초록 ▼

A device for cathode sputtering for producing coatings on a substrate 27 by means of a sputtering cathode, which device can be introduced into a vacuum chamber and has magnets or ring magnets 9, 13 concentrically arranged in respect to the center axis 44 of the sputtering cathode, pole shoes 14 and

A device for cathode sputtering for producing coatings on a substrate 27 by means of a sputtering cathode, which device can be introduced into a vacuum chamber and has magnets or ring magnets 9, 13 concentrically arranged in respect to the center axis 44 of the sputtering cathode, pole shoes 14 and a target 8. The target has a front surface 41 with at least a surface portion which is inclined with respect to the back surface 40 of the target. In the area of the back surface 40 of the target at least one second, outer ring magnet 42 with a larger diameter is provided in addition to the inner ring magnets 9, 13.

대표청구항 ▼

[ What is claimed is:] [1.] A device mountable on a vacuum chamber for cathode sputtering for producing a coating on a substrate (27) when the substrate is placed in a coating position relative to said device, said device comprising:means defining a sputter cathode (5, 7, 21) having a center axis (4

[ What is claimed is:] [1.] A device mountable on a vacuum chamber for cathode sputtering for producing a coating on a substrate (27) when the substrate is placed in a coating position relative to said device, said device comprising:means defining a sputter cathode (5, 7, 21) having a center axis (44);a plurality of magnets (9, 13, 42) concentrically arranged with respect to the center axis:a pole shoe (14); anda target (8) constituting a source of sputtering material, said target having a back surface which faces away from the coating position and a front surface which faces toward the coating position and which has a first surface portion (41) that extends at an acute angle to a plane perpendicular to the center axis (44),wherein said plurality of magnets include an inner ring magnet (9), an outer ring magnet (42) and a third ring magnet (13), all disposed in a region facing said back surface of said target (8), each said ring magnet having a diameter, said outer ring magnet (42) having a larger diameter than said inner ring magnet, said third ring magnet (13) surrounding said inner and outer ring magnets (9,42) and said third ring magnet being located in alignment, in a direction parallel to the center axis (44), with said pole shoe, and further wherein said target has an exterior circumferential surface (55) and said magnets further include a four ring magnet (47) which surrounds the exterior circumferential surface of said target.