초록 ▼

An exhaust system for a semiconductor etcher that utilizes corrosive gas. Specifically, the present invention exhausts residual corrosive gas from the exit load lock compartment of a semiconductor etcher. For instance, at the completion of the etching process of semiconductor wafers, the exit load l

An exhaust system for a semiconductor etcher that utilizes corrosive gas. Specifically, the present invention exhausts residual corrosive gas from the exit load lock compartment of a semiconductor etcher. For instance, at the completion of the etching process of semiconductor wafers, the exit load lock compartment of an etcher contains the etched wafers along with residual corrosive gas. When the exit load lock compartment pressure returns to about 1 atmosphere, the residual corrosive gas begins to escape. Within an embodiment of the present invention, an exhaust box is adjacently located to the exit load lock compartment to exhaust the residual corrosive gas from it. The exhaust box is a specifically shaped hollow box that has an intake slot and an exhaust aperture. Two edges that partly form the intake slot are parallel to the outer side edge of the exit load lock compartment when its door is open. The intake slot length matches the outer side edge length of the exit load lock compartment. An exhaust blower provides a suction that draws the residual corrosive gas from the exit load lock compartment through the intake slot, through the interior of the exhaust box, through the exhaust aperture, through an exhaust pipe and outside of the clean room where the etcher is located. In so doing, the present invention substantially removes the residual corrosive gas from the exit load lock compartment, thereby preventing it from slowly corroding the components of the semiconductor etcher.

대표청구항 ▼

[ What is claimed is:] [1.] A system for capturing residual corrosive gas from an exit load lock compartment of a semiconductor etcher located within a clean room, said system comprising:an exhaust box having an intake slot, an exhaust aperture and a hollow interior space, said intake slot adjacentl

[ What is claimed is:] [1.] A system for capturing residual corrosive gas from an exit load lock compartment of a semiconductor etcher located within a clean room, said system comprising:an exhaust box having an intake slot, an exhaust aperture and a hollow interior space, said intake slot adjacently located to said exit load lock compartment of said semiconductor etcher for capturing said residual corrosive gas into said hollow interior space;wherein said intake slot has an edge that is parallel to an outer side edge of said exit load lock compartment; andan exhaust blower connected to said exhaust aperture of said exhaust box to provide suction power to said exhaust box for drawing said residual corrosive gas from said exit load lock compartment through said intake slot into said hollow interior space and through said exhaust aperture and outside of said clean room.