초록 ▼

A method of producing a fused silica glass by thermally converting a polymethylsiloxane precursor, the lens transmitting ultraviolet radiation at wavelengths below 300 nm. without undergoing a marked absorption transition, the lens so produced, and a microlithography system employing a lens of such

A method of producing a fused silica glass by thermally converting a polymethylsiloxane precursor, the lens transmitting ultraviolet radiation at wavelengths below 300 nm. without undergoing a marked absorption transition, the lens so produced, and a microlithography system employing a lens of such glass.

대표청구항 ▼

[ We claim:] [1.] A method of producing a fused silica lens that transmits ultraviolet radiation having a wavelength below 300 nm. with controlled optical damage and inhibited red fluorescence during such transmission, the method comprising thermally converting a polymethylsiloxane precursor to fuse

[ We claim:] [1.] A method of producing a fused silica lens that transmits ultraviolet radiation having a wavelength below 300 nm. with controlled optical damage and inhibited red fluorescence during such transmission, the method comprising thermally converting a polymethylsiloxane precursor to fused silica particles, consolidating the particles into a body, and forming from the fused silica body an optical lens that transmits ultraviolet radiation, that incurs optical damage up to a certain level when transmitting radiation below a wavelength of 300 nm., that does not incur an absorption transition at any level, that becomes saturated and incurs essentially no significant further damage, and in which the red fluorescence diminishes while further transmitting such radiation.