초록 ▼

A UV irradiation apparatus, which includes a UV lamp installed in a chamber for generating UV rays; a vacuum chuck installed below the UV lamp for supporting and moving a wafer; and, a reflector surrounding the UV lamp for concentrating UV rays on the vacuum chuck. The apparatus further includes hea

A UV irradiation apparatus, which includes a UV lamp installed in a chamber for generating UV rays; a vacuum chuck installed below the UV lamp for supporting and moving a wafer; and, a reflector surrounding the UV lamp for concentrating UV rays on the vacuum chuck. The apparatus further includes heating blocks for controlling the temperature at both sides of the vacuum chuck. Thus, it is possible to maintain an essentially constant temperature around the wafer supported by the vacuum chuck. As a result of the temperature control, when a protection tape attached to the front side of the wafer is irradiated with UV rays, an adhesive of the protective tape can be effectively degraded by a chemically reaction under optimum conditions, to thereby easily detach the protection tape from the wafer.

대표청구항 ▼

[ What is claimed is:] [1.] A UV irradiation apparatus comprising a light source set support in a chamber, a light source connected to said light source set support, a vacuum chuck installed below said light source for supporting a wafer having a protection tape attached to its front side by an adhe

[ What is claimed is:] [1.] A UV irradiation apparatus comprising a light source set support in a chamber, a light source connected to said light source set support, a vacuum chuck installed below said light source for supporting a wafer having a protection tape attached to its front side by an adhesive, and a reflector surrounding said light source and arranged to concentrate rays generated by said light source on said vacuum chuck; and said apparatus further comprising:an adjustable first means, installed between said chamber and said light source set support for moving said light source set support; andan adjustable second means, installed between said light source set support and said light source for moving said light source up and down, and providing for locating said light source at a desired height with respect to said vacuum chuck;wherein adjusting said first and second means provides for locating the light source at a desired position in said chamber.