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Pressure-swing absorption based cleaning methods and systems 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • B08B-003/04
출원번호 US-0709656 (1996-09-09)
발명자 / 주소
  • Sauer Richard A.
  • Hubert Jean-Luc
  • Connors Robert W.
출원인 / 주소
  • Air Liquide America Corporation
대리인 / 주소
    Burns, Doane, Swecker & Mathis
인용정보 피인용 횟수 : 65  인용 특허 : 39

초록 ▼

The cleaning process according to the present invention includes three main steps including supercritical extraction of soluble contaminants with a solvent composition, subcritical removal of particulate material with agitation, and solvent recovery and recycle. The supercritical extraction of solub

대표청구항 ▼

[ What is claimed is:] [1.] A method of cleaning articles by pressure swing absorption with a solvent composition comprising a supercritical fluid, the method comprising:loading a pressure vessel with articles to be cleaned;pressurizing and heating the solvent composition to a supercritical state of

이 특허에 인용된 특허 (39)

  1. VanEenam Donald N. (Des Peres MO), Aqueous cleaner/degreaser compositions.
    상세보기
  2. VanEenam Donald N. (Des Peres MO), Aqueous degreaser compositions containing an organic solvent and a solubilizing coupler.
    상세보기
  3. Chao Sidney C. (Manhattan Beach CA) Purer Edna M. (Los Angeles CA) Stanford Thomas B. (San Pedro CA) Townsend Carl W. (Los Angeles CA), Cleaning by cavitation in liquefied gas.
    상세보기
  4. Heffernan Mary B. (Encinitas CA), Cleaning of polyurethane foam reservoir.
    상세보기
  5. Jackson David P. (608 Ruberta Glendale CA 91201), Cleaning process using microwave energy and centrifugation in combination with dense fluids.
    상세보기
  6. Jackson David P. (Saugus CA) Buck Orval F. (Santa Monica CA), Cleaning process using phase shifting of dense phase gases.
    상세보기
  7. Mitchell James D. (Alamo CA) Alvarez Vincent E. (Livermore CA) Carty Daniel T. (Danville CA) Latham James R. (Livermore CA), Cleaning through perhydrolysis conducted in dense fluid medium.
    상세보기
  8. Jackson David P. (Saugus CA) Buck Orval F. (Santa Monica CA), Coating process using dense phase gas.
    상세보기
  9. Palen Edward J. (Los Angeles CA), Continuous operation supercritical fluid treatment process and system.
    상세보기
  10. Jackson David P. (608 Ruberta Glendale CA 91201), Dense fluid microwave centrifuge.
    상세보기
  11. Jackson David P. (Saugus CA), Dense fluid photochemical process for liquid substrate treatment.
    상세보기
  12. Jackson David P. (Saugus CA), Dense fluid photochemical process for substrate treatment.
    상세보기
  13. Jackson David P. (Saugus CA), Dense phase gas photochemical process for substrate treatment.
    상세보기
  14. Chao Sidney C. (Manhattan Beach CA) Stanford Thomas B. (San Pedro CA) Purer Edna M. (Los Angeles CA) Wilkerson Angela Y. (Inglewood CA), Dry-cleaning of garments using liquid carbon dioxide under agitation as cleaning medium.
    상세보기
  15. Maffei Raymond L. (639 Front St. San Francisco CA 94111), Extraction and cleaning processes.
    상세보기
  16. Bossmann Adelgund (Krefeld DEX) Schollmeyer Eckard (Kempen DEX), Fiber, filament, yarn and/or flat articles and/or nonwoven material containing these, as well as a process for producing.
    상세보기
  17. Ng Mark J. (Pleasant Hill CA) Maeda Bruce T. (San Jose CA), Halohydrocarbon recovery process.
    상세보기
  18. Cherry Roger L. (2636 Maria Ct. West Linn OR 97068), High-purity cleaning system, method, and apparatus.
    상세보기
  19. Renaud Jean (Bougival FRX) Monique Seugnet (Colombes FRX), Laundry pre-spotter composition and method of using same.
    상세보기
  20. Dewees Thomas G. (Pleasanton CA) Knafelc Frank M. (Lafayette CA) Mitchell James D. (Alamo CA) Taylor R. Gregory (Pleasanton CA) Iliff Robert J. (Oakley CA) Carty Daniel T. (Danville CA) Latham James , Liquid/supercritical carbon dioxide dry cleaning system.
    상세보기
  21. Iliff Robert J. (Oakley CA) Mitchell James D. (Alamo CA) Carty Daniel T. (Danville CA) Latham James R. (Livermore CA) Kong Stephen B. (Alameda CA), Liquid/supercritical carbon dioxide/dry cleaning system.
    상세보기
  22. Mitchell James D. (Alamo CA) Carty Daniel T. (Danville CA) Latham James R. (Livermore CA) Kong Stephen B. (Alameda CA) Iliff Robert J. (Oakley CA), Liquid/supercritical cleaning with decreased polymer damage.
    상세보기
  23. Baker Richard W. (Palo Alto CA) Wijmans Johannes G. (Menlo Park CA), Membrane fractionation process.
    상세보기
  24. Mitchell James D. (Alamo CA) Carty Daniel T. (Danville CA) Latham James R. (Livermore CA), Method and composition using densified carbon dioxide and cleaning adjunct to clean fabrics.
    상세보기
  25. Watanabe Masahiro (Yokohama JPX) Otake Mitsuyoshi (Yokohama JPX) Hamano Megumi (Yokohama JPX) Takizawa Yoshiharu (Hitachi JPX), Method for cleaning solid surface with a mixture of pure water and calcium carbonate particles.
    상세보기
  26. Ringens Werner (Krefeld-Forstwald DEX) Schmitz Franz J. (Krefeld DEX) Schollmeyer Eckhard (Kempen DEX), Method of measuring the velocity and/or length of endless webs of textile material and apparatus for carrying out the me.
    상세보기
  27. Jackson David P. (Saugus CA), Method of removing organic flux using peroxide composition.
    상세보기
  28. Hoy Kenneth L. (St. Albans WV) Nielsen Kenneth A. (Charleston WV), Methods for cleaning apparatus using compressed fluids.
    상세보기
  29. Jackson David P. (Saugus CA), Peroxide composition for removing organic contaminants and method of using same.
    상세보기
  30. Wetmore Paula M. (5 S. Webster St. Bradford MA 01835) Krukonis Val J. (287 Emerson Rd. Lexington MA 02173) Coffey Michael P. (5 Blood Rd. Townsend MA 01469), Pressure pulse cleaning.
    상세보기
  31. Denissenko Serge (Migne-Auxances FRX) Rossard Jean-Claude (Migne-Auxances FRX), Process for cleaning clothes at home.
    상세보기
  32. Saus Wolfgang (Grevenbroich DEX) Knittel Dierk (Krefeld DEX) Schollmeyer Eckhard (Kempen DEX) Buschmann Hans-Jrgen (Krefeld DEX), Process for dyeing hydrophobic textile material with disperse dyes from supercritical CO2: reducing the pr.
    상세보기
  33. Jackson David P. (22328 W. Barcotta Dr. Santa Clarita CA 91350) Lepp Michael A. (22334 W. Barcotta Dr. Santa Clarita CA 91350), Processes for cleaning, sterilizing, and implanting materials using high energy dense fluids.
    상세보기
  34. Berneburg, Philip L.; Krukonis, Val J., Processing of carbon/carbon composites using supercritical fluid technology.
    상세보기
  35. Nagaoka Katsuro (Kanagawa JPX), Silver halide photographic material.
    상세보기
  36. Chao Sidney C. (Manhattan Beach CA) Stanford ; Jr. Thomas B. (San Pedro CA) Palen Edward J. (Marina Del Rey CA) Lee Chris (Los Angeles CA), Supercritical fluid cleaning apparatus without pressure vessel.
    상세보기
  37. Capella Joseph A. (Crystal River FL) Fowler David E. (Gainesville FL), Tool decontamination apparatus.
    상세보기
  38. Kanazawa Masao (6-10 ; Nakakagaya 4-chome Suminoe-ku ; Osaka JPX) Ooka Yukio (Toyonaka JPX), Ultrasonic washing machine.
    상세보기
  39. Tanaka Masato (Hikone JPX) Nishizawa Hisao (Hikone JPX) Hirai Nobuyuki (Hikone JPX) Shinbara Kaoru (Hikone JPX) Yoshioka Hitoshi (Hikone JPX), Wafer cleaning method and apparatus therefor.
    상세보기

이 특허를 인용한 특허 (65)

  1. Uhlin, G?ran, Apparatus for cleaning textiles with a densified liquid treatment gas.
    상세보기
  2. Marshall, Mary C.; Franjione, John G.; Freitas, Christopher J.; Roberds, William T.; Pollard, Gordon D.; Blake, Jill, Apparatus for contaminant removal using natural convection flow and changes in solubility concentrations by temperature.
    상세보기
  3. Biberger, Maximilian Albert; Layman, Frederick Paul; Sutton, Thomas Robert, Apparatus for supercritical processing of a workpiece.
    상세보기
  4. Biberger, Maximilian Albert; Layman, Frederick Paul; Sutton, Thomas Robert, Apparatus for supercritical processing of multiple workpieces.
    상세보기
  5. Leitch, Kelly; Hartigan, Gavin; D'Orazio, Robert, CO2 recovery process for supercritical extraction.
    상세보기
  6. Preston, A. Duane; Turner, Jon R.; Svoboda, Charles, Carbon dioxide dry cleaning system.
    상세보기
  7. Jones,William Dale, Control of fluid flow in the processing of an object with a fluid.
    상세보기
  8. DeYoung,James P.; McClain,James B.; Gross,Stephen M., Detergent injection systems and methods for carbon dioxide microelectronic substrate processing systems.
    상세보기
  9. Arena Foster,Chantal J.; Awtrey,Allan Wendell; Ryza,Nicholas Alan; Schilling,Paul, Developing photoresist with supercritical fluid and developer.
    상세보기
  10. Arena-Foster, Chantal J.; Awtrey, Allan Wendell; Ryza, Nicholas Alan; Schilling, Paul, Developing photoresist with supercritical fluid and developer.
    상세보기
  11. Murphy Dennis Stephen, Dry cleaning system using densified carbon dioxide and a functionalized surfactant.
    상세보기
  12. Jureller Sharon Harriott ; Kerschner Judith Lynne ; Murphy Dennis Stephen, Dry cleaning system using densified carbon dioxide and a surfactant adjunct.
    상세보기
  13. Jureller Sharon Harriott ; Kerschner Judith Lynne ; Murphy Dennis Stephen, Dry cleaning system using densified carbon dioxide and a surfactant adjunct containing a CO.sub.2 -philic and a CO.sub.2 -phobic group.
    상세보기
  14. Sharon Harriott Jureller ; Judith Lynne Kerschner ; Dennis Stephen Murphy, Dry cleaning system with low HLB surfactant.
    상세보기
  15. Arena-Foster, Chantal J.; Awtrey, Allan Wendell; Ryza, Nicholas Alan; Schilling, Paul, Drying resist with a solvent bath and supercritical CO2.
    상세보기
  16. Kuo, Tzu-Chen, Fluid driven agitator used in densified gas cleaning system.
    상세보기
  17. Sheydayi,Alexei; Sutton,Thomas, Gate valve for plus-atmospheric pressure semiconductor process vessels.
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  18. Sutton, Thomas R.; Biberger, Maximilan A., High pressure compatible vacuum chuck for semiconductor wafer including lift mechanism.
    상세보기
  19. Jones, William D., High pressure fourier transform infrared cell.
    상세보기
  20. Biberger, Maximilian A.; Layman, Frederick Paul; Sutton, Thomas Robert, High pressure processing chamber for semiconductor substrate.
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  21. Biberger,Maximilian A.; Layman,Frederick Paul; Sutton,Thomas Robert, High pressure processing chamber for semiconductor substrate.
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  22. Jones,William Dale, High-pressure processing chamber for a semiconductor wafer.
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  23. Jones,William Dale, High-pressure processing chamber for a semiconductor wafer.
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  24. Sheydayi,Alexei, Method and apparatus for clamping a substrate in a high pressure processing system.
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  25. Goshi,Gentaro, Method and apparatus for cooling motor bearings of a high pressure pump.
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  26. Biberger, Maximilian Albert; Layman, Frederick Paul; Sutton, Thomas Robert, Method and apparatus for supercritical processing of multiple workpieces.
    상세보기
  27. Parent,Wayne M.; Goshi,Gentaro, Method and system for cooling a pump.
    상세보기
  28. Parent,Wayne M., Method and system for determining flow conditions in a high pressure processing system.
    상세보기
  29. Parent, Wayne M.; Geshell, Dan R., Method and system for passivating a processing chamber.
    상세보기
  30. Hansen,Brandon; Lowe,Marie, Method and system for treating a substrate with a high pressure fluid using fluorosilicic acid.
    상세보기
  31. Uhlin, G?ran, Method for cleaning textiles with a densified liquid treatment gas.
    상세보기
  32. Kawamura,Kohei; Asano,Akira; Miyatani,Koutarou; Hillman,Joseph T.; Palmer,Bentley, Method for supercritical carbon dioxide processing of fluoro-carbon films.
    상세보기
  33. Biberger, Maximilian Albert; Layman, Frederick Paul; Sutton, Thomas Robert, Method for supercritical processing of multiple workpieces.
    상세보기
  34. Biberger, Maximilian A.; Schilling, Paul E., Method of depositing metal film and metal deposition cluster tool including supercritical drying/cleaning module.
    상세보기
  35. Biberger,Maximilian A.; Schilling,Paul E., Method of depositing metal film and metal deposition cluster tool including supercritical drying/cleaning module.
    상세보기
  36. Jureller Sharon Harriott ; Kerschner Judith Lynne, Method of dry cleaning using densified carbon dioxide and a surfactant.
    상세보기
  37. Hillman,Joseph, Method of inhibiting copper corrosion during supercritical COcleaning.
    상세보기
  38. Toma,Dorel Ioan; Schilling,Paul, Method of passivating of low dielectric materials in wafer processing.
    상세보기
  39. Biberger,Maximilian Albert; Layman,Frederick Paul; Sutton,Thomas Robert, Method of supercritical processing of a workpiece.
    상세보기
  40. Schilling,Paul, Method of treating a composite spin-on glass/anti-reflective material prior to cleaning.
    상세보기
  41. Schilling,Paul, Method of treatment of porous dielectric films to reduce damage during cleaning.
    상세보기
  42. Sheydayi,Alexei, Non-contact shuttle valve for flow diversion in high pressure systems.
    상세보기
  43. Sheydayi,Alexei, Pressure energized pressure vessel opening and closing device and method of providing therefor.
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  44. Wuester,Christopher D., Process flow thermocouple.
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  45. Mullee,William H.; de Leeuwe,Marc; Roberson, Jr.,Glenn A.; Palmer,Bentley J., Removal of CMP and post-CMP residue from semiconductors using supercritical carbon dioxide process.
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  46. Mullee, William H.; de Leeuwe, Marc; Roberson, Jr., Glenn A., Removal of CMP residue from semiconductor substrate using supercritical carbon dioxide process.
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  47. Mullee William H. ; de Leeuwe Marc ; Roberson ; Jr. Glenn A., Removal of CMP residue from semiconductors using supercritical carbon dioxide process.
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  48. Bertram, Ronald Thomas; Scott, Douglas Michael, Removal of contaminants from a fluid.
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  49. Mullee, William H., Removal of photoresist and photoresist residue from semiconductors using supercritical carbon dioxide process.
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  50. Mullee, William H., Removal of photoresist and photoresist residue from semiconductors using supercritical carbon dioxide process.
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  51. William H. Mullee ; Maximilian A. Biberger ; Paul E. Schilling, Removal of photoresist and residue from substrate using supercritical carbon dioxide process.
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  52. Koch Robert, Removal of polishing residue from substrate using supercritical fluid process.
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  53. Mullee William H., Removal of resist or residue from semiconductors using supercritical carbon dioxide.
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  54. Lawandy, Nabil, Supercritical fluid cleaning of banknotes and secure documents.
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  55. Lawandy, Nabil, Supercritical fluid cleaning of banknotes and secure documents.
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  56. Lawandy, Nabil M., Supercritical fluid cleaning of banknotes and secure documents.
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  57. Lawandy, Nabil M., Supercritical fluid cleaning of banknotes and secure documents.
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  58. Chandra, Mohan; Mount, David J.; Costantini, Michael A.; Moritz, Heiko D.; Jafri, Ijaz; Boyd, Jim; Heathwaite, Rick M., Supercritical fluid cleaning process for precision surfaces.
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  59. Joyce, Patrick C.; Tipton, Adrianne; Shrinivasan, Krishnan; Hess, Dennis W.; Myneni, Satyanarayana; Levitin, Galit, Supercritical solutions for cleaning photoresist and post-etch residue from low-k materials.
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  60. Gale,Glenn; Hillman,Joseph T.; Jacobson,Gunilla; Palmer,Bentley, System and method for processing a substrate using supercritical carbon dioxide processing.
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  61. Jacobson,Gunilla; Yellowaga,Deborah, Treatment of a dielectric layer using supercritical CO.
    상세보기
  62. Kevwitch, Robert, Treatment of substrate using functionalizing agent in supercritical carbon dioxide.
    상세보기
  63. Shibano,Yoshihide, Ultrasonic washing method for clothes.
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  64. Sheydayi,Alexei, Vacuum chuck utilizing sintered material and method of providing thereof.
    상세보기
  65. Brink Christopher J. ; McChesney Eddie J., Vacuum extraction cleaning system.
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