초록 ▼

A device 1 for gripping and holding substrates 2 with one or several substrate holders 5 arranged in a vacuum chamber 4, 4', 4" and one or several displaceably arranged grippers 3, which can be displaced into a first position through the action of an operating pressure or against the action of a spr

A device 1 for gripping and holding substrates 2 with one or several substrate holders 5 arranged in a vacuum chamber 4, 4', 4" and one or several displaceably arranged grippers 3, which can be displaced into a first position through the action of an operating pressure or against the action of a spring 6, and into a second position through the action of a diaphragm 7, which can be exposed to a pneumatic pressure P.sub.a and/or to an operating element 8 cooperating with it, wherein the substrate 2 is held when the diaphragm is in a first position and the substrate 2 is released for being further transported when the diaphragm is in a second position. The diaphragm 7 is integrated into the vacuum chamber in such a way that in an operating position it is exposed to atmospheric pressure P.sub.a on the one side 9 and on the other side 10 to vacuum pressure P.sub.v, and in a second position is exposed to vacuum pressure P.sub.v on both sides.

대표청구항 ▼

[ We claim:] [1.] A device (1) for gripping and holding a substrate (2), said device comprising:a substrate holder (5) and substrate gripping means including at least one substrate gripper (3) displaceably mounted in said substrate holder, said substrate gripper being displaceable between a substrat

[ We claim:] [1.] A device (1) for gripping and holding a substrate (2), said device comprising:a substrate holder (5) and substrate gripping means including at least one substrate gripper (3) displaceably mounted in said substrate holder, said substrate gripper being displaceable between a substrate gripping position for gripping the substrate and a substrate release position for releasing the substrate;a vacuum chamber (4,4',4") enclosing a region at a vacuum pressure, P.sub.v ;a second chamber containing a region exposed to a pneumatic pressure, P.sub.a ; anda diaphragm (7) operatively associated with said substrate gripper so that said substrate gripper moves between said substrate gripping position and said substrate release position in response to movement of said diaphragm,wherein said diaphragm is interposed between said vacuum chamber and said second chamber, and the vacuum pressure, P.sub.v, is approximately constant.