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Apparatus and methods for inspecting wafers and masks using multiple charged-particle beams

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • H01J-037/28
  • G01N-023/22
출원번호 US-0855736 (1997-05-09)
우선권정보 JP-0289786 (1996-10-31)
발명자 / 주소
  • Nakasuji Mamoru,JPX
출원인 / 주소
  • Nikon Corporation, JPX
대리인 / 주소
    Klarquist Sparkman Campbell Leigh & Whinston, LLP
인용정보 피인용 횟수 : 107  인용 특허 : 1

초록

Apparatus and methods are disclosed for inspecting masks, reticles, and other patterned samples used in microlithography. The apparatus and methods are useful for detecting, at high speed and high accuracy, any defects in the pattern defined by the sample. Multiple charged-particle beams (e.g., elec

대표청구항

[ What is claimed is:] [1.] An apparatus for detecting defects in a pattern on a sample, comprising:(a) a charged-particle-beam optical system for irradiating multiple charged-particle beams on respective loci in an irradiation region of a surface of the sample so as to cause release of secondary ch

이 특허에 인용된 특허 (1)

  1. Honjo Ichiro (Kawasaki JPX) Sugishima Kenji (Kawasaki JPX) Yamabe Masaki (Kawasaki JPX), Pattern inspection apparatus and electron beam apparatus.

이 특허를 인용한 특허 (107)

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