초록

The synthesized wave electric field is utilized for controlling progress of dissociation of the process gas in the plasma.

대표청구항 ▼

[ What is claimed is:] [1.] A plasma generating apparatus comprising:a container defining a hermetic process room;an exhaust means for exhausting an interior of the process room and setting the interior of said process room to a vacuum;a supply for supplying a process gas into said process room;firs

[ What is claimed is:] [1.] A plasma generating apparatus comprising:a container defining a hermetic process room;an exhaust means for exhausting an interior of the process room and setting the interior of said process room to a vacuum;a supply for supplying a process gas into said process room;first and second coils for generating in said process room an electric field for converting the process gas into a plasma; andfirst and second RF power supplies for respectively applying first and second RF powers to said first and second coils, the first and second RF powers respectively having first and second frequencies not less than 2 MHZ and different from each other, a difference between the first and second frequencies being set such that mutual interference of the first and second RF powers generates a synthesized wave having a periodically changing amplitude to generate in said process room a synthesized wave electric field to which ions in the plasma can follow, and the synthesized wave electric field being utilized for controlling progress of dissociation of the process gas in the plasma, wherein said first coil and said first RF power supply form a first parallel resonance circuit together with a capacitor, and said second coil and second RF power supply form a second parallel resonance circuit together with a capacitor.