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In order to improve a generator for generating a product gas by means of a chemical reaction between an educt gas and a liquid, comprising a closed reaction chamber with a liquid supply, a liquid discharge, an educt gas supply, a product gas discharge, a liquid bath arranged within the reaction cham

In order to improve a generator for generating a product gas by means of a chemical reaction between an educt gas and a liquid, comprising a closed reaction chamber with a liquid supply, a liquid discharge, an educt gas supply, a product gas discharge, a liquid bath arranged within the reaction chamber and a substrate member arranged for rotation in the reaction chamber, the axis of rotation of this substrate member being arranged such that during a rotation of the substrate member at least part of the surface of the substrate member alternatingly dips into the liquid bath and emerges from the liquid bath wetted by the liquid, such that a motor arranged outside the reaction chamber for rotating the substrate member can be dispensed with and the requirement of a pressure-tight passage for a drive shaft of the substrate member through a wall of the reaction chamber is not applicable it is suggested that the generator comprise a flow generator for generating a continuous flow of the liquid in the reaction chamber and that the substrate member comprise at least one momentum receiver for receiving part of the momentum of the flow of the liquid and for generating a rotary motion of the substrate member about its axis of rotation.

대표청구항 ▼

[ We claim:] [1.] A generator for generating a product gas from a chemical reaction between an educt gas and a liquid, comprising:a closed reaction chamber with a liquid supply, a liquid discharge, and an educt gas supply;a product gas discharge;a liquid bath arranged within the reaction chamber;a s

[ We claim:] [1.] A generator for generating a product gas from a chemical reaction between an educt gas and a liquid, comprising:a closed reaction chamber with a liquid supply, a liquid discharge, and an educt gas supply;a product gas discharge;a liquid bath arranged within the reaction chamber;a substrate member arranged for rotation about an axis of rotation in the reaction chamber;the axis of rotation being arranged such that during a rotation of the substrate member, at least part of a surface of the substrate member alternatingly dips into the liquid bath and emerges from the liquid bath wetted by the liquid;said liquid wetting said surface being adapted to react with the educt gas to form the product gas;the substrate member comprising at least one momentum receiver; anda flow generator for generating a continuous flow of the liquid in the liquid bath, wherein:said at least one momentum receiver receives at least part of the momentum of the flow of the liquid in the liquid bath for use in generating a rotary motion of the substrate member about the axis of rotation.