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Pedestal with self retaining sealing ring for semiconductor device etching system 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • C23F-001/02
출원번호 US-0963845 (1997-11-04)
우선권정보 KR-0052147 (1996-11-05)
발명자 / 주소
  • Kim Sang-ho,KRX
  • Lim Tae-hyung,KRX
출원인 / 주소
  • Samsung Electronics Co., Ltd., KRX
대리인 / 주소
    Myers, Bigel, Sibley & Sajovec
인용정보 피인용 횟수 : 137  인용 특허 : 2

초록 ▼

A pedestal for a semiconductor device etching system includes a pedestal body having a circumferential recess. The recess includes a cutaway area extending radially inwardly therefrom. The pedestal further includes a sealing ring configured to mate with the pedestal body recess. The sealing ring inc

대표청구항 ▼

[ That which is claimed is:] [1.] A pedestal for a semiconductor device etching system, said pedestal comprising:a pedestal body having a circumferential recess, said recess including a cutaway area extending radially inwardly therefrom; anda sealing ring configured to mate with said pedestal body r

이 특허에 인용된 특허 (2)

  1. Osada Tomoaki (Tokyo JPX) Shirai Yasuyuki (Tokyo JPX), Mechanism and method for mechanically removing a substrate.
    상세보기
  2. Sumnitsch Franz (Universitatsstrasse 25 A-9020 Klagenfurt (Karnten) ATX), Support for disk-shaped articles using the Bernoulli principle.
    상세보기

이 특허를 인용한 특허 (137)

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  38. Korolik, Mikhail; Ingle, Nitin; Kioussis, Dimitri, Germanium etching systems and methods.
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  40. Tran, Toan Q.; Malik, Sultan; Lubomirsky, Dmitry; Roy, Shambhu N.; Kobayashi, Satoru; Cho, Tae Seung; Park, Soonam; Venkataraman, Shankar, High temperature chuck for plasma processing systems.
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  46. Purayath, Vinod R.; Thakur, Randhir; Venkataraman, Shankar; Ingle, Nitin K., Integrated oxide recess and floating gate fin trimming.
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  47. Sapre, Kedar; Ingle, Nitin; Tang, Jing, Intrench profile.
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  55. Zhang, Jingchun; Wang, Anchuan; Ingle, Nitin, Methods for etch of SiN films.
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  56. Zhang, Jingchun; Wang, Anchuan; Ingle, Nitin, Methods for etch of metal and metal-oxide films.
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  73. Choi, Tom; Ko, Jungmin; Kang, Sean, Poly directional etch by oxidation.
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