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Hot pressed and sintered sputtering target assemblies and method for making same 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • B23K-020/00
  • C23C-014/34
출원번호 US-0729505 (1996-10-11)
발명자 / 주소
  • Kardokus Janine K.
  • Morales Diana
출원인 / 주소
  • Johnson Matthey Electonics, Inc.
대리인 / 주소
    Christie, Parker & Hale, LLP
인용정보 피인용 횟수 : 44  인용 특허 : 23

초록

Described is a hot pressed and sintered sputtering target assembly formed of hot pressed and sintered metal powder diffusion bonded together and to a backing plate by use of an intermediate adhesion layer of titanium or titanium alloy.

대표청구항

[ Accordingly, the invention should be limited only by the appended claims wherein what is claimed is:] [1.] A hot pressed and sintered sputtering target assembly comprising a hot pressed and sintered target surface diffusion bonded to a backing plate with a hot pressed and sintered intermediate adh

이 특허에 인용된 특허 (23)

  1. Shagun Vladimir A. (ulitsa 50 let SSSR ; I4 ; kv. 63 Ufa SUX) Domrachev Vladimir A. (ulitsa Sotsialisticheskaya ; 47 ; kv. 64 Ufa SUX) Balykin Pavel S. (ulitsa Entuziastov ; I ; kv. 2I2 Ufa SUX) Soko, Apparatus for applying film coatings onto substrates in vacuum.
  2. Aichert Hans (Hanau am Main DEX) Gegenwart Rainer (Rodermark DEX) Kukla Reiner (Hanau am Main DEX) Wilmes Klaus (Bad Orb DEX) Kieser Jorg (Forchheim DEX), Cathode sputtering apparatus on the magnetron principle with a hollow cathode and a cylindrical target.
  3. Bergmann Erich (Mels CHX) Braus Jurgen (Walldor DEX), Composite material having a slide layer applied by cathode sputtering.
  4. Bergmann Erich (Mels CHX) Braus Jurgen (Walldorf DEX), Composite material having a slide layer applied by cathode sputtering.
  5. Arita Yoji (Yokohama JPX), Magnetron sputtering apparatus.
  6. dos Santos Pereiro Ribeiro Carlos A. (Von Stauffenbergstrasse 12 7470 Albstadt 15 DEX), Magnetron sputtering cathode.
  7. Hata Tomonobu (Ishikawa JPX), Magnetron sputtering method and apparatus.
  8. Nobutani Tohru (Kadoma JPX) Nakamoto Atsuhiro (Kadoma JPX) Izumi Hideo (Kadoma JPX) Miyano Takahiro (Kadoma JPX), Method for forming conducting metal layer on inorganic substrate.
  9. Dunlop John A. (Veradale WA) Rensing Hans (Rossland CAX), Method for making tungsten-titanium sputtering targets and product.
  10. Mueller John J. (Hilliard OH) Stellrecht David E. (Columbus OH), Method of bonding a sputter target-backing plate assembly assemblies produced thereby.
  11. Lannutti Susan M. (Columbus OH) Wickersham ; Jr. Charles E. (Columbus OH), Method of bonding a titanium containing sputter target to a backing plate and bonded target/backing plate assemblies pro.
  12. Mueller John J. (Columbus OH), Method of bonding tungsten titanium sputter targets to titanium plates and target assemblies produced thereby.
  13. Ivanov Eugene Y. (Grove City OH) Grigoriva Tatyana F. (Spartaka RUX) Boldyrev Vladimir V. (Tereshkova RUX), Methods and structural combinations providing for backing plate reuse in sputter target/backing plate assemblies.
  14. Korb Georg (Muhl/Reutte ATX), Process for the manufacture of a target for cathodic sputtering.
  15. Fielder Kenneth B. (Columbus OH) Belli Robert L. (Columbus OH) Fuchs Conrad E. (Grove City OH), Quick change sputter target assembly.
  16. Kusakabe Kenji (Itami JPX) Yamauchi Keiji (Itami JPX), Semiconductor production apparatus.
  17. Fukasawa Yoshiharu (Yokohama JPX) Kawai Mituo (Yokohama JPX) Ishihara Hideo (Yokohama JPX) Umeki Takenori (Yokohama JPX) Oana Yasuhisa (Yokohama JPX), Sputtering alloy target and method of producing an alloy film.
  18. Shimamura Hideaki (Yokohama JPX) Sakata Masao (Yokohama JPX) Kobayashi Shigeru (Tokyo JPX) Yoneoka Yuji (Yokohama JPX) Kamei Tsuneaki (Kanagawa JPX) Kawahito Tsuneyoshi (Yokohama JPX) Fujita Shoyo (G, Sputtering process and an apparatus for carrying out the same.
  19. Fukasawa Yoshiharu (Tokyo JPX) Yamaguchi Satoshi (Tokyo JPX) Ishihara Hideo (Tokyo JPX), Sputtering target.
  20. Okumura Katsuya (Yokohama JPX) Ueda Masaaki (Kawasaki JPX), Sputtering target.
  21. Ohhashi Tateo (Kitaibaraka JPX) Fukuyo Hideaki (Kitaibaraka JPX) Sawamura Ichiroh (Kitaibaraka JPX) Nakamura Kenichirou (Kitaibaraka JPX) Fukushima Atsushi (Kitaibaraka JPX) Nagasawa Masaru (Kitaibar, Sputtering target assembly having solid-phase bonded interface.
  22. Sakata Masao (Yokohama JPX) Kobayashi Shigeru (Tokyo JPX) Abe Katsuo (Yokosuka JPX) Shimamura Hideaki (Yokohama JPX) Kamei Tsuneaki (Kanagawa JPX) Kasahara Osamu (Tokyo JPX) Ogishi Hidetsugu (Hachioj, Target for sputtering.
  23. Ohta Kenji (Kitakatsuragi JPX) Murakami Yoshiteru (Nishinomiya JPX) Takamori Nobuyuki (Nara JPX) Hijikata Kenichi (Urawa JPX) Shingyoji Takyuki (Urawa JPX) Takaishi Kazushige (Omiya JPX), Target unit.

이 특허를 인용한 특허 (44)

  1. Kuriyama, Kazuya; Furukoshi, Takayuki, Backing plate and its manufacturing process.
  2. Chou, Kathleen; Slattery, Kevin Thomas, Diffusion-bonded metallic materials.
  3. Miao, Weifang; Smathers, David B.; Ivanov, Eugene Y.; Theado, Erich; Bailey, Robert S.; Hart, Jeff, Diffusion-bonded sputter target assembly and method of manufacturing.
  4. Miller, Steven A.; Gaydos, Mark; Shekhter, Leonid N.; Gulsoy, Gokce, Dynamic dehydriding of refractory metal powders.
  5. Miller, Steven A.; Gaydos, Mark; Shekhter, Leonid N.; Gulsoy, Gokce, Dynamic dehydriding of refractory metal powders.
  6. Zhang, Wenjun, Fabrication of B/C/N/O/Si doped sputtering targets.
  7. Zhang,Wenjun, Fabrication of B/C/N/O/Si doped sputtering targets.
  8. Gruber David, Fabrication of metallic articles using precursor sheets.
  9. Miller, Steven A.; Kumar, Prabhat; Wu, Richard; Sun, Shuwei; Zimmermann, Stefan; Schmidt-Park, Olaf, Fine grained, non banded, refractory metal sputtering targets with a uniformly random crystallographic orientation, method for making such film, and thin film based devices and products made therefrom.
  10. Cerio ; Jr. Frank M., In situ titanium aluminide deposit in high aspect ratio features.
  11. Dary, Francois-Charles; Gaydos, Mark; Loewenthal, William; Miller, Steven A.; Rozak, Gary; Volchko, Scott Jeffrey; Zimmermann, Stefan; Stawovy, Michael Thomas, Large-area sputtering targets.
  12. Myli, Kari B.; Krisko, Annette J.; German, John R.; Hartig, Klaus, Low-maintenance coating technology.
  13. Myli, Kari B.; Krisko, Annette J.; German, John; Hartig, Klaus, Low-maintenance coating technology.
  14. Krisko, Annette J.; Myli, Kari B.; Pfaff, Gary L.; Brownlee, James E., Low-maintenance coatings.
  15. Krisko, Annette J.; Myli, Kari B.; Pfaff, Gary L.; Brownlee, James E., Low-maintenance coatings.
  16. Myli, Kari B.; Krisko, Annette J.; Brownlee, James E.; Pfaff, Gary L., Low-maintenance coatings, and methods for producing low-maintenance coatings.
  17. Myli, Kari B.; Krisko, Annette J.; Brownlee, James Eugene; Pfaff, Gary L., Low-maintenance coatings, and methods for producing low-maintenance coatings.
  18. Lo, Chi-Fung; Draper, Darryl, Method for consolidating and diffusion-bonding powder metallurgy sputtering target.
  19. Snowman Alfred ; Hunt Thomas J., Method for making W/Ti sputtering targets and products in an inert atmosphere.
  20. Moxson, Vladimir S.; Ivanov, Eugene, Method for manufacturing fully dense metal sheets and layered composites from reactive alloy powders.
  21. Rak,Zbigniew; Berkeveld,Louis David; Snijders,Gerrit, Method for producing a porous titanium material article.
  22. Wang, Aiguo; Lawrynowicz, Daniel E.; Zeng, Haitong; Murray, Naomi; Prabhu, Balaji, Methods for manufacturing porous orthopaedic implants.
  23. Kohler, Ron D.; Cooper, Matthew S., Methods of forming physical vapor deposition target/backing plate assemblies.
  24. Miller, Steven A.; Shekhter, Leonid N.; Zimmermann, Stefan, Methods of joining metallic protective layers.
  25. Miller, Steven A.; Shekhter, Leonid N.; Zimmermann, Stefan, Methods of joining metallic protective layers.
  26. Volchko, Scott Jeffrey; Zimmermann, Stefan; Miller, Steven A.; Stawovy, Michael Thomas, Methods of manufacturing high-strength large-area sputtering targets.
  27. Loewenthal, William; Miller, Steven Alfred, Methods of manufacturing large-area sputtering targets.
  28. Miller, Steven A.; Dary, Francois-Charles; Gaydos, Mark; Rozak, Gary, Methods of manufacturing large-area sputtering targets by cold spray.
  29. Volchko, Scott Jeffrey; Loewenthal, William; Zimmermann, Stefan; Gaydos, Mark; Miller, Steven Alfred, Methods of manufacturing large-area sputtering targets using interlocking joints.
  30. Volchko, Scott Jeffrey; Loewenthal, William; Zimmermann, Stefan; Gaydos, Mark; Miller, Steven Alfred, Methods of manufacturing large-area sputtering targets using interlocking joints.
  31. Miller, Steven A.; Kumar, Prabhat; Wu, Rong-chein Richard; Sun, Shuwei; Zimmermann, Stefan; Schmidt-Park, Olaf, Methods of rejuvenating sputtering targets.
  32. Krisko, Annette J.; Myli, Kari B.; Burrows, Keith J., Photocatalytic coatings having improved low-maintenance properties.
  33. Ron D. Kohler ; Matthew S. Cooper, Physical vapor deposition target/backing plate assemblies.
  34. Michaluk, Christopher A.; Yuan, Shi; Maguire, James, Powder metallurgy sputtering targets and methods of producing same.
  35. Michaluk, Christopher A.; Yuan, Shi; Maguire, Jr., James D., Powder metallurgy sputtering targets and methods of producing same.
  36. Michaluk,Christopher A.; Yuan,Shi; Maguire,James, Powder metallurgy sputtering targets and methods of producing same.
  37. Wilhartitz, Peter; Sch?nauer, Stefan; Polcik, Peter, Process for manufacturing an evaporation source.
  38. Shekhter, Leonid N.; Miller, Steven A.; Haywiser, Leah F.; Wu, Rong-Chein R., Process for preparing metal powders having low oxygen content, powders so-produced and uses thereof.
  39. Zhang,Wenjun, Sputter target and method for fabricating sputter target including a plurality of materials.
  40. Brabender, Dennis M; Kokoschke, Jeffrey L, Sputtering apparatus including target mounting and control.
  41. Kachalov,Mikhail Y.; Wickersham, Jr.,Charles E., Sputtering target assemblies using resistance welding.
  42. Miyashita, Hirohito; Okabe, Takeo, Sputtering target producing few particles.
  43. Yamakoshi, Yasuhiro, Target formed of sintering-resistant material of high-melting point metal alloy, high-melting point metal silicide, high-melting point metal carbide, high-melting point metal nitride, or high-melting point metal boride, process for producing the target, assembly of the sputtering target-backing plate, and process for producing the same.
  44. Ueno Tomonori,JPX, Target of intermetallic compound with B2-ordered lattice structure, production method thereof and magnetic recording medium having B2-structured underlayer.
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