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Chemical vapor deposition of fluorocarbon polymer thin films 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • C08F-002/46
출원번호 US-0643721 (1996-05-06)
발명자 / 주소
  • Gleason Karen K.
  • Limb Scott J.H.
  • Gleason Edward F.
  • Sawin Herbert H.
  • Edell David J.
출원인 / 주소
  • Massachusetts Institute of Technology
대리인 / 주소
    Lober
인용정보 피인용 횟수 : 108  인용 특허 : 6

초록

Provided are methods for forming a fluorocarbon polymer thin film on the surface of a structure. In one method, a monomer gas is exposed to a source of heat having a temperature sufficient to pyrolyze the monomer gas and produce a source of reactive CF.sub.2 species in the vicinity of the structure

대표청구항

[ We claim:] [1.] A method for forming a fluorocarbon polymer thin film on a surface of a structure, comprising the steps of:exposing a monomer gas to a source of heat having a temperature sufficient to pyrolyze the monomer gas, the monomer gas selected to produce upon pyrolysis a source of reactive

이 특허에 인용된 특허 (6)

  1. Spiro Clifford L. (Niskayuna NY), Carbon fluoride compositions.
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  4. Nguyen Thao N. (Katonah NY) Oehrlein Gottlieb S. (Yorktown Heights NY) Weinberg Zeev A. (White Plains NY), Plasma deposition of fluorocarbon.
  5. Nguyen Thao N. (Katonah NY) Oehrlein Gottlieb S. (Yorktown Heights NY) Weinberg Zeev A. (White Plains NY), Plasma deposition of fluorocarbon.
  6. Nichols Michael F. (Columbia MO) Hahn Allen W. (Columbia MO), Process for applying a composite insulative coating to a substrate.

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