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Molecular contamination control system 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • B65B-001/04
  • B65D-085/30
  • C23C-016/00
출원번호 US-0713396 (1996-09-13)
발명자 / 주소
  • Roberson
  • Jr. Glenn A.
  • Genco Robert M.
  • Eglinton Robert B.
  • Comer Wayland
  • Mundt Gregory K.
출원인 / 주소
  • Semifab Incorporated
대리인 / 주소
    Fulwider Patton Lee & Utecht, LLP
인용정보 피인용 횟수 : 58  인용 특허 : 24

초록

The system and method for molecular contamination control permits purging a SMIF pod to desired levels of relative humidity, oxygen, or particulates. The SMIF pod includes an inlet port including a check valve and filter assembly for supplying a clean, dry gaseous working fluid to maintain low level

대표청구항

[ What is claimed is:] [1.] A system for purging an environment for semiconductor manufacturing materials, to desired levels of relative humidity, oxygen and particulates, comprising:a modular isolation capsule having a housing defining a chamber for semiconductor manufacturing materials, said housi

이 특허에 인용된 특허 (24)

  1. Tullis Barclay J. (Palo Alto CA) Bailey John S. (Sunnyvale CA) Gunawardena D. R. (Union City CA) Kaempf Ulrich (Los Altos CA), Apparatus for automated cassette handling.
  2. Yamashita, Teppei; Murata, Masanao; Tanaka, Tsuyoshi; Morita, Teruya; Kawano, Hitoshi; Okuno, Atsushi; Tsuda, Masanori; Hayashi, Mitsuhiro, Closed container to be used in a clean room.
  3. Ludwig Joachim (Jena DEX), Device for transporting magazines for molding wafer-shaped objects.
  4. Goodman John B. (Chanhassen MN) Mikkelsen Kirk J. (Chanhassen MN), Evacuated wafer container.
  5. Kawano Hitoshi (Ise JPX) Yamashita Teppei (Ise JPX) Murata Masanao (Ise JPX) Tanaka Tsuyoshi (Ise JPX) Morita Teruya (Ise JPX) Okuno Atsushi (Ise JPX) Hayashi Mitsuhiro (Ise JPX) Nakamura Akio (Ise J, Gas purge unit for a portable container.
  6. Williams Randall S. (Chaska MN) Cheesebrow Nicholas T. (St. Paul MN), Mechanical interface wafer container.
  7. Freeman Dean W. (Garland TX) Davis Cecil J. (Greenville TX), Method and apparatus for cleaning integrated circuit wafers.
  8. Bonora Anthony C. (Menlo Park CA) Guerre Gilles (Les Loges en Josas CA FRX) Parikh Mihir (San Jose CA) Rosenquist Frederick T. (Redwood City CA) Jain Sudhir (Santa Clara CA), Method and apparatus for transferring articles between two controlled environments.
  9. Yates Cleon R. (Austin TX), Movable cantilevered purge system.
  10. , Particle-free dockable interface for integrated circuit processing.
  11. Logar Roger E. (San Jose CA), Particulate-free epitaxial process.
  12. Logar Roger E. (San Jose CA), Particulate-free epitaxial process.
  13. Doan Trung T. (Boise ID) Lowrey Tyler A. (Boise ID), Process for preventing a native oxide from forming on the surface of a semiconductor material and integrated circuit cap.
  14. Kanegae Masatomo (Tokyo JPX) Kogano Takayoshi (Tokyo JPX) Ito Fumio (Tokyo JPX), Processing apparatus.
  15. Ushikawa Harunori (Sagamihara JPX) Tago Kenji (Kofu JPX), Processing apparatus.
  16. Parikh Mihir (San Jose CA) Bonora Anthony C. (Menlo Park CA), Sealable transportable container having a particle filtering system.
  17. Bonora Anthony C. (Menlo Park CA) Rosenquist Frederick T. (Redwood City CA) Jain Sudhir (Milpitas CA) Davis Mark R. (Campbell CA), Sealable transportable container having improved liner.
  18. Bonora Anthony C. (Menlo Park CA) Wartenbergh Robert P. (Woodside CA) Jain Sudhir (Fremont CA) Davis Mark R. (Mountain View CA), Sealable transportable container having improved liner.
  19. Bonora Anthony C. ; Rosenquist Frederick T. ; Jain Sudhir ; Davis Mark R., Sealable, transportable container having a breather assembly.
  20. Shimada Masakazu,JPX, Semiconductor fabricating apparatus, method for controlling oxygen concentration within load-lock chamber and method fo.
  21. Grohrock Peter (Hoehenkirchen DEX), Transport container with an interchangeable inside container.
  22. Inoue Yosuke (Ibaraki JPX) Suzuki Takaya (Katsuta JPX) Okamura Masahiro (Tokyo JPX) Akiyama Noboru (Hitachi JPX) Fujita Masato (Yamanashi JPX) Tochikubo Hiroo (Tokyo JPX) Iida Shinya (Tama JPX), Vapor phase growth on semiconductor wafers.
  23. Miyazaki Shinji (Yokohama JPX) Mikata Yuichi (Kawasaki JPX) Moriya Takahiko (Yokohama JPX) Niino Reiji (Kofu JPX) Nishimura Motohiko (Yamanashi JPX), Vertically oriented CVD apparatus including gas inlet tube having gas injection holes.
  24. Takanabe Eiichiro (Kanagawa JPX), Wafers transferring method in vertical type heat treatment apparatus and the vertical type heat treatment apparatus prov.

이 특허를 인용한 특허 (58)

  1. Goodwin,William M.; Kishkovich,Oleg P.; Grayfer,Anatoly, Air handling and chemical filtration system and method.
  2. Liao, Si-Wen; Xu, Jia-Wei; Lin, Mao-Cheng; Wu, Chien-Cheng; Wang, Lan-Hai; Liu, Ding-I; Lo, Fu-Shun, Apparatus and operation method thereof.
  3. Bernard, Roland; Kambara, Hisanori; Rival, Jean-Luc; Le Guet, Catherine, Apparatus for transporting substrates under a controlled atmosphere.
  4. Pease, John R., Argon gas level controller.
  5. Takahara, Masahiro; Ueda, Toshihito, Article storage facility and article storage method.
  6. Takahara, Masahiro; Ueda, Toshihito, Article storage facility and article storage method.
  7. Kim, Ki-Hyun; Im, Ki-Vin; Choi, Hoon-Sang; Han, Moon-Hyeong, Atomic layer deposition apparatus.
  8. Kim, Ki-Hyun; Im, Ki-Vin; Choi, Hoon-Sang; Han, Moon-Hyeong, Atomic layer deposition apparatus.
  9. Fosnight, William; Banner, Isaac Sarek; Miner, Stephen Bradley, Automated mechanical handling systems for integrated circuit fabrication, system computers programmed for use therein, and methods of handling a wafer carrier having an inlet port and an outlet port.
  10. Sato, Yoshinori, Board storage container and check valve.
  11. Babbs, Daniel; Fosnight, William, Carrier gas system and coupling substrate carrier to a loadport.
  12. Miyajima, Toshihiko; Okabe, Tsutomu, Clean box, clean transfer method and system.
  13. Miyajima, Toshihiko; Okabe, Tsutomu, Clean box, clean transfer method and system.
  14. Yotsumoto Tadashi,JPX ; Muguruma Terumi,JPX ; Yoshikawa Noriaki,JPX ; Kuroda Yuichi,JPX, Clean storage equipment for substrates and method of storing substrates.
  15. Hu, Tain-Chen; More, Ming Te; Lee, Wei William, Container flush and gas charge system and method.
  16. Morihana, Toshimitsu; Matsumoto, Yuki; Natsume, Mitsuo, End structure of nozzle, purging device, and load port.
  17. Reynolds Gerald D. ; Gallagher Gary M. ; Burns John ; Smith Mark V., Filter cartridge assembly for a gas purging system.
  18. Aggarwal, Ravinder, Front opening unified pod.
  19. Ku, Chen-Wei; Lu, Shao-Wei; Chiu, Ming-Long, Front opening unified pod disposed with purgeable supporting module.
  20. Wodjenski,Michael J.; Arno,Jose I., Gas cabinet including integrated effluent scrubber.
  21. Wang, Sheng-Hung; Chiu, Ming-Long, Gas filling apparatus.
  22. Wang, Sheng-Hung; Chiu, Ming-Long, Gas filling apparatus.
  23. Jonnalagadda, Rajanikant; Miller, Brian J., Gas port sealing for CVD/CVI furnace hearth plates.
  24. Jonnalagadda, Rajanikant; Miller, Brian J., Gas port sealing for CVD/CVI furnace hearth plates.
  25. Zhao, Jun; Dornfest, Charles; Chang, Frank; Jin, Xiaoliang; Tang, Po, High temperature filter for CVD apparatus.
  26. Takahara, Masahiro; Ueda, Toshihito, Inactive gas introducing facility and inactive gas introducing method.
  27. Donohoe, Kevin G., Liner for use in processing chamber.
  28. Donohoe,Kevin G., Liner for use in processing chamber.
  29. Kevin G. Donohoe, Liner for use in processing chamber.
  30. Irino,Kiyoshi; Hikazutani,Ken ichi; Kawamura,Tatsuya; Sugizaki,Taro; Ohkubo,Satoshi; Nakanishi,Toshiro; Takasaki,Kanetake, Manufacture system for semiconductor device with thin gate insulating film.
  31. Huang Hsin-Chieh,TWX ; Wann Yeh-Jye,TWX ; Kuo Hsi-Shan,TWX, Method and apparatus for storing wafers without moisture absorption.
  32. Lowrance, Robert B.; Englhardt, Eric Andrew; Rice, Michael R.; Shah, Vinay; Koshti, Sushant S.; Hudgens, Jeffrey C., Methods and apparatus for a band to band transfer module.
  33. Fosnight William J., Modular SMIF pod breather, adsorbent, and purge cartridges.
  34. Fosnight,William J., Modular SMIF pod breather, adsorbent, and purge cartridges.
  35. Glenn A. Roberson, Jr. ; Robert M. Genco ; Robert B. Eglinton ; Wayland Comer ; Gregory K. Mundt, Molecular contamination control system.
  36. Roberson ; Jr. Glenn A. ; Genco Robert M. ; Eglinton Robert B. ; Comer Wayland ; Mundt Gregory K., Molecular contamination control system.
  37. Roberson ; Jr. Glenn A. ; Genco Robert M. ; Eglinton Robert B. ; Comer Wayland ; Mundt Gregory K., Molecular contamination control system.
  38. Chang,Chih Kang, Nitrogen-filling system.
  39. Fosnight William J. ; Shenk Joshua W., Passively activated valve for carrier purging.
  40. Emoto, Jun; Iwamoto, Tadamasa; Miyajima, Toshihiko, Purge device and load port apparatus including the same.
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  42. Lu, Pao-Yi; Lin, Tien-Jui, Reticle pod having gas guiding apparatus.
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  48. Kishkovich, Oleg P.; Gabarre, Xavier; Goodwin, William M.; Lo, James; Scoggins, Troy, System for purging reticle storage.
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  51. Chou, You-Hua; Huang, Chih-Wei; Chuang, Kuo-Sheng, Ultra-low oxygen and humility loadport and stocker system.
  52. Fosnight, William J.; Waite, Stephanie; Miner, Stephen B.; Robinson, John, Wafer carrier purge apparatuses, automated mechanical handling systems including the same, and methods of handling a wafer carrier during integrated circuit fabrication.
  53. Fosnight, William J.; Waite, Stephanie; Miner, Stephen B.; Robinson, John, Wafer carrier purge apparatuses, automated mechanical handling systems including the same, and methods of handling a wafer carrier during integrated circuit fabrication.
  54. Ku, Chen-Wei; Lu, Shao-Wei; Chiu, Ming-Long, Wafer container with at least one purgeable supporting module having a long slot.
  55. Chiu, Ming-Long; Hung, Kuo-Chun, Wafer container with purgeable supporting module.
  56. Chiu, Ming-Long; Hung, Kuo-Chun; Ku, Chen-Wei; Sheng, Jain-Ping; Hou, Yi-Liang, Wafer container with purgeable supporting module.
  57. Choi, In-Ho; Sim, Young-Suk, Wafer storage apparatus having gas charging portions and semiconductor manufacturing apparatus using the same.
  58. Zhang, Ying; Cheng, Tien-Chih; Suen, Shu-Huei; Liu, Yu-Cheng; Chiou, Jian-Huah, Wafer transfer pod for reducing wafer particulate contamination.
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