanting materials using high energy dense fluids.

이 특허를 인용한 특허 (51)

  1. Walker James M., Apparatus and method for detecting a liquid level in a sealed storage vessel.
  2. McCullough, Kenneth J.; Moreau, Wayne M.; Simons, John P.; Taft, Charles J.; Cotte, John M., Apparatus and method for increasing throughput in fluid processing.
  3. Bergman Eric J. ; Hess Mignon P., Apparatus and method for processing the surface of a workpiece with ozone.
  4. Bergman Eric J. ; Hess Mignon P., Apparatus and method for processing the surface of a workpiece with ozone.
  5. Bergman, Eric J.; Hess, Mignon P., Apparatus and method for processing the surface of a workpiece with ozone.
  6. Bohnert,George W.; Hand,Thomas E.; DeLaurentiis,Gary M., Apparatus and method for removing solvent from carbon dioxide in resin recycling system.
  7. Yokomizo,Kenji, Apparatus and method of securing a workpiece during high-pressure processing.
  8. Lewis, Paul E.; Ahmadi, Goodarz; Tannous, Adel George; Makhamreh, Khalid; Compton, Keith H., Apparatus for cleaning surfaces substantially free of contaminants.
  9. Marshall, Mary C.; Franjione, John G.; Freitas, Christopher J.; Roberds, William T.; Pollard, Gordon D.; Blake, Jill, Apparatus for contaminant removal using natural convection flow and changes in solubility concentrations by temperature.
  10. Bergman, Eric J., Apparatus for treating a workpiece with steam and ozone.
  11. Jones,William Dale, Control of fluid flow in the processing of an object with a fluid.
  12. Sheydayi,Alexei; Sutton,Thomas, Gate valve for plus-atmospheric pressure semiconductor process vessels.
  13. Yamada, Atsushi, Heated ultrasonic treating device and treating method for suspended matter-containing liquid.
  14. Jones, William D., High pressure fourier transform infrared cell.
  15. Biberger,Maximilian A.; Layman,Frederick Paul; Sutton,Thomas Robert, High pressure processing chamber for semiconductor substrate.
  16. Jones,William Dale, High-pressure processing chamber for a semiconductor wafer.
  17. Jones,William Dale, High-pressure processing chamber for a semiconductor wafer.
  18. Chao Sidney C. ; Purer Edna M. ; Sorbo Nelson W., Liquid carbon dioxide cleaning using agitation enhancements at low temperature.
  19. Goshi,Gentaro, Method and apparatus for cooling motor bearings of a high pressure pump.
  20. Yoshida,Hideo; Sato,Nobuyoshi; Sako,Takeshi; Sone,Masato; Abe,Kentaro; Sakon,Kiyohito, Method for activating surface of base material and apparatus thereof.
  21. Bergman, Eric J.; Hess, Mignon P., Method for processing the surface of a workpiece.
  22. Bohnert,George W.; Hand,Thomas E.; DeLaurentiis,Gary M., Method for removing contaminants from plastic resin.
  23. Bohnert,George W.; Hand,Thomas E.; DeLaurentiis,Gary M., Method for removing contaminants from plastic resin.
  24. Bergman, Eric J.; Hess, Mignon P., Method for treating the surface of a workpiece.
  25. Lin Wen-Fa,TWX ; Hung Chi-Ying,TWX ; Tang Jing-Wen,TWX ; Hsieh Tien-Szu,TWX, Method of fiber scouring with supercritical carbon dioxide.
  26. Bohnert,George W.; Hand,Thomas E.; DeLaurentiis,Gary M., Method of removing contaminants from plastic resins.
  27. Bohnert,George W.; Hand,Thomas E.; Delaurentiis,Gary M., Method of removing contaminants from plastic resins.
  28. Biberger,Maximilian Albert; Layman,Frederick Paul; Sutton,Thomas Robert, Method of supercritical processing of a workpiece.
  29. Bergman, Eric J., Methods for cleaning semiconductor surfaces.
  30. Bergman, Eric J., Methods for cleaning semiconductor surfaces.
  31. Ahmadi, Goodarz; Lewis, Paul E.; Tannous, Adel George; Makhamreh, Khalid; Compton, Keith H., Methods for cleaning surfaces substantially free of contaminants.
  32. Ahmadi, Goodarz; Lewis, Paul E.; Tannous, Adel George; Makhamreh, Khalid; Compton, Keith H., Methods for cleaning surfaces substantially free of contaminants utilizing filtered carbon dioxide.
  33. Ahmadi, Goodarz; Lewis, Paul E.; Tannous, Adel George; Makhamreh, Khalid, Methods for cleaning utilizing multi-stage filtered carbon dioxide.
  34. Boumerzoug,Mohamed; Tannous,Adel George, Methods for residue removal and corrosion prevention in a post-metal etch process.
  35. Boumerzoug, Mohamed; Tannous, Adel George; Makhamreh, Khalid, Methods for resist stripping and cleaning surfaces substantially free of contaminants.
  36. Boumerzoug,Mohamed; Tannous,Adel George; Makhamreh,Khalid, Methods for resist stripping and cleaning surfaces substantially free of contaminants.
  37. Tannous,Adel George; Makhamreh,Khalid, Methods for resist stripping and other processes for cleaning surfaces substantially free of contaminants.
  38. Tannous,Adel George; Makhamreh,Khalid, Methods for resist stripping and other processes for cleaning surfaces substantially free of contaminants.
  39. Tannous,Adel George; Makhamreh,Khalid, Methods for resist stripping and other processes for cleaning surfaces substantially free of contaminants.
  40. Bergman,Eric J., Methods of thinning a silicon wafer using HF and ozone.
  41. John Michael Cotte ; Kenneth John McCullough ; Wayne Martin Moreau ; Keith R. Pope ; John P. Simons ; Charles J. Taft, Process and apparatus for cleaning filters.
  42. Bergman, Eric J., Process and apparatus for treating a workpiece such as a semiconductor wafer.
  43. Gebhart,Thomas Maximilia; Bergman,Eric J., Process and apparatus for treating a workpiece using ozone.
  44. Bergman,Eric J., Process and apparatus for treating a workpiece with gases.
  45. Wuester,Christopher D., Process flow thermocouple.
  46. Eric J. Bergman, Process for treating a workpiece with hydrofluoric acid and ozone.
  47. Bergman,Eric J., Processing a workpiece using water, a base, and ozone.
  48. Bohnert,George W.; Hand,Thomas E.; DeLaurentiis,Gary M., Solvent cleaning system and method for removing contaminants from solvent used in resin recycling.
  49. Bergman,Eric J.; Gebhart,Thomas Maximilian, System and methods for polishing a wafer.
  50. Bohnert, George W.; Hand, Thomas E.; DeLaurentiis, Gary M., System for removing contaminants from plastic resin.
  51. Jacobson,Gunilla; Yellowaga,Deborah, Treatment of a dielectric layer using supercritical CO.
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